Method and apparatus for semiconductor processing
View Patent ↗A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing chamber and a factory interface. The wafer is transported to a second segment of the vacuum enclosure using a vertical transport mechanism, wherein the second segment is above or below the first segment.
1. A method of transporting a wafer within a plurality of cluster tools, comprising:
placing the wafer into a first vacuum enclosure of a first cluster tool of the plurality of cluster tools, the first vacuum enclosure being connected to a first processing chamber and a factory interface;
transporting the wafer from the first vacuum enclosure of the first cluster tool to a second vacuum enclosure of a second cluster tool of the plurality of cluster tools across a vertical transport path using a vertical transport mechanism,
wherein the second vacuum enclosure is connected to a second processing chamber and the second cluster tool is disposed along the vertical transport path above or below the first cluster tool, and
wherein the second vacuum enclosure is colinear with the vertical transport path and is positioned at the end of the vertical transport path.
2. The method of claim 1 , further comprising:
moving the wafer into and out of the first vacuum enclosure using a linear wafer drive, wherein the linear wafer drive is external to the first vacuum enclosure.
3. The method of claim 2 , further comprising:
controlling the linear wafer drive and the vertical transport mechanism with a computer executing mechanism control software.
4. The method of claim 3 , wherein moving the wafer into and out of the first vacuum enclosure includes moving the wafer through a gate valve, the gate valve being connected to the first vacuum enclosure.
5. The method of claim 4 , wherein moving the wafer into and out of the first vacuum enclosure includes moving the wafer through an extension having two ends, the extension being connected at one end to the gate valve and at the other end to the first vacuum enclosure.
6. The method of claim 3 , wherein moving the wafer into and out of the first vacuum enclosure includes moving the wafer between the first vacuum enclosure and the first processing chamber.
7. The method of claim 6 , wherein the linear wafer drive is simultaneously moving a second wafer between the first vacuum enclosure and the first processing chamber.
8. The method of claim 3 , wherein moving the wafer into and out of the first vacuum enclosure includes moving the wafer between the factory interface and the first vacuum enclosure.
9. The method of claim 3 , wherein moving the wafer into and out of the first vacuum enclosure includes moving the wafer through a gate valve, the gate valve being connected to the first processing chamber.
10. The method of claim 9 , wherein moving the wafer into and out of the first vacuum enclosure includes moving the wafer through an extension having two ends, the extension being connected at one end to the gate valve and at the other end to the first vacuum enclosure.
11. The method of claim 2 , further comprising:
moving the wafer into and out of a third vacuum enclosure using the linear drive, wherein the third vacuum enclosure is disposed in the second cluster tool.
12. The method of claim 11 , wherein moving the wafer into and out of a third vacuum enclosure includes moving the wafer through a gate valve having two sides, the gate valve being connected at one side to the first vacuum enclosure and at the other side to the third vacuum enclosure.
13. The method of claim 12 , wherein moving the wafer into and out of a third vacuum enclosure includes moving the wafer through an extension having two ends, the extension being connected at one end to the gate valve and at the other end to the third vacuum enclosure.
14. The method of claim 12 , wherein moving the wafer into and out of a third vacuum enclosure includes moving the wafer through an extension having two ends, the extension being connected at one end to the gate valve and at the other end to the first vacuum enclosure.
15. The method of claim 1 , wherein a pumping module maintains vacuum conditions to the first vacuum enclosure and the second vacuum enclosure.
16. The method of claim 1 , wherein the first vacuum enclosure is a load-lock chamber.
17. The method of claim 1 , wherein the second vacuum enclosure is a load-lock chamber.