IP Library Granted Patent US 7,973,290
Granted Patent B2
US 7,973,290 · App. 12/190,736 · Granted Jul 5, 2011

System and method of beam energy identification for single wafer ion implantation

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Quick Facts
Patent No.
US 7,973,290
App. No.
12/190,736
Granted
Jul 5, 2011
Kind
B2
Abstract

The present invention involves a beam energy identification system, comprising an accelerated ion beam, wherein the accelerated ion beam is scanned in a fast scan axis within a beam scanner, wherein the beam scanner is utilized to deflect the accelerated ion beam into narrow faraday cups downstream of the scanner, wherein a difference in scanner voltage or current to position the beam into the Faraday cups is utilized to calculated the energy of ion beam.

Claims (68)

1. A beam energy identification system, comprising:

an electrostatic beam scanner configured to receive an ion beam, wherein the ion beam is deflected along a fast scan axis via a variation of a scanner voltage applied to the electrostatic beam scanner, therein defining a scanned ion beam;

a first Faraday cup positioned along the fast scan axis; and

a second Faraday cup positioned along the fast scan axis, wherein the scanner voltage is measured when a peak of the scanned ion beam is present at the respective first Faraday cup and second Faraday cup, and wherein a beam energy (E) is defined by:

E =(Δθ 1S q )/( K 1S ΔV 1S ), wherein:

Δθ 1S a shift of angle of the scanned ion beam;

q is a charge value of ions of the scanned ion beam;

K 1S is a constant throughout ranges of beam energy and scanner voltage; and

ΔV 1s is a difference in scanner voltages associated with the respective peaks of the scanned ion beam at the first Faraday cup and the second Faraday cup.

2. A beam energy identification system, comprising:

an electromagnetic beam scanner configured to receive an ion beam, wherein the ion beam is deflected along a fast scan axis via a variation of a scanner current applied to the electromagnetic beam scanner, therein defining a scanned ion beam;

a first Faraday cup positioned along the fast scan axis; and

a second Faraday cup positioned along the fast scan axis, wherein the scanner current is measured when a peak of the scanned ion beam is present at the respective first Faraday cup and second Faraday cup, and wherein a beam energy (E) is defined by:

E =( K 1M ΔB 1M qΔθ 1M ) 2 /m, wherein:

K 1M is constant throughout ranges of beam energy and scanner current;

ΔB 1M is a difference in a scanner magnetic field associated with the respective peaks of the scanned ion beam at the first Faraday cup and the second Faraday cup;

q is a charge value of ions of the scanned ion beam;

Δθ 1M is a shift of angle of the scanned ion beam; and

m is a mass of the ions of the scanned ion beam.

3. The beam energy identification system of claim 2 , further comprising an angle corrector magnet positioned downstream of the electromagnetic beam scanner, wherein the angle corrector magnet is configured to selectively parallelize the scanned ion beam.

4. A beam energy identification system, comprising:

an electrostatic beam scanner configured to receive an ion beam, wherein the ion beam is deflected along a fast scan axis via a variation of a scanner voltage applied to the electrostatic beam scanner, therein defining a scanned ion beam;

an angle corrector magnet positioned downstream of the electrostatic beam scanner, wherein the angle corrector magnet is configured to parallelize the scanned ion beam, therein defining a parallel shifted ion beam;

a first Faraday cup positioned along the fast scan axis; and

a second Faraday cup positioned along the fast scan axis, wherein the scanner voltage is measured when a peak of the parallel shifted ion beam is present at the respective first Faraday cup and second Faraday cup, and wherein a beam energy (E) is defined by:

E =(Δθ 2S q )/( f 2S K 2X ΔV 2S ), wherein:

Δθ 2S is a shift of angle of the parallel shifted ion beam;

q is a charge value of ions of the parallel shifted ion beam;

f 2S is a correction factor to account for an effect of the angle corrector magnet;

K 2S is a constant throughout ranges of the beam energy and scanner voltage; and

ΔV 2S is a difference in scanner voltages associated with the respective peaks of the parallel shifted ion beam at the first Faraday cup and the second Faraday cup.

5. A beam energy identification system, comprising:

an electromagnetic beam scanner configured to receive an ion beam, wherein the ion beam is deflected along a fast scan axis via a variation of a scanner current applied to the electromagnetic beam scanner, therein defining a scanned ion beam;

an angle corrector magnet positioned downstream of the electromagnetic beam scanner, wherein the angle corrector magnet is configured to parallelize the scanned ion beam, therein defining a parallel shifted ion beam;

a first Faraday cup positioned along the fast scan axis; and

a second Faraday cup positioned along the fast scan axis, wherein the scanner voltage is measured when a peak of the parallel shifted ion beam is present at the respective first Faraday cup and second Faraday cup, and wherein a beam energy (E) is defined by:

E =( K 2M ΔB 2M qΔθ 2M ) 2 /m, wherein:

K 2M is constant throughout ranges of the beam energy and scanner current;

ΔB 2M is a difference in a scanner magnetic field associated with the respective peaks of the parallel shifted ion beam at the first Faraday cup and the second Faraday cup;

q is a charge value of ions of the parallel shifted ion beam;

Δθ 2M is a shift of angle of the parallel shifted ion beam; and

m is a mass of the ions of the parallel shifted ion beam.

6. A method for identifying an energy of an ion beam, the method comprising:

scanning the ion beam along a fast scan axis via an application of a scanner voltage to an ion beam scanner, therein defining a scanned ion beam;

positioning a first faraday cup downstream of the ion beam along the fast scan axis;

positioning a second faraday cup downstream of the ion beam scanner along the fast scan axis;

determining a shift of angle of the scanned ion beam, wherein the shift angle is associated with a position of the ion beam scanner relative to the first Faraday cup and second Faraday cup;

varying the scanner voltage and determining the scanner voltage when a first peak and a second peak of the scanned ion beam is present at the respective first Faraday cup and second Faraday cup; and

determining a beam energy (E) of the scanned ion beam, wherein the beam energy is defined by:

E =(Δθ 1S q )/( K 1S ΔV 1S ), wherein:

Δθe 1S is the shift of angle of the scanned ion beam;

q is a charge value of ions of the scanned ion beam;

K 1S is a constant throughout ranges of beam energy and scanner voltage; and

ΔV 1S is a difference in scanner voltages associated with the respective first and second peaks of the scanned ion beam at the first Faraday cup and the second Faraday cup.

7. A method for identifying an energy of an ion beam, the method comprising:

scanning the ion beam along a fast scan axis via an application of a scanner voltage to an ion beam scanner, therein defining a scanned ion beam;

positioning a first Faraday cup downstream of the ion beam scanner along the fast scan axis;

positioning a second Faraday cup downstream of the ion beam scanner along the fast scan axis;

activating an angle corrector magnet positioned downstream of the ion beam scanner, wherein the angle corrector magnet parallelizes the scanned ion beam, therein defining a parallel shifted ion beam;

determining a shift of angle of the parallel shifted ion beam, wherein the shift angle is associated with a position of the ion beam scanner relative to the first Faraday cup and second Faraday cup;

varying the scanner voltage and determining the scanner voltage when a first peak and a second peak of the parallel shifted ion beam is present at the respective first Faraday cup and second Faraday cup; and

determining a beam energy (E) of the parallel shifted ion beam, wherein the beam energy is defined by:

E =(Δθ 2 q )/( K 2 ΔV 2S ), wherein:

Δθ 2 is the shift of angle of the parallel shifted ion beam;

q is a charge value of ions of the parallel shifted ion beam;

K 2 is approximately constant throughout ranges of beam energy and scanner voltage; and

ΔV 2S is a difference in scanner voltages associated with the respective first and second peaks of the parallel shifted ion beam at the first Faraday cup and the second Faraday cup.

8. The beam energy identification system of claim 1 , further comprising an angle corrector magnet positioned downstream of the electrostatic beam scanner, wherein the angle corrector magnet is configured to selectively parallelize the scanned ion beam.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Apr 7, 2023
From: SILICON VALLEY BANK A DIVISION OF FIRST-CITIZENS BANK & TRUST COMPANY
To: AXCELIS TECHNOLOGIES, INC.
Reel/Frame 063270/0277 →
SECURITY INTEREST Recorded Jul 31, 2020
From: AXCELIS TECHNOLOGIES, INC.
To: SILICON VALLEY BANK, AS ADMINISTRATIVE AGENT
Reel/Frame 053375/0055 →
FIRST AMENDMENT TO SECURITY AGREEMENT Recorded May 10, 2011
From: AXCELIS TECHNOLOGIES, INC.
To: SILICON VALLEY BANK
Reel/Frame 026250/0524 →
SECURITY AGREEMENT Recorded Apr 8, 2010
From: AXCELIS TECHNOLOGIES, INC.
To: SILICON VALLEY BANK
Reel/Frame 024202/0494 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 13, 2008
From: SATOH, SHU
To: AXCELIS TECHNOLOGIES, INC.
Reel/Frame 021379/0992 →