IP Library Granted Patent US 6,632,278
Granted Patent Utility
US 6,632,278 · Confirmation No. 7760

LOW DEFECT DENSITY EPITAXIAL WAFER AND A PROCESS FOR THE PREPARATION THEREOF

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Code Description Pages PDF
2014-01-30 OATH Oath or Declaration filed 65 View
2013-12-26 OATH Oath or Declaration filed 29 View
2013-12-26 OATH Oath or Declaration filed 42 View
2008-05-29 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2008-05-29 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2008-05-21 PA.. Power of Attorney 3 View
2008-05-21 N417 Electronic Filing System Acknowledgment Receipt 2 View
2002-04-30 TRNA Transmittal of New Application 4 View
2002-04-30 ADS Application Data Sheet 4 View
2002-04-30 A.PE Preliminary Amendment 9 View
2002-04-30 SPEC Specification 51 View
2002-04-30 CLM Claims 4 View
2002-04-30 ABST Abstract 1 View
2002-04-30 DRW Drawings-only black and white line drawings 28 View
2002-04-30 OATH Oath or Declaration filed 4 View
2002-04-30 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
Patent No.
US 6,632,278
App. No.
10/135,597
Filed
2002-04-30
Granted
2003-10-14
Pub. No.
US20020170485A1
Art Unit
1765
PTA
-121 days