Substrate cleaning device and substrate cleaning method
A substrate is held in a horizontal attitude by a substrate holder. At a processing position, a lower surface of the substrate held by the substrate holder is cleaned by a lower-surface brush. The lower-surface brush is cleaned by a brush cleaner at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below a processing position. The lower-surface brush is lifted and lowered by a lower-surface brush lifting-lowering driver between the processing position and the waiting position.
1. A substrate cleaning device comprising:
a substrate holder that holds a substrate in a horizontal attitude;
a lower-surface brush that cleans a lower surface of the substrate held by the substrate holder at a processing position;
a brush cleaner that cleans the lower-surface brush at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below the processing position;
a lifting-lowering supporter to which the lower-surface brush and the brush cleaner are attached; and
a lower-surface brush lifting-lowering driver that lifts and lowers the lower-surface brush between the processing position and the waiting position by lifting and lowering the lifting-lowering supporter,
wherein the brush cleaner is lifted and lowered together with the lower-surface brush by lifting and lowering of the lifting-lowering supporter, and cleans the lower surface brush by discharging a cleaning liquid to the lower-surface brush in a period during which at least the lower-surface brush is spaced apart from the substrate.
2. The substrate cleaning device according to claim 1 , further comprising an upper-surface cleaner that cleans an upper surface of the substrate held by the substrate holder,
wherein the lower-surface brush lifting-lowering driver lifts and lowers the lower-surface brush between the processing position and the waiting position such that a lower surface of the substrate and the lower-surface brush are cleaned in a period during which the upper surface of the substrate is cleaned by the upper-surface cleaner.
3. The substrate cleaning device according to claim 1 , wherein
the lower-surface brush lifting-lowering driver lifts and lowers the lower-surface brush repeatedly between the processing position and the waiting position such that a lower surface of the substrate and the lower-surface brush are cleaned multiple times.
4. The substrate cleaning device according to claim 1 , wherein
the brush cleaner includes a first liquid nozzle that discharges a cleaning liquid to a center portion of the lower-surface brush and a second liquid nozzle that discharges a cleaning liquid to an end portion of the lower-surface brush.
5. The substrate cleaning device according to claim 1 , wherein each of the substrate holder and the lower-surface brush has a circular outer shape, and a diameter of the lower-surface brush is larger than a diameter of the substrate holder.
6. The substrate cleaning device according to claim 1 , wherein each of the substrate and the lower-surface brush has a circular outer shape, and a diameter of the lower-surface brush is larger than ⅓ of a diameter of the substrate.
7. A substrate cleaning device comprising:
a substrate holder that holds a substrate in a horizontal attitude;
a lower-surface brush that cleans a lower surface of the substrate held by the substrate holder at a processing position;
a brush cleaner that cleans the lower-surface brush at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below the processing position; and
a lower-surface brush lifting-lowering driver that lifts and lowers the lower-surface brush between the processing position and the waiting position,
wherein the brush cleaner includes a cleaning tank that stores a cleaning liquid in which the lower-surface brush is immersed.
8. A substrate cleaning method including:
holding a substrate in a horizontal attitude using a substrate holder;
cleaning a lower surface of the substrate held by the substrate holder using a lower-surface brush attached to a lifting-lowering supporter at a processing position;
cleaning the lower-surface brush using a brush cleaner attached to the lifting-lowering supporter at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below the processing position; and
lifting and lowering the lower-surface brush between the processing position and the waiting position by lifting and lowering the lifting-lowering supporter,
wherein the brush cleaner is lifted and lowered together with the lower-surface brush by lifting and lowering of the lifting-lowering supporter, and
the cleaning the lower-surface brush includes discharging a cleaning liquid to the lower-surface brush by the brush cleaner in a period during which at least the lower-surface brush is spaced apart from the substrate.
9. The substrate cleaning method according to claim 8 , further including cleaning an upper surface of the substrate held by the substrate holder using an upper-surface cleaner, wherein
a lower surface of the substrate and the lower-surface brush are cleaned in a period during which the upper surface of the substrate is cleaned by the upper-surface cleaner.
10. The substrate cleaning method according to claim 8 , wherein
the lifting and lowering the lower-surface brush between the processing position and the waiting position is repeated such that a lower surface of the substrate and the lower-surface brush are cleaned multiple times.
11. The substrate cleaning method according to claim 8 , wherein
the cleaning the lower-surface brush using a brush cleaner includes discharging a cleaning liquid to a center portion of the lower-surface brush using a first liquid nozzle and discharging a cleaning liquid to an end portion of the lower-surface brush using a second liquid nozzle.
12. The substrate cleaning method according to claim 8 , wherein each of the substrate holder and the lower-surface brush has a circular outer shape, and a diameter of the lower-surface brush is larger than a diameter of the substrate holder.
13. The substrate cleaning method according to claim 8 , wherein each of the substrate and the lower-surface brush has a circular outer shape, and a diameter of the lower-surface brush is larger than ⅓ of a diameter of the substrate.
14. A substrate cleaning method including:
holding a substrate in a horizontal attitude using a substrate holder;
cleaning a lower surface of the substrate held by the substrate holder using a lower-surface brush at a processing position;
cleaning the lower-surface brush using a brush cleaner at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below the processing position; and
lifting and lowering the lower-surface brush between the processing position and the waiting position,
wherein the cleaning the lower-surface brush using a brush cleaner includes immersing the lower-surface brush in a cleaning liquid stored in a cleaning tank.