Solid-state imaging device and method of manufacturing the same, and imaging apparatus
A solid-state imaging device includes: a semiconductor substrate provided with an effective pixel region including a light receiving section that photoelectrically converts incident light; an interconnection layer that is provided at a plane side opposite to the light receiving plane of the semiconductor substrate; a first groove portion that is provided between adjacent light receiving sections and is formed at a predetermined depth from the light receiving plane side of the semiconductor substrate; and an insulating material that is embedded in at least a part of the first groove portion.
1. An imaging device, comprising:
a semiconductor substrate including an effective pixel region and an optical black region, wherein the effective pixel region of the semiconductor substrate includes a photoelectric conversion region, and wherein the semiconductor substrate has a first side and a second side opposite the first side;
a first trench disposed entirely in the optical black region of the semiconductor substrate in a cross-sectional view;
a first film disposed in the first trench in the cross-sectional view, wherein the first film includes a metal; and
a second film disposed in the first trench in the cross-sectional view, wherein the second film is disposed above the first side and extends outside of the first trench toward a side of the effective pixel region in the cross-sectional view.
2. The imaging device according to claim 1 , wherein the first film is comprised of tungsten.
3. The imaging device according to claim 1 , wherein the second film is comprised of a high-dielectric insulating film.
4. The imaging device according to claim 1 , wherein the first film is disposed above the second film in the cross-sectional view.
5. The imaging device according to claim 1 , wherein the first film is disposed above the first side in the optical black region.
6. The imaging device according to claim 1 , further comprising:
a second trench disposed in the effective pixel region of the semiconductor substrate in the cross-sectional view.
7. The imaging device according to claim 6 , wherein a width of the first trench is larger than a width of the second trench in the cross-sectional view.
8. The imaging device according to claim 1 , wherein the second film is comprised of a metallic oxide.
9. The imaging device according to claim 6 , wherein the second film extends into the second trench in the cross-sectional view.
10. The imaging device according to claim 1 , further comprising:
a wiring layer disposed adjacent to the second side.