IP Library Granted Patent US 9,472,284
Granted Patent B2
US 9,472,284 · App. 13/680,719 · Granted Oct 18, 2016

Three-dimensional flash memory system

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Quick Facts
Patent No.
US 9,472,284
App. No.
13/680,719
Granted
Oct 18, 2016
Kind
B2
Abstract

A three-dimensional flash memory system is disclosed.

Claims (61)

1. A memory apparatus, comprising:

a first die comprising a first array of flash memory cells;

a first control circuit for generating sectors of a first size with the first array;

a second die comprising a second array of flash memory cells;

a second control circuit for generating sectors of a second size different than the first size within the second array; and

a plurality of TSV connections between the first die and second die.

2. The apparatus of claim 1 , wherein the first die comprises sensing circuitry.

3. The apparatus of claim 1 , wherein the first die comprises a first charge pump.

4. The apparatus of claim 3 , wherein the second die is configured to use the first charge pump in reading data from the second array.

5. The apparatus of claim 1 , wherein the first die comprises control logic.

6. The apparatus of claim 5 , wherein the second die is configured to use the control logic.

7. The apparatus of claim 1 , wherein the first size is eight bytes.

8. The apparatus of claim 1 , wherein the first size is four Kbytes.

9. The apparatus of claim 1 , wherein at least one of the sectors of a first size comprise multiple word lines, one erase gate, one source line, and one control gate.

10. The apparatus of claim 9 , wherein at least two of the sectors of a first size share the same word line.

11. The apparatus of claim 9 , wherein at least two of the sectors of a first size use different erase gates, different control gates, and different source lines.

12. The apparatus of claim 1 , wherein at least one of the sectors of a first size emulates an EEPROM sector.

13. The apparatus of claim 12 , wherein the at least one of the sectors of a first size that emulates an EEPROM sector comprises a plurality of word lines, one erase gate, one source line, and one control gate.

14. The apparatus of claim 12 , wherein at least two of the sectors of a first size that emulate an EEPROM sector share the same word line.

15. The apparatus of claim 12 , wherein at least two of the sectors of a first size that emulate an EEPROM sector use different erase gates, different control gates, and different source lines.

16. An memory apparatus, comprising:

a first die comprising a first array of flash memory cells;

a first control circuit for emulating an EEPROM with sectors of a first size using the first array;

a second die comprising a second array of flash memory cells;

a second control circuit for generating sectors of a second size different than the first size within the second array; and

a plurality of TSV connections between the first die and second die.

17. The apparatus of claim 16 , wherein the first die comprises sensing circuitry.

18. The apparatus of claim 16 , wherein the first die comprises a first charge pump.

19. The apparatus of claim 18 , wherein the second die is configured to use the first charge pump in operating on data from the second array.

20. The apparatus of claim 16 , wherein the first die comprises control logic.

21. The apparatus of claim 20 , wherein the second die is configured to use the control logic.

22. The apparatus of claim 16 , wherein the first die further comprises a buffer TSV circuit.

23. The apparatus of claim 16 , wherein the first die further comprises a test pad.

24. The apparatus of claim 16 , wherein the first die further comprises a sense circuit and a TSV is coupled to the source of a sensing cascoding device.

25. The apparatus of claim 16 , wherein the plurality of TSV connections comprise a plurality of shielded TSV connections.

26. A memory apparatus, comprising:

a first die comprising a first array of flash memory cells created by a first semiconductor process;

a second die comprising a second array of flash memory cells created by a second semiconductor process different than the first semiconductor process;

a plurality of TSV connections between the first die and second die.

27. The apparatus of claim 26 , wherein the first die comprises sensing circuitry.

28. The apparatus of claim 26 , wherein the first die comprises a first charge pump.

29. The apparatus of claim 28 , wherein the second die is configured to use the first charge pump in reading data from the second array.

30. The apparatus of claim 26 , wherein the first die comprises control logic.

31. The apparatus of claim 30 , wherein the second die is configured to use the control logic.

32. The apparatus of claim 26 , wherein the first semiconductor process is 32 nm.

33. The apparatus of claim 26 , wherein the first semiconductor process is 22 nm.

34. A memory apparatus, comprising:

a first die comprising a first array of flash memory;

a second die comprising a second array of flash memory cells;

a force-sense high voltage supply system for first and second dies; and

a plurality of TSV connections between the first die and second die.

35. The apparatus of claim 34 , wherein IO widths are configurable by combining first and second dies.

36. The apparatus of claim 34 , wherein the TSV connection integrity are testable by TSV self test engine on the first die.

37. The apparatus of claim 34 , wherein the force-sense scheme applying to source line current bias terminal of flash memory cell.

38. A memory apparatus, comprising:

a first die comprising a first array of flash memory cells;

a second die comprising a second array of flash memory cells;

a sensing circuit shared between the first die and second die;

a plurality of TSV connections between the first die and second die.

39. The apparatus of claim 38 , wherein an IO width of the memory apparatus is configurable by combining the first die and second die.

40. The apparatus of claim 39 , wherein the second die is configured to use the sensing circuit.

Assignments (15)
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0001 →
RELEASE OF SECURITY INTEREST Recorded Feb 28, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: SILICON STORAGE TECHNOLOGY, INC.
Reel/Frame 059687/0344 →
RELEASE OF SECURITY INTEREST Recorded Feb 25, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059333/0222 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
SECURITY INTEREST Recorded Sep 18, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 047103/0206 →
SECURITY INTEREST Recorded Jun 25, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 046426/0001 →
SECURITY INTEREST Recorded Feb 10, 2017
From: SILICON STORAGE TECHNOLOGY, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 041675/0316 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2012
From: TRAN, HIEU VAN; REITEN, MARK; NGUYEN, HUNG QUOC
To: SILICON STORAGE TECHNOLOGY, INC.
Reel/Frame 029322/0594 →