Hybrid edge couplers with voids
The present disclosure relates to semiconductor structures and, more particularly, to hybrid edge couplers with voids and methods of manufacture. The structure includes: a dielectric material; at least one waveguide structure embedded within the dielectric material; and at least one airgap within the dielectric material and extending along a length of the at least one waveguide structure.
1. A structure comprising:
a semiconductor on insulator substrate comprising a buried oxide layer on a semiconductor substrate;
a dielectric material on the buried oxide layer;
at least one waveguide structure embedded within the dielectric material;
at least one airgap within the dielectric material and extending along a length of the at least one waveguide structure;
back end of the line metallization features provided at an end of the at least one waveguide structure and within the dielectric material; and
a fiber optic aligned with and spaced away from the at least one waveguide structure, the fiber optic includes a fiber cladding surrounding a fiber core.
2. The structure of claim 1 , wherein the at least one airgap is one of under, over and on a same level as the at least one waveguide structure, wherein the at least one waveguide structure and the at least one airgap are both within the dielectric material and are separated from one another by the dielectric material.
3. The structure of claim 1 , wherein the at least one waveguide structure comprises two waveguide structures and the at least one airgap is between the two waveguide structures on a same level.
4. The structure of claim 1 , wherein the at least one airgap comprises two airgaps on opposing sides of the at least one waveguide structure on a same level.
5. The structure of claim 1 , wherein the at least one waveguide structure comprises a plurality of waveguide structures, and the at least one airgap comprises multiple airgaps at a same level as a subset of the plurality of waveguide structures.
6. The structure of claim 5 , wherein the plurality of waveguide structures comprise a same material.
7. The structure of claim 5 , wherein at least one waveguide structure of the plurality of waveguide structures comprises a combination of stripes and partial stripes and comprises a different material than remaining waveguide structures of the plurality of waveguide structures.
8. The structure of claim 5 , wherein the multiple airgaps are on two levels corresponding with the plurality of waveguide structures.
9. The structure of claim 5 , wherein the multiple airgaps are on multiple levels, and one of the multiple levels is between the at least two of the plurality of waveguide structures on different levels.
10. The structure of claim 1 , wherein the at least one waveguide structure comprises adjacent waveguide structures and the at least one airgap partially extends along a length between the adjacent waveguide structures.
11. The structure of claim 1 , wherein the at least one airgap fully extends along a length between adjacent waveguide structures.
12. The structure of claim 1 , wherein the at least one airgap extends between and above adjacent waveguide structures.
13. A structure comprising:
a plurality of waveguide structures embedded within a dielectric material, the dielectric material being different than material of the plurality of waveguide structures;
at least one airgap adjacent to and extending along a length of the plurality of waveguide structures within the dielectric material and separated from the plurality of waveguide structures by a layer of the dielectric material;
back end of the line metallization features provided at an end of at least one waveguide structure of the plurality of waveguide structures and within the dielectric material; and
a fiber optic aligned with and spaced away from the at least one waveguide structure.
14. The structure of claim 13 , wherein the plurality of waveguide structures and the at least one airgap are on a same level in the dielectric material.
15. The structure of claim 13 , wherein the plurality of waveguide structures are on a different level than the least one airgap in the dielectric material.
16. The structure of claim 13 , wherein the plurality of waveguide structures comprise a subset of waveguide structures on a different level than remaining waveguide structures and the at least one airgap is on a same level as the subset of waveguide structures.
17. The structure of claim 16 , wherein the least one airgap comprises plural airgaps on a same level as the subset of waveguide structures and the remaining waveguide structures.
18. The structure of claim 16 , wherein one airgap of the plural airgaps is between the subset of waveguide structures and the remaining waveguide structures.
19. The structure of claim 13 , wherein the least one airgap comprises multiple airgaps, wherein the multiple airgaps extend partially along a length of a first waveguide structure of the plurality of waveguide structures and fully along a length of a subset of the plurality of waveguide structures, with the dielectric material separates the multiple airgaps from the first waveguide structure and the multiple airgaps from the subset of the plurality of waveguide structures.
20. A method comprising:
forming at least one waveguide structure embedded within dielectric material; and
forming at least one airgap within the dielectric material and extending along a length of the at least one waveguide structure;
forming back end of the line metallization features provided at an end of at least one waveguide structure of the plurality of waveguide structures and within the dielectric material; and
forming a fiber optic aligned with and spaced away from the at least one waveguide structure.