Patent Assignment
Reel/Frame 074344/0075
Nunc Pro Tunc Assignment
Recorded: 2026-04-12
Received: 2026-04-12
Pages: 4
Assignor
HONEYWELL INTERNATIONAL INC.
Executed: 2026-03-24
Assignee
SOLSTICE ADVANCED MATERIALS US, INC.
115 TABOR ROAD, MORRIS PLAINS, NJ, 07950, UNITED STATES
Covered Properties
(20)
Polysiloxane Compositions for Optoelectronic Device Applications Involving Moisture Sensitive Layers
Application:
19/045,352 →
High Crack Threshold Planarizing Coatings and Processes to Fill Wide and Deep Trenches for Silicone Wafers
Application:
18/664,268 →
Catalysts for Polyurethane Foam Polyol Premixes Containing Halogenated Olefin Blowing Agents
Application:
16/275,568 →
Crack-Resistant Silicon-Based Planarizing Compositions, Methods and Films
Application:
16/210,153 →
Crack-Resistant Polysiloxane Dielectric Planarizing Compositions, Methods and Films
Application:
16/210,160 →
Amine Catalysts for Polyurethane Foams
Application:
16/160,438 →
Storage Stable Foamable Compositions Containing 1,1,1,4,4,4-Hexafluoro-2-Butene
Application:
16/133,031 →
Fill Material to Mitigate Pattern Collapse
Application:
16/126,019 →
Thermally Removable Fill Materials for Anti-Stiction Applications
Application:
16/126,010 →
Composition and Use of Vinylidene Fluoride and Blends Thereof
Application:
15/143,720 →
Foams And Articles Made From Foams Containing 1-Chloro-3,3,3-Trifluoropropene (HFCO-1233zd)
Application:
14/679,802 →
Compositions Containing Tetrafluoropropene and Carbon Dioxide
Application:
14/097,410 →
Dopant Ink Compositions for Forming Doped Regions in Semiconductor Substrates, and Methods for Fabricating Dopant Ink Compositions
Application:
13/280,077 →
Azeotrope-Like Compositions of Trans-1,1,1,4,4,4-Hexafluoro-2-Butene and Water
Application:
13/009,198 →
Bottom Antireflective Coatings Exhibiting Enhanced Wet Strip Rates, Bottom Antireflective Coating Compositions for Forming Bottom Antireflective Coatings, and Methods for Fabricating the Same
Application:
12/234,849 →
High Voltage Electrolytes
Application:
11/828,034 →
Repair and Restoration of Damaged Dielectric Materials and Films
Application:
10/543,347 →
Treating Agent Materials
Application:
11/203,558 →
Method for making toughening agent materials
Application:
10/940,686 →
Repairing Damage to Low-K Dielectric Materials Using Silylating Agents
Application:
10/940,682 →