Pellicle membrane with improved properties
A pellicle assembly includes a pellicle membrane with a nanotube layer formed from thick nanotube bundles. The pellicle membrane can be formed with multiple layers and has a combination of long lifetime, high transmittance, low deflection, and small pore size. A conformal coating may applied to an outer surface of the pellicle membrane. The conformal coating protects the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
1 . A method of forming a pellicle assembly, comprising:
reducing a thickness of an initial membrane to obtain a first nanotube layer for a pellicle membrane, wherein the initial membrane is formed from thick nanotube bundles which have an average diameter of 25 nanometers or greater and which are formed from 25 or more nanotubes;
reducing a thickness of at least one second membrane to obtain at least one second nanotube layer for the pellicle membrane, wherein the at least one second membrane is formed from thin nanotube bundles which have an average diameter of about 4 nanometers to about 20 nanometers, and which include from one to 20 nanotubes;
joining the first nanotube layer and the at least one second nanotube layer together to form the pellicle membrane; and
affixing the pellicle membrane to a mounting frame to obtain the pellicle assembly.
2 . The method of claim 1 , wherein the first nanotube layer has pores with an average diameter of about 1 nanometer to about 100 nanometers.
3 . The method of claim 1 , wherein each thick nanotube bundle is formed from multi-wall nanotubes.
4 . The method of claim 1 , wherein the pellicle membrane further comprises a graphene membrane layer.
5 . The method of claim 1 , wherein the first nanotube layer is placed between two second nanotube layers that are formed from thin nanotube bundles.
6 . The method of claim 1 , wherein the thick nanotube bundles comprise carbon nanotubes, boron nitride nanotubes, silicon carbide nanotubes, molybdenum disulfide nanotubes, molybdenum diselenide nanotubes, tungsten disulfide nanotubes, or tungsten diselenide nanotubes.
7 . The method of claim 1 , wherein a conformal coating is applied to at least an outer surface of the pellicle membrane.
8 . The method of claim 7 , wherein the conformal coating comprises B, BN, B 4 C, B 2 O 3 , B 6 Si, SiN, Si 3 N 4 , SiN 2 , SiC, SiZr, SiC x N y , Nb, NbN, NbSi, NbSiN, Nb 2 O 5 , NbTi x N y , NbC, Nb 5 Si 3 , ZrN x , ZrY x O y , ZrF, ZrF 4 , ZrSi 2 , YN, Y 2 O 3 , YF, Mo, Mo 2 N, MoSi, MoSi 2 , MoSiN, MOC 2 , MOC, MoS 2 , MON, Ru, RuNb, RuSiN, RuO 2 , TIN, TiC x N y , HfO 2 , HfN x , HfF 4 , VN, Rh, Pt, Pd, W, Cr, Ni, Fe, Co, Ag, Au, Zr, Y, or a composite thereof.
9 . The method of claim 7 , wherein the coating is in the form of a continuous film, nano-grains, nano-particles, or nano-sheets.
10 . The method of claim 1 , wherein the thickness of the initial membrane is reduced by applying pressure.
11 . The method of claim 1 , wherein the thickness of the initial membrane is reduced by:
stretching the initial membrane using a stretching frame to obtain an extended membrane;
affixing a mounting frame to a portion of the extended membrane; and
separating the mounting frame and the portion of the extended membrane from the remainder of the extended membrane, to obtain the pellicle assembly.
12 . The method of claim 11 , wherein the initial membrane is stretched biaxially.
13 . The method of claim 1 , further comprising annealing the initial membrane while stretching the initial membrane.
14 . The method of claim 13 , wherein the initial membrane is annealed at a temperature of about 200° C. to about 800° C.
15 . The method of claim 13 , further comprising flowing an inert gas past the initial membrane during the stretching.
16 . A method of forming a pellicle assembly, comprising:
reducing a thickness of an initial membrane to obtain a first nanotube layer for a pellicle membrane, wherein the initial membrane is formed from thick nanotube bundles which have an average diameter of 25 nanometers or greater and which are formed from multi-wall nanotubes and which include at least 25 nanotubes;
combining the first nanotube layer with a second nanotube layer formed from thin nanotube bundles to form the pellicle membrane, wherein the thin nanotube bundles have an average diameter of about 4 nanometers to about 20 nanometers, and include from one to 20 nanotubes; and
affixing the pellicle membrane to a mounting frame to obtain the pellicle assembly.
17 . The method of claim 16 , further comprising applying a conformal coating to at least an outer surface of the pellicle membrane prior to affixing the pellicle membrane.
18 . A method for processing a semiconductor wafer substrate, comprising:
receiving a semiconductor wafer substrate;
forming a photoresist layer on the semiconductor wafer substrate;
exposing the photoresist layer to radiation from a reflective photomask in an exposure tool;
wherein the radiation passes through a pellicle membrane that comprises; a first nanotube membrane layer formed by reducing a thickness of a first membrane formed from thick nanotube bundles which have an average diameter of 25 nanometers or greater, and which are formed from multi-wall nanotubes, and which include at least 25 nanotubes; and
a second nanotube layer formed by reducing a thickness of a second membrane formed from thin nanotube bundles which have an average diameter of about 4 nanometers to about 20 nanometers, and include from one to 20 nanotubes.
19 . The method of claim 18 , wherein the pellicle membrane further comprises a conformal coating on at least an outer surface of the pellicle membrane.
20 . The method of claim 18 , wherein the exposure tool is an EUV lithography system or an EUV lithography system having a numerical aperture of greater than 0.5.