IP Library Assignment 020604/0455
Patent Assignment
Reel/Frame 020604/0455

Change of Name

Recorded: 2008-03-05 Pages: 12
Assignor
NIKKO MATERIALS CO., LTD.
Executed: 2006-04-03
Assignee
NIPPON MINING & METALS CO., LTD
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO, 105-0001, JAPAN
Covered Property (1)
Electrolytic Copper Plating Method, Phosphorous Copper Anode for Electrolytic Copper Plating, and Semiconductor Wafer Having Low Particle Adhesion Plated with Said Method and Anode
Patent: 8,252,157 →
Application: 12/041,095 →
Publication: US 2008/0210568
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 4, 2008
From: AIBA, AKIHIRO; OKABE, TAKEO
To: NIKKO MATERIALS CO., LTD.
Reel/Frame 020595/0825 →
Merger Oct 8, 2010
From: NIPPON MINING & METALS CO., LTD.
To: NIPPON MINING HOLDINGS, INC.
Reel/Frame 025115/0675 →
Change of Name Oct 12, 2010
From: NIPPON MINING HOLDINGS, INC.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 025123/0420 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
Change of Address Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →