IP Library Granted Patent US 7,969,239
Granted Patent B2
US 7,969,239 · App. 12/569,832 · Granted Jun 28, 2011

Charge pump circuit and a novel capacitor for a memory integrated circuit

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,969,239
App. No.
12/569,832
Granted
Jun 28, 2011
Kind
B2
Abstract

A novel capacitor for use in a charge pump circuit has a substrate with a planar surface. A first electrode is in a first plane spaced apart from the planar surface. A second electrode is adjacent to and is spaced apart from the first electrode in the first plane and is capacitively coupled thereto. A third electrode is in a second plane, spaced apart from the first plane and is capacitively coupled to the first electrode. A fourth electrode is adjacent to and spaced apart from the third electrode in the second plane and is capacitively coupled to the third electrode and capacitively coupled to the second electrode. The first and fourth electrodes are electrically connected together and the second and third electrodes are electrically connected together. In addition, a cylindrical shape electrode, and a great wall electrode, and charge pump capacitor-by-pattern-filling is disclosed. A charge pump circuit using the foregoing described capacitor has a plurality of transistors for charging the capacitor and discharging the capacitor thereby increasing the voltage of the charge pump circuit.

Claims (61)

1. A charge pump circuit for use in an integrated circuit die, said charge pump circuit comprising:

a capacitor;

a plurality of transistors for charging said capacitor and discharging said capacitor thereby increasing the voltage of the charge pump circuit; and

said capacitor comprises:

a first electrode in a first plane, wherein said first electrode comprises a plurality of first interdigital elements electrically connected to one another;

a second electrode adjacent to and spaced apart from the first electrode in the first plane and capacitively coupled thereto, wherein said second electrode comprises a plurality of second interdigital elements electrically connected to one another, with each second interdigital element between a pair of first interdigital elements;

a third electrode in a second plane, spaced apart from the first plane and capacitively coupled to the first electrode, wherein said third electrode comprises a plurality of third interdigital elements electrically connected to one another, with each third interdigital element capacitively coupled to a different first interdigital element; and

a fourth electrode adjacent to and spaced apart from the third electrode in the second plane and capacitively coupled to the third electrode and capacitively coupled to the second electrode, wherein said fourth electrode comprises a plurality of fourth interdigital elements electrically connected to one another, with each fourth interdigital element between a pair of third interdigital elements, and with each fourth interdigital element capacitively coupled to a different second interdigital element;

wherein said first and fourth electrodes are electrically connected and said second and third electrodes are electrically connected;

wherein said integrated circuit die further comprises:

a semiconductor substrate having a first conductivity, said substrate having a planar surface;

a first region of a second conductivity on said planar surface of said substrate;

wherein said first region is electrically connected to said first electrode.

2. The charge pump circuit of claim 1 further comprising:

a planar electrode above the planar surface of said substrate, and insulated therefrom;

wherein the planar electrode is electrically connected to said second electrode.

3. The charge pump circuit of claim 2 further comprising

a bonding pad above the planar surface of said substrate;

wherein said capacitor is positioned between the bonding pad and the planar surface of said substrate.

4. The charge pump circuit of claim 2 wherein said planar electrode is made of polysilicon and wherein each of said first electrode, second electrode, third electrode and fourth electrode is made of metal.

5. The charge pump circuit of claim 1 , wherein each of said plurality of first interdigital elements are parallel to one another in a first direction; wherein each of said plurality of second interdigital elements are parallel to one another in said first direction; wherein each of said plurality of third interdigital elements are parallel to one another in said first direction; and wherein each of said plurality of fourth interdigital elements are parallel to one another in said first direction.

6. The charge pump circuit of claim 5

wherein each of said first interdigital elements further comprises a plurality of first fingers extending in a second direction not parallel to the first direction from a first interdigital element;

wherein each of said second interdigital elements further comprises a plurality of second fingers extending in said second direction from a second interdigital element;

wherein each of said third interdigital elements further comprises a plurality of third fingers extending in said second direction from a third interdigital element;

wherein each of said fourth interdigital elements further comprises a plurality of fourth fingers extending in said second direction from a fourth interdigital element.

7. The charge pump circuit of claim 6

wherein each of said first fingers are spaced apart from one;

wherein each of said second fingers are spaced apart from one another with a second finger between a pair of first fingers;

wherein each of said third fingers are spaced apart from one;

wherein each of said fourth fingers are spaced apart from one another with a fourth finger between a pair of third fingers; and

wherein said second direction is substantially perpendicular to said first direction.

8. A capacitor comprising:

a semiconductor substrate having a planar surface;

a first electrode in a first plane spaced apart from the planar surface wherein said first electrode comprises a plurality of first interdigital elements electrically connected to one another;

a second electrode adjacent to and spaced apart from the first electrode in the first plane and capacitively coupled thereto, wherein said second electrode comprises a plurality of second interdigital elements electrically connected to one another, with each second interdigital element between a pair of first interdigital elements;

a third electrode in a second plane, spaced apart from the first plane and capacitively coupled to the first electrode, wherein said third electrode comprises a plurality of third interdigital elements electrically connected to one another, with each third interdigital element capacitively coupled to a different first interdigital element; and

a fourth electrode adjacent to and spaced apart from the third electrode in the second plane and capacitively coupled to the third electrode and capacitively coupled to the second electrode, wherein said fourth electrode comprises a plurality of fourth interdigital elements electrically connected to one another, with each fourth interdigital element between a pair of third interdigital elements, and with each fourth interdigital element capacitively coupled to a different second interdigital element;

wherein said first and fourth electrodes are electrically connected and said second and third electrodes are electrically connected;

wherein said substrate has a first conductivity;

a first region of a second conductivity on said planar surface of said substrate;

wherein said first region is electrically connected to said first electrode.

9. The capacitor of claim 8 further comprising:

a planar electrode above the planar surface of said substrate, and insulated therefrom;

wherein the planar electrode is electrically connected to said second electrode.

10. The capacitor of claim 9 further comprising

a bonding pad above the planar surface of said substrate;

wherein said capacitor is positioned between the bonding pad and the planar surface of said substrate.

11. The capacitor of claim 9 wherein said planar electrode is made of polysilicon and wherein each of said first electrode, second electrode, third electrode and fourth electrode is made of metal.

12. The capacitor of claim 8 , wherein each of said plurality of first interdigital elements are parallel to one another in a first direction; wherein each of said plurality of second interdigital elements are parallel to one another in said first direction; wherein each of said plurality of third interdigital elements are parallel to one another in said first direction; and wherein each of said plurality of fourth interdigital elements are parallel to one another in said first direction.

13. The capacitor of claim 12

wherein each of said first interdigital elements further comprises a plurality of first fingers extending in a second direction not parallel to the first direction from a first interdigital element;

wherein each of said second interdigital elements further comprises a plurality of second fingers extending in said second direction from a second interdigital element;

wherein each of said third interdigital elements further comprises a plurality of third fingers extending in said second direction from a third interdigital element;

wherein each of said fourth interdigital elements further comprises a plurality of fourth fingers extending in said second direction from a fourth interdigital element.

14. The capacitor of claim 13

wherein each of said first fingers are spaced apart from one;

wherein each of said second fingers are spaced apart from one another with a second finger between a pair of first fingers;

wherein each of said third fingers are spaced apart from one;

wherein each of said fourth fingers are spaced apart from one another with a fourth finger between a pair of third fingers; and

wherein said second direction is substantially perpendicular to said first direction.

Assignments (14)
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0001 →
RELEASE OF SECURITY INTEREST Recorded Feb 28, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: SILICON STORAGE TECHNOLOGY, INC.
Reel/Frame 059687/0344 →
RELEASE OF SECURITY INTEREST Recorded Feb 25, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059333/0222 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
SECURITY INTEREST Recorded Sep 18, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 047103/0206 →
SECURITY INTEREST Recorded Jun 25, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 046426/0001 →
SECURITY INTEREST Recorded Feb 10, 2017
From: SILICON STORAGE TECHNOLOGY, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 041675/0316 →