Double patterning method of forming semiconductor active areas and isolation regions
A method of forming active areas and isolation regions in a semiconductor substrate using a double patterning process. The method include forming a first material on the substrate surface, forming a second material on the first material, forming a plurality of first trenches into the second material wherein the plurality of first trenches are parallel to each other, forming a second trench into the second material wherein the second trench is perpendicular to and crosses the plurality of first trenches in a central region of the substrate, filling the first and second trenches with a third material, removing the second material to form third trenches in the third material that are parallel to each other and do not extend through the central region of the substrate, and extending the third trenches through the first material and into the substrate.
1. A method of processing a semiconductor substrate, comprising:
forming a first material on a substrate surface;
forming a second material on the first material;
forming a plurality of first trenches into the second material, wherein the plurality of first trenches are parallel to each other;
forming a second trench into the second material, wherein the second trench is perpendicular to and crosses the plurality of first trenches in a central region of the substrate;
filling the first and second trenches with a third material;
removing the second material to form third trenches in the third material that are parallel to each other and do not extend through the central region of the substrate; and
extending the third trenches through the first material and into the substrate.
2. The method of claim 1 , wherein the first material is silicon dioxide and the second material is polysilicon.
3. The method of claim 2 , wherein the third material is silicon dioxide.
4. The method of claim 1 , wherein the forming of the plurality of first trenches comprises:
forming a photo resist material on the second material;
selectively removing the photo resist material to expose columns of the second material; and
etching away the exposed columns of the second material.
5. The method of claim 4 , wherein the forming of the second trench comprises:
forming a second photo resist material on the second material;
selectively removing a strip of the second photo resist material to expose a row of the second material; and
etching away the exposed row of the second material.
6. The method of claim 1 , wherein the removing of the second material exposes portions of the first material.
7. The method of claim 6 , wherein the extending of the third trenches comprises:
etching away the exposed portions of the first material such that portions of the substrate are left exposed; and
performing an etch on the exposed portions of the substrate.
8. The method of claim 1 , further comprising:
filling the extended third trenches with insulation material.
9. The method of claim 1 , further comprising, after the extending of the third trenches:
removing the third material; and
removing the first material.
10. The method of claim 9 , further comprising, after the removing of the third and first material:
filling the third trenches in the substrate with insulation material.