Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
Implementations disclosed herein generally provide a lift pin that can improve the deposition rate and uniform film thickness above lift pin areas. In one implementation, the lift pin includes a first end coupling to a shaft, the first end having a pin head, and the pin head having a top surface, wherein the top surface is planar and flat, and a second end coupling to the shaft, the second end having a flared portion, wherein the flared portion has an outer surface extended along a direction that is at an angle of about 110° to about 140° with respect to a longitudinal axis of the lift pin.
1. A lift pin for positioning a substrate relative to a substrate support, the lift pin comprising:
a first end having a pin head and a flared portion, wherein the pin head has a top surface, the top surface having a plurality of projections disposed at a center region of the top surface, and each of the projections having a height of about 0.002 inches and a diameter of about 0.03 to about 0.06 inches; and
a second end coupling to a shaft, the second end being opposed to the first end, wherein the flared portion has an outer surface extended along a direction that is at an angle of about 110° to about 140° with respect to a longitudinal axis of the lift pin.
2. The lift pin of claim 1 , wherein the top surface has a surface roughness of about 1.0 microns or less.
3. The lift pin of claim 1 , wherein the first end has a rounded corner at a peripheral edge of the top surface.
4. The lift pin of claim 1 , wherein the lift pin is comprised of aluminum nitride.
5. The lift pin of claim 1 , wherein the lift pin is comprised of aluminum oxide.
6. The lift pin of claim 1 , wherein the angle is about 120° to about 135°.
7. The lift pin of claim 1 , wherein the second end of the lift pin further comprises a shoulder.
8. The lift pin of claim 7 , wherein the shoulder has a first tapered end and a second tapered end, and the first tapered end transitions the shoulder with the shaft.
9. The lift pin of claim 7 , wherein the shoulder has a length approximately ⅓ of a length of the lift pin.
10. A substrate support assembly for processing a substrate, comprising:
a lift pin assembly having a plurality of lift pins, each lift pin comprising a first end and a second end, the second end opposing to the first end and coupled to a shaft, wherein each lift pin comprises aluminum nitride, and the first end comprising:
a pin head having a top surface, wherein the top surface has a plurality of projections disposed at a center region of the top surface, and each of the projections has a height of about 0.002 inches and a diameter of about 0.03 to about 0.06 inches; and
a flared portion coupling the pin head to the shaft, the flared portion having an outer surface extended along a direction that is at an angle of about 110° to about 140° with respect to a longitudinal axis of the lift pin;
a substrate support having a plurality of guide holes disposed therethrough, each guide hole having a sloped inner wall for accommodating a respective lift pin so that a distance between an upper surface of the projections and a bottom surface of a substrate to be disposed on the substrate support is about 2 mils to about 8.5 mils;
a lift plate for contacting and moving the lift pins; and
an actuator for controlling a elevation of the lift plate.
11. The substrate support assembly of claim 10 , wherein the angle is about 120° to about 135°.
12. The substrate support assembly of claim 10 , wherein each lift pin is made of aluminum nitride containing yttrium oxide of about 2 wt % to about 5 wt %.
13. A substrate support assembly, comprising:
a substrate support having a guide hole disposed therethrough, wherein the guide hole has a sloped inner wall;
a shaft sized to pass through the guide hole; and
a lift pin having a pin head coupled to the shaft through a flared portion,
wherein the lift pin has a plurality of projections disposed on a center region of the pin head, and each of the projections has a height of about 0.002 inches, and
wherein the flared portion sits on the sloped inner wall, and the flared portion has an outer surface extending along a direction that is at an angle of about 120° to about 135° with respect to a longitudinal axis of the shaft, the outer surface and the sloped inner wall providing a distance of about 2 mils to about 8.5 mils between an upper surface of the projections and a bottom surface of a substrate to be disposed on the substrate support.
14. The substrate support assembly of claim 13 , wherein the lift pin is made of aluminum nitride containing yttrium oxide of about 2 wt % to about 5 wt %.
15. The substrate support assembly of claim 14 , wherein each of the projections has a diameter of about 0.03 to about 0.06 inches.
16. The substrate support assembly of claim 15 , wherein each of the projections is hemispherical-shaped.