Methods for gettering in semiconductor substrate
View Patent ↗A method for forming gettering sites and gettering impurities in a substrate layer includes producing a first masking layer over the substrate layer and patterning the masking layer to define openings at locations where trenches will be formed in the substrate layer at a later time. Ions are then implanted into the substrate layer to produce gettering sites. The gettering sites are disposed at a depth in the substrate layer such that the sites are removed when the trenches are formed. The first masking layer is removed and impurities driven to the gettering sites by thermally processing the substrate layer. A second masking layer is then produced over the substrate layer and patterned to define openings at locations where the trenches will be formed. The substrate layer is etched to produce the trenches. The gettering sites and gettered impurities are removed when the trenches are etched into the substrate layer.
1. A method for processing a substrate layer, comprising:
forming gettering sites in the substrate layer at locations where trench regions will be formed at a later time and at a depth that will be removed during the formation of the trench regions;
driving impurities to the gettering sites; and
etching the substrate layer to form the trench regions at locations corresponding to at least a portion of the gettering sites, wherein the gettering sites and gettered impurities at the etched locations are removed during the etching of the trench regions.
2. The method as in claim 1 , further comprising prior to forming the gettering sites, forming a first masking layer over the substrate layer and patterning the masking layer to define openings where trench regions will be formed at a later time.
3. The method as in claim 2 , further comprising removing the first masking layer.
4. The method as in claim 3 , further comprising prior to etching the substrate layer to form the trench regions, forming a second masking layer over the substrate layer and patterning the second masking layer to define openings where trench regions will be formed.
5. The method as in claim 1 , wherein the trench regions comprise trench isolation regions.
6. The method as in claim 1 , wherein forming gettering sites in the substrate layer comprises:
implanting one ion into the substrate layer to form gettering sites at one depth in the substrate layer; and
implanting a different ion into the substrate layer to form gettering sites at another depth in the substrate layer.
7. The method as in claim 4 , further comprising:
prior to driving impurities to the gettering sites, forming a third masking layer over the substrate layer and patterning the third masking layer to define openings where trench regions will be formed at a later time;
implanting different ions into the substrate layer to form gettering sites in the substrate layer at a depth that will be removed during formation of the trench regions; and
removing the third masking layer.
8. The method as in claim 1 , wherein etching the substrate layer to form the trench regions comprises etching the substrate layer to form one set of trench regions at locations corresponding to locations of only a portion of the gettering sites.
9. The method as in claim 8 , further comprising at a later time etching the substrate layer to form another set of trench regions corresponding to locations of the remaining gettering sites.
10. A method for processing a substrate layer, comprising:
(a) forming a first masking layer over the substrate layer and patterning the masking layer to define openings where trench regions will be formed at a later time;
(b) forming gettering sites in the substrate layer at a depth that will be removed during formation of the trench regions;
(c) removing the first masking layer;
(d) driving impurities to the gettering sites;
(e) forming a second masking layer over the substrate layer and patterning the second masking layer to define openings where trench regions will be formed; and
(f) etching the substrate layer to form the trench regions at locations corresponding to at least a portion of the gettering sites, wherein the gettering sites and the gettered impurities at the etched locations are removed during the etching of the trench regions.
11. The method as in claim 10 , wherein the trench regions comprise trench isolation regions.
12. The method as in claim 10 , wherein (b) comprises:
implanting one ion into the substrate layer to form gettering sites at one depth in the substrate layer; and
implanting a different ion into the substrate layer to form gettering sites at another depth in the substrate layer.
13. The method as in claim 10 , further comprising:
prior to driving impurities to the gettering sites at (d), forming a third masking layer over the substrate layer and patterning the third masking layer to define openings where trench regions will be formed at a later time;
implanting different ions into the substrate layer to form gettering sites in the substrate layer at a depth that will be removed during formation of the trench regions; and
removing the third masking layer.
14. The method as in claim 10 , wherein (f) comprises etching the substrate layer to form one set of trench regions at locations corresponding to locations of only a portion of the gettering sites.
15. The method as in claim 14 , further comprising at a later time etching the substrate layer to form another set of trench regions corresponding to locations of the remaining gettering sites.
16. The method as in claim 10 , further comprising repeating (a)-(f) at a later time during the processing of the substrate layer.
17. The method as in claim 1 , wherein forming gettering sites in the substrate layer at locations where trench regions will be formed at a later time and at a depth that will be removed during the formation of the trench regions comprises implanting ions into the substrate layer to form gettering sites in the substrate layer at locations where trench regions will be formed at a later time and at a depth that will be removed during the formation of the trench regions.
18. The method as in claim 10 , wherein (b) comprises implanting ions into the substrate layer to form gettering sites in the substrate layer at locations where trench regions will be formed at a later time.