IP Library › Granted Patent US 10,008,519
Granted Patent B1
US 10,008,519 · App. 15/874,245 · Granted Jun 26, 2018

Display device and electronic device including the same

Inventor: Atsushi Umezaki (Kanagawa, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H01L27/1255G02F1/1368G02F1/13624G02F1/134309G02F1/136286G09G3/3266G09G3/3413G09G3/3614G09G3/3648G11C19/28H01L27/0629H01L27/124H01L27/1222H01L27/1225H01L27/3262H01L27/3265H01L27/3276H01L29/7869H01L29/78663H01L29/78672G09G2300/0426G09G2310/0235G09G2310/0251G09G2310/0286G09G2310/061G09G2310/08G09G2320/0252G09G2330/021
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Quick Facts
Patent No.
US 10,008,519
App. No.
15/874,245
Granted
Jun 26, 2018
Kind
B1
Abstract

It is an object to decrease the number of transistors connected to a capacitor. In a structure, a capacitor and one transistor are included, one electrode of the capacitor is connected to a wiring, and the other electrode of the capacitor is connected to a gate of the transistor. Since a clock signal is input to the wiring, the clock signal is input to the gate of the transistor through the capacitor. Then, on/off of the transistor is controlled by a signal which synchronizes with the clock signal, so that a period when the transistor is on and a period when the transistor is off are repeated. In this manner, deterioration of the transistor can be suppressed.

Claims (47)

1. A semiconductor device comprising a gate driver,

wherein the gate driver comprises a first transistor, a second transistor, and a third transistor,

wherein the first transistor comprises a first gate electrode, a first semiconductor layer above the first gate electrode, a first source electrode above the first semiconductor layer, and a first drain electrode above the first semiconductor layer,

wherein the second transistor comprises a second gate electrode, a second semiconductor layer above the second gate electrode, a second source electrode above the second semiconductor layer, and a second drain electrode above the second semiconductor layer,

wherein the third transistor comprises a third gate electrode, a third semiconductor layer above the third gate electrode, a third source electrode above the third semiconductor layer, and a third drain electrode above the third semiconductor layer,

wherein one of the first source electrode and the first drain electrode is electrically connected to a clock signal line,

wherein one of the second source electrode and the second drain electrode is electrically connected to a power supply line,

wherein one of the third source electrode and the third drain electrode is electrically connected to the power supply line,

wherein the other of the first source electrode and the first drain electrode is electrically connected to a gate signal line,

wherein the other of the second source electrode and the second drain electrode is electrically connected to the gate signal line,

wherein the other of the third source electrode and the third drain electrode is electrically connected to the gate signal line,

wherein, in the first transistor, an area where the other of the first source electrode and the first drain electrode overlaps with the first gate electrode is larger than an area where the one of the first source electrode and the first drain electrode overlaps with the first gate electrode,

wherein, in the second transistor, an area where the other of the second source electrode and the second drain electrode overlaps with the second gate electrode is smaller than an area where the one of the second source electrode and the second drain electrode overlaps with the second gate electrode, and

wherein, in the third transistor, an area where the other of the third source electrode and the third drain electrode overlaps with the third gate electrode is smaller than an area where the one of the third source electrode and the third drain electrode overlaps with the third gate electrode.

2. A semiconductor device comprising a gate driver,

wherein the gate driver comprises a first transistor, a second transistor, and a third transistor,

wherein the first transistor comprises a first gate electrode, a first semiconductor layer above the first gate electrode, a first source electrode above the first semiconductor layer, and a first drain electrode above the first semiconductor layer,

wherein the second transistor comprises a second gate electrode, a second semiconductor layer above the second gate electrode, a second source electrode above the second semiconductor layer, and a second drain electrode above the second semiconductor layer,

wherein the third transistor comprises a third gate electrode, a third semiconductor layer above the third gate electrode, a third source electrode above the third semiconductor layer, and a third drain electrode above the third semiconductor layer,

wherein one of the first source electrode and the first drain electrode is electrically connected to a clock signal line,

wherein one of the second source electrode and the second drain electrode is electrically connected to a power supply line,

wherein one of the third source electrode and the third drain electrode is electrically connected to the power supply line,

wherein the other of the first source electrode and the first drain electrode is electrically connected to a first gate signal line,

wherein the other of the second source electrode and the second drain electrode is electrically connected to the first gate signal line,

wherein the other of the third source electrode and the third drain electrode is electrically connected to the first gate signal line,

wherein the third gate electrode is electrically connected to a second gate signal line,

wherein, in the first transistor, an area where the other of the first source electrode and the first drain electrode overlaps with the first gate electrode is larger than an area where the one of the first source electrode and the first drain electrode overlaps with the first gate electrode,

wherein, in the second transistor, an area where the other of the second source electrode and the second drain electrode overlaps with the second gate electrode is smaller than an area where the one of the second source electrode and the second drain electrode overlaps with the second gate electrode, and

wherein, in the third transistor, an area where the other of the third source electrode and the third drain electrode overlaps with the third gate electrode is smaller than an area where the one of the third source electrode and the third drain electrode overlaps with the third gate electrode.

3. A semiconductor device comprising a gate driver,

wherein the gate driver comprises a first transistor, a second transistor, a third transistor, and a fourth transistor,

wherein the first transistor comprises a first gate electrode, a first semiconductor layer above the first gate electrode, a first source electrode above the first semiconductor layer, and a first drain electrode above the first semiconductor layer,

wherein the second transistor comprises a second gate electrode, a second semiconductor layer above the second gate electrode, a second source electrode above the second semiconductor layer, and a second drain electrode above the second semiconductor layer,

wherein the third transistor comprises a third gate electrode, a third semiconductor layer above the third gate electrode, a third source electrode above the third semiconductor layer, and a third drain electrode above the third semiconductor layer,

wherein the fourth transistor comprises a fourth gate electrode, a fourth semiconductor layer above the fourth gate electrode, a fourth source electrode above the fourth semiconductor layer, and a fourth drain electrode above the fourth semiconductor layer,

wherein one of the first source electrode and the first drain electrode is electrically connected to a clock signal line,

wherein one of the second source electrode and the second drain electrode is electrically connected to a power supply line,

wherein one of the third source electrode and the third drain electrode is electrically connected to the power supply line,

wherein one of the fourth source electrode and the fourth drain electrode is electrically connected to the power supply line,

wherein the other of the first source electrode and the first drain electrode is electrically connected to a gate signal line,

wherein the other of the second source electrode and the second drain electrode is electrically connected to the gate signal line,

wherein the other of the third source electrode and the third drain electrode is electrically connected to the gate signal line,

wherein the other of the fourth source electrode and the fourth drain electrode is electrically connected to the first gate electrode,

wherein, in the first transistor, an area where the other of the first source electrode and the first drain electrode overlaps with the first gate electrode is larger than an area where the one of the first source electrode and the first drain electrode overlaps with the first gate electrode,

wherein, in the second transistor, an area where the other of the second source electrode and the second drain electrode overlaps with the second gate electrode is smaller than an area where the one of the second source electrode and the second drain electrode overlaps with the second gate electrode,

wherein, in the third transistor, an area where the other of the third source electrode and the third drain electrode overlaps with the third gate electrode is smaller than an area where the one of the third source electrode and the third drain electrode overlaps with the third gate electrode, and

wherein, in the fourth transistor, an area where the other of the fourth source electrode and the fourth drain electrode overlaps with the fourth gate electrode is smaller than an area where the one of the fourth source electrode and the fourth drain electrode overlaps with the fourth gate electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 28, 2018
From: UMEZAKI, ATSUSHI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 045060/0636 →
Priority Claims (1)
JP 2008-304124 · Nov 28, 2008 · national
Continuity (4)
Continuation 15145908 · May 4, 2016
Continuation 14552547 · Nov 25, 2014
Continuation 13769999 · Feb 19, 2013
Continuation 12614852 · Nov 9, 2009
Cited By (5)
US 12,190,842 US 12,191,322 US 12,211,569 US 12,512,051 US 12,720,869