IP Library Granted Patent US 6,956,657
Granted Patent B2
US 6,956,657 · App. 10/303,236 · Granted Oct 18, 2005

Method for self-calibrated sub-aperture stitching for surface figure measurement

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Quick Facts
Patent No.
US 6,956,657
App. No.
10/303,236
Granted
Oct 18, 2005
Kind
B2
Abstract

A method for accurately synthesizing a full-aperture data map from a series of overlapped sub-aperture data maps. In addition to conventional alignment uncertainties, a generalized compensation framework corrects a variety of errors, including compensators that are independent in each sub-aperture. Another class of compensators (interlocked) include coefficients that are the same across all the sub-apertures. A constrained least-squares optimization routine maximizes data consistency in sub-aperture overlap regions. The stitching algorithm includes constraints representative of the accuracies of the hardware to ensure that the results are within meaningful bounds. The constraints also enable the computation of estimates of uncertainties in the final results. The method therefore automatically calibrates the system, provides a full-aperture surface map, and an estimate of residual uncertainties. Therefore, larger surfaces can be tested with greater departures from a best-fit sphere to greater accuracy than was possible in the prior art.

Claims (20)

1. A method for synthesizing a full-aperture numerical data map of a test surface of an object from a plurality of overlapping sub-aperture data maps of said surface, comprising the steps of:

a) collecting said plurality of sub-aperture numerical data maps of said surface from a plurality of regions of said surface, at least a portion of each such map overlapping a portion of at least one adjacent map to create a region of overlapping data;

b) projecting said plurality of overlapping data maps onto a global coordinate system with a nominal distortion map;

c) selecting a plurality of error compensators from one of two groups consisting of free compensators having free amplitude range and interlocked compensators having identical constrained amplitudes to compensate for stitching errors in said overlapping data regions; and

d) simultaneously minimizing mismatch of data from each of said data maps in said overlapping regions through linear combinations of said compensators.

2. A method in accordance with claim 1 further comprising the step of selecting constraints on said compensator amplitudes.

3. A method in accordance with claim 2 wherein said selecting constraints on said compensator amplitudes includes the steps of:

a) determining inaccuracies derived from measurement apparatus used to collect said plurality of sub-aperture data maps; and

b) incorporating said apparatus inaccuracies into said numerical solution in synthesizing said full-aperture numerical data map.

4. A method in accordance with claim 1 further comprising the step of weighting the significance of individual data values within each of said sub-aperture data maps to reduce the sensitivity of said numerical solution to less-significant data points.

5. A method in accordance with claim 1 wherein said individual measurements are obtained via measurement tools including an interferometer, and wherein said interferometer and said object having said test surface are disposed on a multi-axis stage.

6. A method in accordance with claim 5 wherein said interlocked compensators are employed to obtain and compensate for spatially-dependent system biases of said measurement tools.

7. A method in accordance with claim 6 wherein said system biases include deviations from a nominal pixel scale and distortion map of said interferometer.

8. A method in accordance with claim 6 wherein a reference wave error in said interferometer is calibrated, said reference wave being modeled with an orthogonal basis set and each term in said set being represented by an interlocked compensator.

9. A method in accordance with claim 1 wherein said linear free compensators are employed in a first-order correction for sub-aperture placement error.

10. A method in accordance with claim 1 comprising the further steps of:

a) estimating actual shift and scale errors as inferred from said compensator amplitudes;

b) refining said measurement data positions and mapping by applying said estimated shift and scale errors to said original data positions; and

c) projecting said refined measurement data positions onto said global coordinate system to re-minimize said overlapped data mismatch.

11. A method in accordance with claim 1 for improving the accuracy of a synthetic full-aperture numerical data map of a test surface of an object derived from a plurality of overlapping sub-aperture data maps of said surface, comprising the further steps of iteratively performing the steps of claims 1 and 10 .

Assignments (11)
SECURITY INTEREST Recorded Mar 1, 2023
From: QED TECHNOLOGIES INTERNATIONAL, INC.
To: FIDUS INVESTMENT CORPORATION
Reel/Frame 062838/0648 →
PARTIAL RELEASE OF SECURITY INTEREST IN INTELLECTUAL PROPERTY RECORDED AT REEL 060613, FRAME 0072 Recorded Mar 1, 2023
From: TRUIST BANK, AS NOTES COLLATERAL AGENT
To: QED TECHNOLOGIES INTERNATIONAL, INC.
Reel/Frame 062901/0554 →
PARTIAL RELEASE OF SECURITY INTEREST Recorded Mar 1, 2023
From: MORGAN STANLEY SENIOR FUNDING, INC., AS AGENT
To: QED TECHNOLOGIES INTERNATIONAL, INC.
Reel/Frame 062904/0026 →
SECURITY INTEREST Recorded Jul 8, 2022
From: CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 060615/0001 →
SECURITY INTEREST Recorded Jul 8, 2022
From: ENTEGRIS, INC.; ENTEGRIS GP, INC.; POCO GRAPHITE, INC.; CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: TRUIST BANK, AS NOTES COLLATERAL AGENT
Reel/Frame 060613/0072 →
RELEASE OF SECURITY INTEREST Recorded Jul 6, 2022
From: JPMORGAN CHASE BANK, N.A.
To: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.; FLOWCHEM LLC; KMG ELECTRONIC CHEMICALS, INC.; KMG-BERNUTH, INC.; MPOWER SPECIALTY CHEMICALS LLC; SEALWELD (USA), INC.; INTERNATIONAL TEST SOLUTIONS, LLC; CMC MATERIALS, INC.
Reel/Frame 060592/0260 →
SECURITY AGREEMENT Recorded Nov 16, 2018
From: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.; FLOWCHEM LLC; KMG ELECTRONIC CHEMICALS, INC.; MPOWER SPECIALTY CHEMICALS LLC
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 047588/0263 →
RELEASE OF SECURITY INTEREST Recorded Nov 16, 2018
From: BANK OF AMERICA, N.A.
To: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.
Reel/Frame 047583/0028 →
NOTICE OF SECURITY INTEREST IN PATENTS Recorded Feb 16, 2012
From: QED TECHNOLOGIES INTERNATIONAL, INC.
To: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 027727/0596 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2006
From: QED TECHNOLOGIES, INC.
To: QED TECHNOLOGIES INTERNATIONAL, INC.
Reel/Frame 018313/0588 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 25, 2006
From: GOLINI, DONALD; FORBES, GREG W.; MURPHY, PAUL E.
To: QED TECHNOLOGIES, INC.
Reel/Frame 017833/0360 →