IP Library Assignment 020595/0825
Patent Assignment
Reel/Frame 020595/0825

Assignment of Assignor's Interest

Recorded: 2008-03-04 Pages: 3
Assignors
AIBA, AKIHIRO
Executed: 2003-11-07
OKABE, TAKEO
Executed: 2003-11-13
Assignee
NIKKO MATERIALS CO., LTD.
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO, 105-8407, JAPAN
Covered Property (1)
Electrolytic Copper Plating Method, Phosphorous Copper Anode for Electrolytic Copper Plating, and Semiconductor Wafer Having Low Particle Adhesion Plated with Said Method and Anode
Patent: 8,252,157 →
Application: 12/041,095 →
Publication: US 2008/0210568
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 5, 2008
From: NIKKO MATERIALS CO., LTD.
To: NIPPON MINING & METALS CO., LTD
Reel/Frame 020604/0455 →
Merger Oct 8, 2010
From: NIPPON MINING & METALS CO., LTD.
To: NIPPON MINING HOLDINGS, INC.
Reel/Frame 025115/0675 →
Change of Name Oct 12, 2010
From: NIPPON MINING HOLDINGS, INC.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 025123/0420 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
Change of Address Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →