IP Library › Granted Patent US 6,699,766
Granted Patent Utility
US 6,699,766 · Confirmation No. 4986

METHOD OF FABRICATING AN INTEGRAL CAPACITOR AND GATE TRANSISTOR HAVING NITRIDE AND OXIDE POLISH STOP LAYERS USING CHEMICAL MECHANICAL POLISHING ELIMINATION

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2022-04-15 OATH Oath or Declaration filed 253 View
2004-01-13 IFEE Issue Fee Payment (PTO-85B) 2 View
2004-01-13 LET. Miscellaneous Incoming Letter 1 View
2004-01-13 C.AD Change of Address 1 View
2002-07-01 TRNA Transmittal of New Application 2 View
2002-07-01 ADS Application Data Sheet 3 View
2002-07-01 SPEC Specification 27 View
2002-07-01 CLM Claims 5 View
2002-07-01 ABST Abstract 1 View
2002-07-01 DRW Drawings-only black and white line drawings 7 View
2002-07-01 OATH Oath or Declaration filed 4 View
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Quick Facts
Patent No.
US 6,699,766
App. No.
10/185,537
Filed
2002-07-01
Granted
2004-03-02
Art Unit
2813
PTA
-4 days