Semiconductor device with partially-etched conductive layer recessed within substrate for bonding to semiconductor die
A semiconductor device has a substrate with a die attach area. A conductive layer is formed over a surface of the substrate and extending below the surface. An insulating layer is formed over the surface of the substrate outside the die attach area. A portion of the conductive layer is removed within the die attach area to expose sidewalls of the substrate. The remaining portion of the conductive layer is recessed below the surface of the substrate within the die attach area. A semiconductor die has bumps formed over its active surface. The semiconductor die is mounted to the substrate by bonding the bumps to the remaining portion of the first conductive layer recessed below the first surface of the substrate. The sidewalls of the substrate retain the bumps during bonding to the remaining portion of the conductive layer. An encapsulant is deposited between the semiconductor die and substrate.
1. A semiconductor device, comprising:
a substrate including a die attach area;
a first conductive layer recessed below a first surface of the substrate within the die attach area to expose sidewalls of the substrate; and
a semiconductor die including a plurality of bumps formed over the semiconductor die, the semiconductor die being disposed within the die attach area with the bumps bonded to the first conductive layer and contacting the sidewalls of the substrate.
2. The semiconductor device of claim 1 , wherein the first conductive layer within the die attach area is recessed 10-20 micrometers below the first surface of the substrate.
3. The semiconductor device of claim 1 , further including an insulating layer formed over the first surface of the substrate outside the die attach area.
4. The semiconductor device of claim 1 , further including an underfill material deposited between the semiconductor die and substrate.
5. The semiconductor device of claim 1 , further including:
a conductive via formed through the substrate; and
a second conductive layer formed over a second surface of the substrate opposite the first surface of the substrate, the second conductive layer being electrically connected to the conductive via.
6. The semiconductor device of claim 5 , further including a plurality of stacked semiconductor devices electrically connected through the bumps, first conductive layer, second conductive layer, and conductive via.
7. A semiconductor device, comprising:
a substrate including a die attach area;
a first conductive layer recessed below a first surface of the substrate within the die attach area to expose sidewalls of the substrate;
a semiconductor die disposed over the die attach area; and
a plurality of bumps disposed between the semiconductor die and the first conductive layer within the die attach area.
8. The semiconductor device of claim 7 , wherein the first conductive layer within the die attach area is recessed 10-20 micrometers below the first surface of the substrate.
9. The semiconductor device of claim 7 , further including an insulating layer formed over the first surface of the substrate outside the die attach area.
10. The semiconductor device of claim 7 , further including an underfill material deposited between the semiconductor die and substrate.
11. The semiconductor device of claim 7 , further including:
a conductive via formed through the substrate; and
a second conductive layer formed over a second surface of the substrate opposite the first surface of the substrate, the second conductive layer being electrically connected to the conductive via.
12. The semiconductor device of claim 11 , further including an insulating layer over the second conductive layer and second surface of the substrate.
13. The semiconductor device of claim 11 , further including a plurality of stacked semiconductor devices electrically connected through the bumps, first conductive layer, second conductive layer, and conductive via.
14. A semiconductor device, comprising:
a substrate; and
a first conductive layer recessed below a first surface of the substrate to expose sidewalls of the substrate.
15. The semiconductor device of claim 14 , further including a semiconductor die disposed over the substrate and electrically connected to the first conductive layer.
16. The semiconductor device of claim 15 , further including a plurality of bumps disposed between the semiconductor die and the first conductive layer.
17. The semiconductor device of claim 15 , further including an underfill material deposited between the semiconductor die and substrate.
18. The semiconductor device of claim 14 , wherein the first conductive layer is recessed 10-20 micrometers below the first surface of the substrate.
19. The semiconductor device of claim 14 , further including:
a conductive via formed through the substrate; and
a second conductive layer formed over a second surface of the substrate, the second conductive layer being electrically connected to the conductive via.
20. The semiconductor device of claim 19 , further including a plurality of stacked semiconductor devices electrically connected through the bumps, first conductive layer, second conductive layers, and conductive via.
21. A semiconductor device, comprising:
a substrate including a die attach area;
a first conductive layer recessed below a first surface of the substrate to expose sidewalls of the substrate; and
a semiconductor die disposed within the die attach area of the substrate.
22. The semiconductor device of claim 21 , further including a plurality of bumps disposed between the semiconductor die and the first conductive layer within the die attach area.
23. The semiconductor device of claim 21 , wherein the first conductive layer within the die attach area is recessed 10-20 micrometers below the first surface of the substrate.
24. The semiconductor device of claim 21 , further including an insulating layer formed over the first surface of the substrate outside the die attach area.
25. The semiconductor device of claim 21 , further including an underfill material deposited between the semiconductor die and substrate.