Semiconductor device and method of forming thermally conductive layer between semiconductor die and build-up interconnect structure
View Patent ↗A semiconductor device has a thermally conductive layer with a plurality of openings formed over a temporary carrier. The thermally conductive layer includes electrically non-conductive material. A semiconductor die has a plurality of bumps formed over contact pads on the die. The semiconductor die is mounted over the thermally conductive layer so that the bumps are disposed at least partially within the openings in the thermally conductive layer. An encapsulant is deposited over the die and thermally conductive layer. The temporary carrier is removed to expose the bumps. A first interconnect structure is formed over the encapsulant, semiconductor die, and bumps. The bumps are electrically connected to the first interconnect structure. A heat sink or shielding layer can be formed over the semiconductor die. A second interconnect structure can be formed over the encapsulant and electrically connected to the first interconnect structure through conductive vias formed in the encapsulant.
1. A method of making a semiconductor device, comprising:
providing a temporary carrier;
forming a thermally conductive layer over the temporary carrier, the thermally conductive layer including electrically non-conductive material;
forming a plurality of openings in the thermally conductive layer;
providing a semiconductor die having a plurality of bumps formed over contact pads on the semiconductor die;
mounting the semiconductor die over the thermally conductive layer so that the bumps are disposed at least partially within the openings in the thermally conductive layer;
depositing an encapsulant over the semiconductor die and thermally conductive layer;
removing the temporary carrier to expose the bumps; and
forming a first interconnect structure over the encapsulant, semiconductor die, and bumps, the bumps being electrically connected to the first interconnect structure.
2. The method of claim 1 , wherein the thermally conductive layer includes aluminum oxide, beryllium oxide, thermal interface material, bakelite, anodized aluminum sheet, or sheet of copper or aluminum with a thin insulating coating.
3. The method of claim 1 , wherein forming the first interconnect structure includes:
forming a first insulating layer in the openings of the thermally conductive layer around the bumps;
forming a conductive layer over the first insulating layer and thermally conductive layer; and
forming a second insulating layer over the conductive layer and first insulating layer.
4. The method of claim 1 , wherein the bumps contact a sidewall of the openings in the thermally conductive layer.
5. The method of claim 1 , further including removing a portion of the encapsulant to expose a back surface of the semiconductor die.
6. The method of claim 1 , further including forming a heat sink over the semiconductor die.
7. The method of claim 1 , further including:
forming a plurality of conductive vias through the encapsulant; and
forming a second interconnect structure over the encapsulant and semiconductor die opposite the first interconnect structure, the second interconnect structure being electrically connected to the first interconnect structure through the conductive vias.
8. A method of making a semiconductor device, comprising:
providing a carrier;
forming a thermally conductive layer having a plurality of openings over the carrier;
providing a semiconductor die having a plurality of bumps formed over contact pads on the semiconductor die;
mounting the semiconductor die over the thermally conductive layer so that the bumps are disposed within the openings in the thermally conductive layer;
depositing an encapsulant over the semiconductor die and thermally conductive layer;
removing the carrier; and
forming a first interconnect structure over the encapsulant and semiconductor die, the bumps being electrically connected to the first interconnect structure.
9. The method of claim 8 , wherein the thermally conductive layer includes electrically non-conductive material.
10. The method of claim 8 , wherein the bumps contact a sidewall of the openings in the thermally conductive layer.
11. The method of claim 8 , further including:
forming a plurality of conductive vias through the encapsulant; and
forming a shielding layer over the semiconductor die, the shielding layer being electrically connected to the first interconnect structure through the conductive vias.
12. The method of claim 8 , further including forming a heat sink over the semiconductor die.
13. The method of claim 8 , further including:
forming a plurality of conductive vias through the encapsulant; and
forming a second interconnect structure over the encapsulant and semiconductor die opposite the first interconnect structure, the second interconnect structure being electrically connected to the first interconnect structure through the conductive vias.
14. A method of making a semiconductor device, comprising:
providing a thermally conductive layer having a plurality of openings;
mounting a semiconductor die having a plurality of bumps over the thermally conductive layer so that the bumps are disposed within the openings in the thermally conductive layer;
depositing an encapsulant over the semiconductor die and thermally conductive layer; and
forming a first interconnect structure over the encapsulant and semiconductor die, the bumps being electrically connected to the first interconnect structure.
15. The method of claim 14 , wherein the thermally conductive layer includes electrically non-conductive material.
16. The method of claim 14 , wherein the thermally conductive layer includes aluminum oxide, beryllium oxide, thermal interface material, bakelite, anodized aluminum sheet, or sheet of copper or aluminum with a thin insulating coating.
17. The method of claim 14 , wherein the bumps contact a sidewall of the openings in the thermally conductive layer.
18. The method of claim 14 , further including:
forming a plurality of conductive vias through the encapsulant; and
forming a shielding layer over the semiconductor die, the shielding layer being electrically connected to the first interconnect structure through the conductive vias.
19. The method of claim 14 , further including forming a heat sink over the semiconductor die.
20. The method of claim 14 , further including:
forming a plurality of conductive vias through the encapsulant; and
forming a second interconnect structure over the encapsulant and semiconductor die opposite the first interconnect structure, the second interconnect structure being electrically connected to the first interconnect structure through the conductive vias.
21. A semiconductor device, comprising:
a thermally conductive layer having a plurality of openings;
a semiconductor die having a plurality of bumps mounted over the thermally conductive layer so that the bumps are disposed within the openings in the thermally conductive layer;
an encapsulant deposited over the semiconductor die and thermally conductive layer; and
a first interconnect structure formed over the encapsulant and semiconductor die, the bumps being electrically connected to the first interconnect structure.
22. The semiconductor device of claim 21 , wherein the thermally conductive layer includes electrically non-conductive material.
23. The semiconductor device of claim 21 , further including:
a plurality of conductive vias formed through the encapsulant; and
a shielding layer formed over the semiconductor die, the shielding layer being electrically connected to the first interconnect structure through the conductive vias.
24. The semiconductor device of claim 21 , further including a heat sink mounted over the semiconductor die.
25. The semiconductor device of claim 21 , further including:
a plurality of conductive vias formed through the encapsulant; and
a second interconnect structure formed over the encapsulant and semiconductor die opposite the first interconnect structure, the second interconnect structure being electrically connected to the first interconnect structure through the conductive vias.