Semiconductor device and method of individual die bonding followed by simultaneous multiple die thermal compression bonding
View Patent ↗A semiconductor device includes a carrier with an interface layer applied over the carrier. The interface layer can include non-conductive paste or non-conductive film. A plurality of semiconductor die is mounted to the carrier and interface layer by pressing the semiconductor die to the carrier and interface layer for one second or less, and simultaneously thermal compression bonding multiple semiconductor die to the carrier and interface layer for 5-10 seconds. By pressing the semiconductor die to the interface layer for a short period of time and then simultaneously thermal compression bonding multiple semiconductor die to the interface layer for a second longer period of time, the overall throughput of die bonding increases to process more die per unit of time. An encapsulant is deposited over the semiconductor die. The carrier is removed and interconnect structure is formed over the semiconductor die and encapsulant.
1. A method of making a semiconductor device, comprising:
providing a carrier;
applying a non-conductive interface layer to the carrier;
providing a plurality of semiconductor dice including bumps;
temporarily mounting the plurality of semiconductor dice to the carrier and non-conductive interface layer by,
(a) pressing the bumps of a first semiconductor die of the plurality of semiconductor dice at least partially into the non-conductive interface layer while holding at a first pressure and first temperature for a first time period one second or less,
(b) pressing the bumps of a second semiconductor die of the plurality of semiconductor dice at least partially into the non-conductive interface layer while holding at the first pressure and the first temperature for the first time period, and
(c) after steps (a) and (b), simultaneously thermal compression bonding the first semiconductor die and the second semiconductor die of the plurality of semiconductor dice to the non-conductive interface layer while holding at a second pressure and second temperature greater than the first pressure and first temperature for a second time period greater than the first time period;
depositing an encapsulant over the plurality of semiconductor dice and the non-conductive interface layer;
removing the non-conductive interface layer and carrier; and
forming an interconnect structure over the plurality of semiconductor dice and encapsulant.
2. The method of claim 1 , wherein the first time period is one second or less and the second time period is 5-10 seconds.
3. The method of claim 1 , further including simultaneously thermal compression bonding a row of semiconductor dice to the non-conductive interface layer.
4. The method of claim 1 , wherein the non-conductive interface layer includes non-conductive paste or non-conductive film.
5. The method of claim 1 , wherein temporarily mounting the plurality of semiconductor dice reduces shifting of the plurality of semiconductor dice during depositing the encapsulant over the plurality of semiconductor dice.
6. A method of making a semiconductor device, comprising:
providing a carrier;
forming an interface layer over the carrier;
providing a plurality of semiconductor dice including bumps;
mounting the plurality of semiconductor dice to the interface layer by,
(a) pressing the bumps of the plurality of semiconductor dice at least partially into the interface layer while holding at a first pressure and first temperature for a first period of time, and
(b) simultaneously thermal compression bonding multiple semiconductor dice to the interface layer while holding at a second pressure and second temperature greater than the first pressure and first temperature for a second period of time longer than the first period of time; and
removing the interface layer and carrier.
7. The method of claim 6 , wherein the first period of time is one second or less.
8. The method of claim 6 , wherein the second period of time is 5-10 seconds.
9. The method of claim 6 , further including simultaneously thermal compression bonding a row of semiconductor dice to the carrier.
10. The method of claim 6 , further including simultaneously thermal compression bonding multiple rows of semiconductor dice to the carrier.
11. The method of claim 6 , further including depositing an encapsulant over the plurality of semiconductor dice.
12. The method of claim 6 , further including forming an interconnect structure over the plurality semiconductor dice.
13. A method of making a semiconductor device, comprising:
providing a carrier;
forming a non-conductive interface layer over the carrier;
providing a plurality of semiconductor dice including a first interconnect structure;
mounting the plurality of semiconductor dice to the carrier and non-conductive interface layer by,
(a) pressing the first interconnect structure of the plurality of semiconductor dice into the interface layer under a first pressure and first temperature for a first time period, and
(b) simultaneously thermal compression bonding multiple semiconductor dice to the non-conductive interface layer and carrier under a second pressure and second temperature greater than the first pressure and first temperature for a second time period longer than the first time period; and
removing the non-conductive interface layer and carrier.
14. The method of claim 13 , wherein the first interconnect structure includes bumps further including individually pressing the plurality of semiconductor dice to the carrier prior to the thermal compression bonding.
15. The method of claim 14 , wherein the first time period is one second or less.
16. The method of claim 13 , wherein the second time period is 5-10 seconds.
17. The method of claim 13 , further including simultaneously thermal compression bonding a row of semiconductor dice to the carrier.
18. The method of claim 13 , further including depositing an encapsulant over the plurality of semiconductor dice.
19. The method of claim 13 , further including forming a second interconnect structure over the plurality of semiconductor dice.
20. The method of claim 13 , wherein the non-conductive interface layer includes non-conductive paste or non-conductive film.
21. A method of making a semiconductor device, comprising:
providing a carrier;
forming an interface layer over the carrier;
providing a plurality semiconductor dice including a first interconnect structure;
mounting the plurality semiconductor dice to the carrier and interface layer by,
(a) pressing the plurality semiconductor dice into the interface layer under a first pressure and first temperature for a first time period, and
(b) simultaneously thermal compression bonding multiple semiconductor dice to the carrier under a second pressure and second temperature greater than the first pressure and first temperature for a second time period longer than the first time period; and
removing the interface layer and carrier.
22. The method of claim 21 , wherein the first time period is one second or less and the second time period is 5-10 seconds.
23. The method of claim 21 , further including:
curing the interface layer; and
depositing an encapsulant over the plurality semiconductor dice.
24. The method of claim 21 , further including forming a second interconnect structure over the plurality semiconductor dice and encapsulant after removing the interface layer.
25. The method of claim 21 , further including forming an interconnect structure over the plurality semiconductor dice prior to mounting the plurality semiconductor dice.
26. The method of claim 25 , wherein the interconnect structure includes bumps.