IP Library › Granted Patent US 6,762,129
Granted Patent Utility
US 6,762,129 · Confirmation No. 2729

DRY ETCHING METHOD, FABRICATION METHOD FOR SEMICONDUCTOR DEVICE, AND DRY ETCHING APPARATUS

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2003-08-27 SPEC Specification 27 View
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2002-05-31 FRPR Certified Copy of Foreign Priority Application 8 View
2001-04-05 TRNA Transmittal of New Application 2 View
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2001-04-05 SPEC Specification 67 View
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2001-04-05 OATH Oath or Declaration filed 3 View
2001-04-05 TRNA Transmittal of New Application 2 View
2001-04-05 ADS Application Data Sheet 2 View
2001-04-05 SPEC Specification 67 View
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2001-04-05 DRW Drawings-only black and white line drawings 16 View
2001-04-05 OATH Oath or Declaration filed 3 View
2001-04-05 WFEE Fee Worksheet (SB06) 1 View
2001-04-05 WFEE Fee Worksheet (SB06) 1 View
2001-04-05 WCLM Claims Worksheet (PTO-2022) 1 View
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2001-04-05 SRFW Search information including classification, databases and other search related notes 1 View
2001-04-05 FWCLM Index of Claims 1 View
2001-04-05 FRPR Certified Copy of Foreign Priority Application 41 View
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Quick Facts
Patent No.
US 6,762,129
App. No.
09/826,098
Filed
2001-04-05
Granted
2004-07-13
Pub. No.
US20010034138A1
Art Unit
1765
PTA
-93 days