Substrate processing apparatus
A transfer apparatus for transporting substrates in a transfer chamber having a first and second ends and two sides extending between the ends. The transfer apparatus includes a drive section, at least one base arm fixed at one end with respect to the transfer chamber and including at least one arm link rotatably coupled to the drive section and at least one transfer arm rotatably coupled to a common end of the base arm, the at least one transfer arm has two end effectors. The drive section has motors with three independent axes of rotation defining three degrees of freedom. One degree of freedom moves the at least one base arm horizontally for transporting the at least one transfer arm and two degrees of freedom drives the at least one transfer arm to extend and retract the at least one transfer arm and swap the two end effectors.
1. A substrate processing apparatus comprising:
at least one linearly elongated transfer chamber; and
a transfer apparatus disposed at least partly within the at least one linearly elongated transfer chamber, the transfer apparatus including:
a three axis drive section having motors with three independent axes of rotation defining but three degrees of freedom of drive section motion,
a base arm section is rotatably coupled to the three axis drive section, and
a transfer arm section is rotatably coupled to the base arm section, the transfer arm section having two end effectors,
wherein, but one degree of freedom of drive section motion of the three axis drive section moves the base arm section horizontally for transporting the transfer arm section and two degrees of freedom of drive section motion drive the transfer arm section to extend the transfer arm section, retract the transfer arm section, and swap p the two end effectors so that the transfer arm section transports substrates to and from two or more substrate holding stations of at least two linearly arranged substrate holding stations of the at least one linearly elongated transfer chamber, the extension into and the retraction from a respective substrate holding station by the transfer arm section positioned at the respective substrate holding station is independent of movement of the base arm section, wherein the base arm section is alternatively configured as a two link articulated base arm, or a one unarticulated link base arm, each link of the base arm being different and distinct from each link of the transfer arm section, and the three independent axes of rotation defining the but three degrees of freedom of drive section motion is common to both alternative base arm configurations.
2. The substrate processing apparatus of claim 1 , wherein the substrate processing apparatus is configured to handle 450 mm diameter wafers.
3. The substrate processing apparatus of claim 1 , wherein the substrate processing apparatus is configured to handle 200 mm diameter wafers, 300 mm diameter wafers, or flat panels for flat panel displays, light emitting diodes, organic light emitting diodes or solar arrays.
4. A transfer apparatus for transporting substrates in a transfer chamber having a first end and a second end and two sides extending between the ends, each side having at least two linearly arranged substrate holding stations and each end having at least one substrate holding station, the transfer apparatus comprising:
a three axis drive section;
a base arm fixed at one end with respect to the transfer chamber and including at least one arm link rotatably coupled to the three axis drive section; and
at least one transfer arm rotatably coupled to a second opposite end of the base arm, and the at least one transfer arm has two end effectors;
wherein the three axis drive section has motors with three independent axes of rotation defining but three degrees of freedom of drive section motion, but one degree of freedom of drive section motion of the three axis drive section moves the base arm horizontally for transporting the at least one transfer arm within the transfer chamber and two degrees of freedom of drive section motion of the three axis drive section drives the at least one transfer arm to extend the at least one transfer arm, retract the at least one transfer arm, and swap the two end effectors so that the at least one transfer arm transports substrates to and from two or more substrate holding stations of the two sides, each having at least two linearly arranged substrate holding stations, and to and from the at least one substrate holding station, where the extension into and the retraction from a respective substrate holding station by the at least one transfer arm positioned at the respective substrate holding station is independent of movement of the base arm, and where the base arm is alternatively configured as a two link articulated base arm, or a one unarticulated link base arm, each link of the base arm being different and distinct from each link of the at least one transfer arm, and the three independent axes of rotation defining the but three degrees of freedom of drive section motion is common to both alternative base arm configurations.
5. The transfer apparatus of claim 4 , wherein the at least one substrate holding station located between one or more of the first and second ends of the transfer chamber includes three load locks that are inline with each other on a same side of the transfer chamber or four load locks that are inline with each other on the same side of the transfer chamber.
6. The transfer apparatus of claim 4 , wherein the transfer apparatus is configured to handle 450 mm diameter wafers.
7. The transfer apparatus of claim 4 , wherein the transfer apparatus is configured to handle 200 mm diameter wafers, 300 mm diameter wafers, or flat panels for flat panel displays, light emitting diodes, organic light emitting diodes or solar arrays.
8. The transfer apparatus of claim 4 , wherein the three axis drive section includes a coaxial drive shaft arrangement.
9. The transfer apparatus of claim 4 , further comprising a z-axis drive configured to linearly move the at least one transfer arm in a direction substantially perpendicular to an axis of extension and retraction of the at least one transfer arm.
10. The transfer apparatus of claim 4 , wherein the at least one arm link is rotatably mounted at the one end to the three axis drive section at a drive axis and the at least one transfer arm is rotatably mounted to the second opposite end of the at least one arm link at a shoulder axis.
11. The transfer apparatus of claim 10 , wherein the three axis drive section includes a one degree of freedom drive disposed at the drive axis and a two degree of freedom drive disposed at the shoulder axis.
12. The transfer apparatus of claim 9 , wherein the one degree of freedom drive comprises a harmonic drive.
13. The transfer apparatus of claim 11 , wherein the two degree of freedom drive comprises a coaxial drive having an inner and outer drive shaft, wherein the outer drive shaft is rotatable independent of the inner drive shaft and supported by support bearings of the inner drive shaft.
14. The transfer apparatus of claim 4 , wherein the at least one arm link includes an upper arm link having first and second ends, and a forearm link having first and second ends, the upper arm link being rotatably mounted to the three axis drive section at the first end about a drive axis and the forearm link being rotatably mounted at a first end to the second end of the upper arm link.
15. The transfer apparatus of claim 14 , wherein the at least one transfer arm is rotatably mounted to the second end of the forearm link at a shoulder axis of rotation.
16. The transfer apparatus of claim 15 , wherein the forearm link is slaved to the three axis drive section so that the shoulder axis of rotation is substantially constrained to follow a substantially linear path.
17. A substrate processing apparatus comprising:
at least one transfer chamber forming a substantially sealed environment; and
at least one transfer apparatus disposed at least partly within each of the at least one transfer chamber, the at least one transfer apparatus includes:
a three axis drive section,
a base arm fixed at one end with respect to the transfer chamber and including at least one arm link, the base arm having one end rotatably coupled to the three axis drive section, and
at least one transfer arm rotatably coupled to a second opposite end of the base arm, and the at least one transfer arm has two end effectors,
wherein, the three axis drive section has motors with three independent axes of rotation defining but three degrees of freedom of drive section motion, but one degree of freedom of drive section motion of the three axis drive section moves the base arm for transporting the at least one transfer arm horizontally within a respective transfer chamber and two degrees of freedom of drive section motion of the three axis drive section drives the at least one transfer arm to extend the at least one transfer arm, retract the at least one transfer arm, and swap the two end effectors so that the at least one transfer arm transports substrates to and from two or more substrate holding stations of at least two linearly arranged substrate holding stations of the respective transfer chamber, where the extension into and the retraction from a respective substrate holding station by the at least one transfer positioned at the respective substrate holding station is independent of movement of the base arm, and where the base arm is alternatively configured as a two link articulated base arm, or a one unarticulated link base arm, each link of the base arm being different and distinct from each link of the at least one transfer arm, and the three independent axes of rotation defining the but three degrees of freedom of drive section motion is common to both alternative base arm configurations.
18. The substrate processing apparatus of claim 17 , wherein each of the at least one transfer chamber has a first end and a second end and two sides extending between the ends, each side having at least two linearly arranged substrate holding stations and each end having at least one substrate holding station and the transfer apparatus is configured to transfer substrates between the at least two linearly arranged substrate holding stations on each side of the transfer chamber and to the at least one substrate holding station located on each of the first and second ends of the transfer chamber.
19. The substrate processing apparatus of claim 18 , wherein the at least one substrate holding station located one or more of the first and second ends of the transfer chamber includes three inline load locks or four inline load locks.
20. The substrate processing apparatus of claim 17 , wherein the substrate processing apparatus is configured to handle 450 mm diameter wafers.
21. The substrate processing apparatus of claim 17 , wherein the substrate processing apparatus is configured to handle 200 mm diameter wafers, 300 mm diameter wafers, or flat panels for flat panel displays, light emitting diodes, organic light emitting diodes or solar arrays.
22. The substrate processing apparatus of claim 17 , wherein the at least one transfer chamber has a clustered configuration.
23. The substrate processing apparatus of claim 22 , wherein the clustered configuration is a dual cluster transfer chamber configuration or a triple cluster transfer chamber configuration.
24. The substrate processing apparatus of claim 17 , wherein at least one end of the at least one transfer chamber includes an equipment front end module for inserting or removing substrates from the substrate processing apparatus.
25. The substrate processing apparatus of claim 17 , wherein the at least one transfer chamber includes at least two linearly elongated transfer chambers communicably coupled to each other to form a combined linearly elongated transfer chamber.
26. The substrate processing apparatus of claim 25 , wherein at least one end of the combined linearly elongated transfer chamber includes an equipment front end module for inserting or removing substrates from the substrate processing apparatus.
27. The substrate processing apparatus of claim 17 , wherein the three axis drive section includes a coaxial drive shaft arrangement.
28. The substrate processing apparatus of claim 17 , wherein the at least one arm link of the base arm is rotatably mounted at the one end to the three axis drive section at a drive axis and the at least one transfer arm is rotatably mounted to the second opposite end of the at least one arm link at a shoulder axis of rotation.
29. The substrate processing apparatus of claim 17 , wherein the three axis drive section includes a one degree of freedom drive disposed at the drive axis and a two degree of freedom drive disposed at a shoulder axis of rotation of the at least one transfer arm.
30. The substrate processing apparatus of claim 29 , wherein the one degree of freedom drive comprises a harmonic drive.
31. The substrate processing apparatus of claim 29 , wherein the two degree of freedom drive comprises a coaxial drive having an inner and outer drive shaft, wherein the outer drive shaft is rotatable independent of the inner drive shaft and supported by support bearings of the inner drive shaft.
32. The substrate processing apparatus of claim 17 , wherein the at least one arm link of the base arm includes an upper arm link having a first and second ends, and a forearm link having a first and second end, the upper arm link being rotatably mounted to the three axis drive section at the first end about the drive axis and the forearm link being rotatably mounted at a first end to the second end of the upper arm link.
33. The substrate processing apparatus of claim 32 , wherein the at least one transfer arm is rotatably mounted to the second end of the forearm link at a shoulder axis of rotation.
34. The substrate processing apparatus of claim 32 , wherein the forearm link is slaved to the three axis drive section so that a shoulder axis of rotation of the at least one transfer arm is substantially constrained to follow a substantially linear path along a length of the at least one linearly elongated transfer chamber.