Semiconductor device and method of forming interconnect structure over seed layer on contact pad of semiconductor die without undercutting seed layer beneath interconnect structure

1. A method of making a semiconductor device, comprising:

providing a substrate;

forming a first conductive layer over the substrate;

forming a first insulating layer over the substrate including an opening in the first insulating layer disposed over the first conductive layer;

forming a second conductive layer over the first insulating layer and into the opening in the first insulating layer; and

forming a conductive pillar including a first region of the conductive pillar disposed within and terminating at the opening in the first insulating layer and extending outside a footprint of a second region of the conductive pillar disposed over the first region.

2. The method of claim 1 , further including forming a bump material over the conductive pillar.

3. The method of claim 1 , further including forming a second insulating layer over the substrate prior to forming the first conductive layer.

4. The method of claim 1 , wherein forming the conductive pillar includes:

forming a second insulating layer over the first insulating layer with an opening in the second insulating layer disposed over the first and second conductive layers, the opening in the second insulating layer including a width less than a width of the opening in the first insulating layer;

depositing a conductive material into the opening of the second insulating layer to form the conductive pillar; and

removing the second insulating layer to leave the conductive pillar with a width less than the width of the opening in the first insulating layer.

5. The method of claim 4 , further including forming the opening in the second insulating layer by laser direct ablation to expose the second conductive layer.

6. A method of making a semiconductor device, comprising:

providing a substrate;

forming a conductive layer over the substrate;

forming a first insulating layer over the substrate including an opening in the first insulating layer disposed over the conductive layer; and

forming an interconnect structure including a first region of the interconnect structure disposed within and terminating at the opening in the first insulating layer and extending outside a footprint of a second region of the interconnect structure disposed over the first region.

7. The method of claim 6 , wherein the interconnect structure includes a conductive pillar or conductive pad.

8. The method of claim 6 , further including forming a second insulating layer over the substrate prior to forming the conductive layer.

9. The method of claim 6 , wherein forming the interconnect structure includes:

forming a second insulating layer over the first insulating layer with an opening in the second insulating layer disposed over the opening in the first insulating layer, the opening in the second insulating layer including a width less than a width of the opening in the first insulating layer;

depositing a conductive material into the opening of the second insulating layer to form the interconnect structure; and

removing the second insulating layer to leave the interconnect structure with a width less than the width of the opening in the first insulating layer.

10. The method of claim 6 , wherein forming the interconnect structure includes:

forming a second insulating layer over the first insulating layer with an opening in the second insulating layer disposed over the opening in the first insulating layer, the opening in the second insulating layer including a width less than a width of the opening in the first insulating layer; and

depositing a first conductive material into the opening in the second insulating layer to form a first conductive pad.

11. The method of claim 7 , further including forming a bump material over the conductive pillar or conductive pad.

12. The method of claim 9 , further including forming the opening in the second insulating layer by laser direct ablation.

13. The method of claim 10 , wherein forming the interconnect structure further includes:

forming a masking layer over the first conductive material with an opening in the masking layer disposed over the first conductive pad, the opening in the masking layer including a width less than the width of the opening in the second insulating layer;

depositing a second conductive material into the opening in the masking layer to form a second conductive pad stacked over the first conductive pad;

removing the masking layer;

depositing a bump material over the first and second conductive pads; and

removing the second insulating layer to leave the interconnect structure.

14. A method of making a semiconductor device, comprising:

providing a substrate;

forming a first insulating layer over the substrate including an opening in the first insulating layer disposed over the substrate;

forming a first conductive layer over the first insulating layer and into the opening in the first insulating layer; and

forming an interconnect structure with a first portion of the interconnect structure disposed within the opening in the first insulating layer to a surface of the first insulating layer and a second portion of the interconnect structure disposed over the first portion of the interconnect structure including a width less than the opening in the first insulating layer.

15. The method of claim 14 , further including removing a portion of the first conductive layer over the first insulating layer outside the opening in the first insulating layer.

16. The method of claim 14 , further including forming a second conductive layer over the substrate prior to forming the first insulating layer, the opening in the first insulating layer being disposed over the second conductive layer.

17. The method of claim 14 , wherein the interconnect structure includes a conductive pillar or conductive pad.

18. The method of claim 14 , wherein forming the interconnect structure includes:

forming a second insulating layer over the first insulating layer with an opening in the second insulating layer disposed over the first conductive layer, the opening in the second insulating layer including a width less than a width of the opening in the first insulating layer;

depositing a conductive material into the opening in the second insulating layer to form the interconnect structure; and

removing the second insulating layer to leave the interconnect structure with the width less than the width of the opening in the first insulating layer.

19. The method of claim 14 , wherein forming the interconnect structure includes:

forming a second insulating layer over the first insulating layer with an opening in the second insulating layer disposed over the first conductive layer, the opening in the second insulating layer including a width less than a width of the opening in the first insulating layer; and

depositing a first conductive material into the opening in of the second insulating layer to form a first conductive pad.

20. The method of claim 19 , wherein forming the interconnect structure further includes:

forming a masking layer over the first conductive material with an opening in the masking layer disposed over the first conductive pad, the opening in the masking layer including a width less than the width of the opening in the second insulating layer;

depositing a second conductive material into the opening in the masking layer to form a second conductive pad stacked over the first conductive pad;

removing the masking layer;

depositing a bump material over the first and second conductive pads; and

removing the second insulating layer to leave the interconnect structure with the width less than the width of the opening in the first insulating layer.

21. A method of making a semiconductor device, comprising:

providing a substrate including a first insulating layer disposed over a surface of the substrate;

forming a first conductive layer in an opening of the first insulating layer; and

forming an interconnect structure including a first region of the interconnect structure disposed within and terminating at the opening of the first insulating layer to extend outside a footprint of a second region of the interconnect structure disposed over the first region.

22. The method of claim 21 , further including forming a second insulating layer over the first insulating layer.

23. The method of claim 21 , further including forming a second conductive layer over the substrate prior to forming the first insulating layer.

24. The method of claim 21 , wherein the interconnect structure includes a conductive pillar or conductive pad.

25. The method of claim 21 , further including forming a bump material over the interconnect structure.