IP Library › Granted Patent US 6,693,022
Granted Patent Utility
US 6,693,022 · Confirmation No. 6137

CVD METHOD OF PRODUCING IN SITU-DOPED POLYSILICON LAYERS AND POLYSILICON LAYERED STRUCTURES

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2003-12-29 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-08-23 TRNA Transmittal of New Application 5 View
2002-08-23 SPEC Specification 46 View
2002-08-23 CLM Claims 4 View
2002-08-23 ABST Abstract 1 View
2002-08-23 DRW Drawings-only black and white line drawings 7 View
2002-08-23 OATH Oath or Declaration filed 5 View
2002-08-23 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
Patent No.
US 6,693,022
App. No.
10/226,764
Filed
2002-08-23
Granted
2004-02-17
Pub. No.
US20030017684A1
Art Unit
2813
PTA
-81 days