Method of making a semiconductor memory array of floating gate memory cells with program/erase and select gates
View Patent ↗A memory device, and method of making and operating the same, including a substrate of semiconductor material of a first conductivity type, first and second spaced apart regions in the substrate of a second conductivity type with a channel region therebetween, an electrically conductive floating gate having a first portion disposed over and insulated from the channel region and a second portion disposed over and insulated from the first region and including a sharpened edge, an electrically conductive P/E gate having a first portion disposed over and insulated from the first region and a second portion extending up and over the floating gate second portion and insulated therefrom by a first layer of insulation material, and an electrically conductive select gate having a first portion disposed laterally adjacent to the floating gate and disposed over and insulated from the channel region.
1. A method of forming an electrically programmable and erasable memory device in a substrate of semiconductor material of first conductivity type, comprising:
forming first and second spaced-apart regions in the substrate of a second conductivity type, with a channel region therebetween;
forming an electrically conductive floating gate having a first portion disposed over and insulated from the channel region, and a second portion disposed over and insulated from the first region and including a sharpened edge;
forming an electrically conductive P/E gate having a first portion disposed over and insulated from the first region, and a second portion extending up and over the floating gate second portion and insulated therefrom by a first layer of insulation material; and
forming an electrically conductive select gate disposed laterally adjacent to and insulated from the floating gate and disposed over and insulated from the channel region;
wherein the formations of the P/E gate and select gate include:
forming a layer of conductive material over the channel region, the floating gate, and the first region; and
selectively etching away a portion of the conductive material to result in a pair of blocks of the conductive material that are electrically isolated from each other and that constitute the P/E gate and the select gate respectively.
2. The method of claim 1 , wherein the formation of the select gate includes forming an upper portion of the select gate that extends up and over the floating gate first portion and is insulated therefrom.
3. A method of forming an electrically programmable and erasable memory device in a substrate of semiconductor material of first conductivity type, comprising:
forming first and second spaced-apart regions in the substrate of a second conductivity type, with a channel region therebetween;
forming an electrically conductive floating gate having a first portion disposed over and insulated from the channel region, and a second portion disposed over and insulated from the first region and including a sharpened edge;
forming an electrically conductive P/E gate having a first portion disposed over and insulated from the first region, and a second portion extending up and over the floating gate second portion and insulated therefrom by a first layer of insulation material; and
forming an electrically conductive select gate disposed laterally adjacent to and insulated from the floating gate and disposed over and insulated from the channel region;
wherein the formation of the floating gate includes oxidizing or etching an upper surface of the floating gate to form a sloping portion of the upper surface, and wherein the sharpened edge is disposed at an intersection of the sloping portion and a side surface of the floating gate.
4. The method of claim 3 , wherein the formation of the select gate includes forming an upper portion of the select gate that extends up and over the floating gate first portion and is insulated therefrom.
5. A method of forming an array of electrically programmable and erasable memory devices in a substrate of semiconductor material of first conductivity type, comprising:
forming spaced apart isolation regions on the substrate which are substantially parallel to one another and extend in a first direction, with an active region between each pair of adjacent isolation regions; and
forming pairs of memory cells in each of the active regions, each of the memory cell pairs being formed by:
forming a first region and a pair of second regions spaced apart in the substrate having a second conductivity type, with channel regions formed in the substrate between the first region and the second regions,
forming a pair of electrically conductive floating gates each having a first portion disposed over and insulated from one of the channel regions, and a second portion disposed over and insulated from the first region and including a sharpened edge,
forming an electrically conductive P/E gate having a first portion disposed over and insulated from the first region, and a pair of second portions each extending up and over one of the floating gate second portions and insulated therefrom by a first layer of insulation material, and
forming a pair of electrically conductive select gates each disposed laterally adjacent to and insulated from one of the floating gates and disposed over and insulated from the channel region;
wherein for each pair of the memory cells, the formations of the P/E gate and select gates include:
forming a layer of conductive material over the channel regions, the floating gates, and the first region; and
selectively etching away two portions of the conductive material to result in three blocks of the conductive material that are electrically isolated from each other and that constitute the P/E gate and the select gates respectively.
6. The method of claim 5 , wherein the formation of the P/E gates includes forming conductive P/E gate lines that extend across the active regions and isolation regions in a second direction substantially perpendicular to the first direction, and wherein each of the P/E gate lines intercepts one of the P/E gates in each of the active regions.
7. The method of claim 6 , wherein the formation of the select gates includes forming conductive word lines that extend across the active regions and isolation regions in the second direction, and wherein each of the word lines intercepts one of the select gates in each of the active regions.
8. The method of claim 7 , further comprising:
forming a plurality of conductive bit lines each electrically connected to all of the second regions in one of the active regions.
9. The method of claim 5 , wherein for each pair of the memory cells, the formation of each of the select gates includes forming an upper portion of the select gate that extends up and over one of the floating gate first portions and is insulated therefrom.
10. A method of forming an array of electrically programmable and erasable memory devices in a substrate of semiconductor material of first conductivity type, comprising:
forming spaced apart isolation regions on the substrate which are substantially parallel to one another and extend in a first direction, with an active region between each pair of adjacent isolation regions; and
forming pairs of memory cells in each of the active regions, each of the memory cell pairs being formed by:
forming a first region and a pair of second regions spaced apart in the substrate having a second conductivity type, with channel regions formed in the substrate between the first region and the second regions,
forming a pair of electrically conductive floating gates each having a first portion disposed over and insulated from one of the channel regions, and a second portion disposed over and insulated from the first region and including a sharpened edge,
forming an electrically conductive P/E gate having a first portion disposed over and insulated from the first region, and a pair of second portions each extending up and over one of the floating gate second portions and insulated therefrom by a first layer of insulation material, and
forming a pair of electrically conductive select gates each disposed laterally adjacent to and insulated from one of the floating gates and disposed over and insulated from the channel region;
wherein the formation of each of the floating gates includes oxidizing or etching an upper surface of the floating gate to form a sloping portion of the upper surface, such that the sharpened edge is disposed at an intersection of the sloping portion and a side surface of the floating gate.
11. The method of claim 10 , wherein for each pair of the memory cells, the formation of each of the select gates includes forming an upper portion of the select gate that extends up and over one of the floating gate first portions and is insulated therefrom.