IP Library Granted Patent US 12,016,181
Granted Patent B2
US 12,016,181 · App. 17/665,560 · Granted Jun 18, 2024

3D semiconductor device and structure with logic and memory

Inventors: Zvi Or-Bach (Haifa, IL); Jin-Woo Han (San Jose, CA)
Assignee: Monolithic 3D Inc.
H10B43/27H01L23/5283H01L27/0207H01L29/167H01L29/47H01L29/7827H01L29/792H10B43/10H10B43/20H10B41/10H10B41/20H10B53/20
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Quick Facts
Patent No.
US 12,016,181
App. No.
17/665,560
Filed
Feb 6, 2022
Granted
Jun 18, 2024
Kind
B2
Art Unit
2824
USPC
257/324
Abstract

A 3D device, the device including: a first level including logic circuits; a second level including a plurality of memory circuits, where the first level is bonded to the second level, where the bonded includes oxide to oxide bonds, and where the first level includes at least one voltage regulator circuit.

Claims (66)

1. A 3D device, the device comprising:

a first level comprising logic circuits; and

a second level comprising a plurality of memory circuits,

wherein said first level is bonded to said second level,

wherein said bonded comprises oxide to oxide bonds, and

wherein said first level comprises at least one voltage regulator circuit.

2. The 3D device of claim 1 ,

wherein said second level comprises gate all around memory cells.

3. The 3D device of claim 1 ,

wherein said device comprises redundancy circuits to replace at least one faulty logic circuit.

4. The 3D device of claim 1 ,

wherein said device comprises redundancy circuits to replace at least one faulty memory circuit.

5. The 3D device of claim 1 , further comprising:

a first memory cell; and

a second memory cell,

wherein said second memory cell overlays said first memory cell, and

wherein said first memory cell is self-aligned to said second memory cell, being processed following a same lithography step.

6. The 3D device of claim 1 ,

wherein said plurality of memory circuits comprise a multi-bit memory cell.

7. The 3D device of claim 1 ,

wherein said first level comprises a plurality of decoder circuits.

8. A 3D device, the device comprising:

a first level comprising logic circuits; and

a second level comprising a plurality of memory cells,

wherein said first level is bonded to said second level,

wherein said bonded comprises oxide to oxide bonds, and

wherein said logic circuits comprise at least one power down control circuit.

9. The 3D device of claim 8 ,

wherein said second level comprises gate all around memory cells.

10. The 3D device of claim 8 , further comprising:

a third level comprising a plurality of non-volatile memory cells,

wherein said third level overlays said second level, and

wherein said second level comprises a plurality of volatile memory cells.

11. The 3D device of claim 8 , further comprising:

a first memory cell; and

a second memory cell,

wherein said second memory cell overlays said first memory cell, and

wherein said first memory cell is self-aligned to said second memory cell, being processed following a same lithography step.

12. The 3D device of claim 8 , further comprising:

a third level comprising a plurality of memory cells, said third level overlaying said second level;

a fourth level overlaying said third level or underlying said first level,

wherein said fourth level comprises memory control circuits.

13. The 3D device of claim 8 ,

wherein said first level comprises differential signaling circuits.

14. The 3D device of claim 8 ,

wherein said second level comprises a thinned substrate, and

wherein said thinned substrate has a thickness less than 20 microns.

15. A 3D device, the device comprising:

a first level comprising logic circuits; and

a second level comprising a plurality of memory circuits,

wherein said first level is bonded to said second level,

wherein said bonded comprises oxide to oxide bonds, and

wherein said logic circuits comprise a plurality of antifuse structures.

16. The 3D device of claim 15 ,

wherein said second level comprises gate all around memory cells.

17. The 3D device of claim 15 ,

wherein said second level comprises at least one memory cell comprising a vertically oriented transistor channel.

18. The 3D device of claim 15 , further comprising:

a first memory cell; and

a second memory cell,

wherein said second memory cell overlays said first memory cell, and

wherein said first memory cell is self-aligned to said second memory cell, being processed following a same lithography step.

19. The 3D device of claim 15 ,

wherein said plurality of memory circuits comprise at least four independently controlled memory arrays.

20. The 3D device of claim 15 ,

wherein said device comprises redundancy circuits to replace a faulty circuit.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 6, 2022
From: OR-BACH, ZVI; HAN, JIN-WOO
To: MONOLITHIC 3D INC.
Reel/Frame 058901/0162 →
Continuity (13)
Continuation In Part 17524737 · Nov 11, 2021
Continuation In Part 17396711 · Aug 8, 2021
Continuation In Part 17063397 · Oct 5, 2020
Continuation In Part 16526763 · Jul 30, 2019
Continuation In Part 15990611 · May 26, 2018
Continuation 15333138 · Oct 24, 2016
Provisional Application 62307568 · Mar 14, 2016
Provisional Application 62286362 · Jan 23, 2016
Provisional Application 62276953 · Jan 10, 2016
Provisional Application 62271251 · Dec 27, 2015
Provisional Application 62266610 · Dec 12, 2015
Provisional Application 62246054 · Oct 24, 2015
Related Publication 20230146353A1 · May 11, 2023
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