IP Library › Granted Patent US 6,531,412
Granted Patent Utility
US 6,531,412 · Confirmation No. 6531

METHOD FOR LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION OF LOW-K FILMS USING SELECTED CYCLOSILOXANE AND OZONE GASES FOR SEMICONDUCTOR APPLICATIONS

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2006-02-03 FOR Foreign Reference 84 View
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2006-02-03 IDS Information Disclosure Statement (IDS) Form (SB08) 5 View
2001-08-10 TRNA Transmittal of New Application 1 View
2001-08-10 SPEC Specification 13 View
2001-08-10 CLM Claims 6 View
2001-08-10 ABST Abstract 1 View
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2001-08-10 OATH Oath or Declaration filed 12 View
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Quick Facts
Patent No.
US 6,531,412
App. No.
09/928,209
Filed
2001-08-10
Granted
2003-03-11
Pub. No.
US20030032306A1
Art Unit
2818
PTA
-76 days