Patent Assignment
Reel/Frame 053755/0859
Assignment of Assignor's Interest
Recorded: 2020-09-11
Pages: 7
Assignor
PANNOVA SEMIC, LLC
Executed: 2020-07-17
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8 LI-HSIN ROAD 6, HSINCHU SCIENCE PARK, HSINCHU, 300, TAIWAN
Covered Properties
(51)
Semiconductor Device and Method for Fabricating the Same
Patent:
6,500,769 →
Application:
09/708,084 →
Pattern Formation Material and Method
Dry Etching Method, Fabrication Method for Semiconductor Device, and Dry Etching Apparatus
Pattern Formation Material and Pattern Formation Method
Pattern Formation Material and Pattern Formation Method
Nonvolatile Semiconductor Memory Test Circuit and Method, Nonvolatile Semiconductor Memory and Method for Fabricating Nonvolatile Semiconductor Memory
Ferroelectric Memory Having Ferroelectric Capacitor Insulative Film
Method for Fabricating Ferroelectric Memory Device and Method for Fabricating the Same
Ferroelectric Memory
Semiconductor Device Having a Voltage-Regulator Device
Pattern Formation Method
Pattern Formation Material and Pattern Formation Method
Method for Fabricating Semiconductor Device
Solid-State Imaging Device, Method for Manufacturing the Same, and Method for Driving the Same
Soft X-Ray Reduction Projection Exposure System, Soft X-Ray Reduction Projection Exposure Method and Pattern Formation Method
Capacitor, Semiconductor Memory Device, and Method for Manufacturing the Same
Method for Manufacturing Semiconductor Device
Semiconductor Device and Method for Fabricating the Same
Pattern Formation Method
Pattern Formation Method
Method of Fabricating Nitride Semiconductor Device
Method for Fabricating Semiconductor Device
Pattern Forming Material and Method of Pattern Formation
Semiconductor Storage Device and Its Manufacturing Method
Method for Fabricating Semiconductor Device
Method and Apparatus for Plating Substrate
Ferroelectric Memory Device and Method for Fabricating the Same
Capacitor Element and Production Thereof
Semiconductor Laser and Process for Manufacturing the Same
A Semiconductor Device Comprising a Differential Sense Amplifier, a Write Column Selection Switch and a Read Column Selection Switch
Semiconductor Device and Method for Fabricating the Same
Dry Etching Method, Fabrication Method for Semiconductor Device, and Dry Etching Apparatus
Semiconductor Memory Device and Method for Fabricating the Same
Semiconductor Device Using a Conductive Film and Method of Manufacturing the Same
Ferroelectric Memory
Sulfonamide Compound, Polymer Compound, Resist Material and Pattern Formation Method
Solid-State Imaging Device, Method for Manufacturing the Same, and Method for Driving the Same
Polymer Compound, Resist Material and Pattern Formation Method
Ferroelectric Memory and Method for Manufacturing the Same
Light Irradiation Heat Treatment Method and Light Irradiation Heat Treatment Apparatus
Water-Soluble Material, Chemically Amplified Resist and Pattern Formation Method Using the Same
Ferroelectric Memory and Method for Manufacturing the Same
Semiconductor Device Comprising a Differential Sense Amplifier, a Write Column Selection Switch and a Read Column Selection Switch
Exhaust Apparatus, Semiconductor Device Manufacturing System and Method for Manufacturing Semiconductor Device
Semiconductor Device and Method for Fabricating the Same
Dry Etching Method, Fabrication Method for Semiconductor Device, and Dry Etching Apparatus
Semiconductor Device Using a Conductive Film and Method of Manufacturing the Same
Dry Etching Method, Fabrication Method for Semiconductor Device, and Dry Etching Apparatus
Semiconductor Device with Dummy Conductors
Sulfonamide Compound, Polymer Compound, Resist Material and Pattern Formation Method
Semiconductor Device and Method for Fabricating the Same
Related Assignments
(2)
Other recorded transfers of the patents in this record — the chain of ownership.