IP Library Granted Patent US 12,625,302
Granted Patent B2
US 12,625,302 · App. 18/209,014 · Granted May 12, 2026

Low-color scratch-resistant articles with a multilayer optical film

Inventors: Robert Alan Bellman (Ithaca, NY); Shandon Dee Hart (Elmira, NY); Karl William Koch, III (Elmira, NY); Charles Andrew Paulson (Painted Post, NY); James Joseph Price (Corning, NY)
Assignee: CORNING INCORPORATED
G02B1/14C03C17/3435G02B1/10G02B1/113G02B1/115C03C2217/734C03C2217/78Y10T428/24942Y10T428/315
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Quick Facts
Patent No.
US 12,625,302
App. No.
18/209,014
Filed
Jun 13, 2023
Granted
May 12, 2026
Kind
B2
Art Unit
2872
USPC
359/580
Abstract

Articles that exhibit scratch-resistance and improved optical properties. In some examples, the article exhibits a color shift of about 2 or less, when viewed at an incident illumination angle in the range from about 0 degrees to about 60 degrees from normal under an illuminant. In one or more embodiments, the articles include a substrate, and an optical film disposed on the substrate. The optical film includes a scratch-resistant layer and an optical interference layer. The optical interference layer may include one or more sub-layers that exhibit different refractive indices. In one example, the optical interference layer includes a first low refractive index sub-layer and a second a second high refractive index sub-layer. In some instances, the optical interference layer may include a third sub-layer.

Claims (59)

1 . A cover article comprising:

a substrate having a surface, and

an optical film disposed on the substrate surface forming a coated surface, the optical film comprising a scratch-resistant layer and an optical interference layer;

wherein the optical interference layer comprises a first low refractive index (RI) sub-layer and a second high refractive index (RI) sub-layer, wherein the difference between the refractive index of the first low RI sub-layer and the refractive index of the second high RI sub-layer is 0.01 or greater;

wherein the cover article comprises an average hardness of 8 GPa or greater, as measured by a Berkovich Indenter Hardness Test along indentation depths of 100 nm or greater;

wherein the cover article further comprises a color shift of 2 or less, when viewed at each of the incident illumination angles in the range from 5 degrees to about 45 degrees from normal incidence under an illuminant comprising CIE A illuminants, CIE B illuminants, CIE C illuminants, CIE D illuminants or CIE F illuminants; and

further wherein color shift is determined by the equation √((a* 2 −a*i) 2 +(b* 2 −b*i) 2 ), where a*i and b*i are coordinates of the article when viewed at normal incidence and a*2 and b*2 are coordinates of the article viewed at each of the incident illumination angles, and wherein the coordinates of the article when viewed at normal incidence and at each of the incident illumination angles are both in transmittance or reflectance.

2 . The cover article of claim 1 , wherein the scratch-resistant layer comprises one or more of AlN, Si 3 N 4 , AlO x N y , SiO x N y , Al 2 O 3 , Si x C y , Si x O y C z , ZrO 2 , TiO x N y , diamond, diamond-like carbon, silicon nitride, silicon oxynitride, and Si u Al v O x N y .

3 . The cover article of claim 1 , wherein the scratch-resistant layer has a physical thickness of from 0.1 micrometres to 3 micrometres.

4 . The cover article of claim 1 , wherein the cover article comprises a color shift of 2 or less, when viewed at least one incident illumination angle in the range from 5 degrees to 60 degrees from normal incidence under an illuminant comprising CIE A illuminants, CIE B illuminants CIE C illuminants, CIED illuminants or CIEF illuminants, and further wherein color shift is determined by the equation √((a* 2 −a* 1 ) 2+(b* 2 −b* 1 ) 2 ), where a* 1 and b* 1 are coordinates of the article when viewed at normal incidence and a* 2 , and b* 2 are coordinates of the article viewed at the at least one incident illumination angle, and wherein the coordinates of the article when viewed at normal incidence and at the at least one incident illumination angle are both in transmittance or reflectance.

5 . The cover article of claim 1 , wherein the first low RI sub-layer comprises a contiguous and uninterrupted sub-layer of SiO 2 that is disposed in direct contact with the substrate surface.

6 . The cover article of claim 1 , wherein the first low RI sub-layer has a refractive index from about 1.4 to about 1.5, as measured from about 380 nm to about 750 nm.

7 . The cover article of claim 1 , wherein the optical interference layer comprises a physical thickness of (1) from about 50 nm to about 300 nm, (2) from about 50 nm to about 450 nm, (3) from 50 nm to about 500 nm or (4) from 50 nm to about 800 nm.

8 . The cover article of claim 1 , wherein the second high RI sub-layer comprises an optical thickness (n*d) in the range from about 2 nm to about 200 nm where n is the refractive index and d is the physical thickness of the second high RI sub-layer.

9 . The cover article of claim 1 , wherein the substrate comprises a glass selected from the group consisting of soda lime glass, alkali aluminosilicate glass, alkali containing borosilicate glass and alkali aluminoborosilicate glass.

10 . The cover article of claim 1 , wherein the substrate comprises a crystalline substrate, or a glass ceramic substrate.

11 . The cover article of claim 1 , wherein:

the first low RI sub-layer comprises silicon-containing oxide disposed on the substrate surface, and a physical thickness from 12 nm to about 135 nm;

the second high RI sub-layer comprises a silicon-containing nitride or a silicon-containing oxynitride; and,

the scratch resistant layer comprises a silicon-containing nitride, a silicon-containing oxynitride or Si u Al v O x N y , and a physical thickness of from 0.1 micrometres to 3 micrometres.

12 . The cover article of claim 11 , wherein:

the silicon-containing oxide comprises SiO 2 or SiO,

the silicon-containing nitride comprises Si 3 N 4 , and

the silicon-containing oxynitride comprises Si u Al v O x N y or SiO x N y .

13 . The cover article of claim 1 , wherein the cover article is part of a smart phone, a mobile phone, a tablet, a computer, or a navigation system.

14 . The cover article of claim 1 , wherein the optical interference layer further comprises a third sub-layer which has (1) a same RI as the first low RI sub-layer; (2) a same RI as the second high RI sub-layer, or (3) a medium RI that is between the RI of the first low RI sub-layer and the RI of the second high RI sub-layer.

15 . The cover article of claim 1 , further comprises:

a capping layer disposed on the scratch-resistant layer, the capping layer comprises a contiguous and uninterrupted sub-layer of SiO 2 , and a physical thickness of from 0 to 100 nm.

16 . The cover article of claim 1 , further comprises:

a capping layer disposed on the scratch-resistant layer, the capping layer comprises two or more materials or two or more sub-layers.

17 . The cover article of claim 16 , wherein the two or more sub-layers of the capping layer have different refractive indices and include layers with high refractive indices (H) and low refractive indices (L) where the high refractive indices (H) and the low refractive indices (L) are with respect to one another.

18 . The cover article of claim 17 , wherein the two or more sub-layers of the capping layer are arranged so that high and low refractive index sub-layers alternate.

19 . The cover article of claim 18 , wherein the two or more sub-layers of the capping layer have a thickness each or combined in the range from about 4 nm to about 50 nm.

20 . The cover article of claim 16 , wherein the capping layer includes a silane-based low-friction sub-layer having a thickness in the range from about 0.1 nm to about 20 nm, disposed on underlying sub-layers of the capping layer.

21 . The cover article of claim 1 , wherein the cover article further comprises a crack mitigating layer.

22 . The cover article of claim 1 , wherein the cover article further comprises a color shift of 2 or less, when viewed at each of the incident illumination angles in the range from about 5 degrees to about 60 degrees from normal incidence under an illuminant comprising CIE A illuminants, CIE B illuminants, CIE C illuminants, CIE D illuminants or CIE F illuminants.

23 . A cover article comprising:

a substrate having a surface, and

an optical film disposed on the substrate surface forming a coated surface, the optical film having a physical thickness in a range from about 0.1 μm to about 3 μm;

wherein the optical film comprises an average hardness in a range from about 8 GPa to about 30 GPa as measured by a Berkovich Indenter Hardness Test along indentation depths of 100 nm or greater; and,

wherein the cover article exhibits an average transmittance of 85% or greater over the visible spectrum;

wherein the cover article further comprises a color shift of 2 or less, when viewed at least one incident illumination angle in the range from about 5 degrees to about 60 degrees from normal incidence under an illuminant comprising CIE A illuminants, CIE B illuminants, CIE C illuminants, CIE D illuminants or CIE F illuminants; and

further wherein color shift is determined by the equation √((a* 2 −a* 1 ) 2 +(b* 2 −b* 1 ) 2 ), where a* 1 and b* 1 are coordinates of the article when viewed at normal incidence and a* 2 and b* 2 are coordinates of the article viewed at the at least one incident illumination angle, and wherein the coordinates of the article when viewed at normal incidence and at the at least one incident illumination angle are both in transmittance or reflectance.

24 . The cover article of claim 23 , wherein the optical film further comprising a scratch-resistant layer and an optical interference layer, wherein the optical interference layer disposed between the scratch-resistant layer and the substrate.

25 . The cover article of claim 24 , wherein the scratch-resistant layer comprises one or more of AlN, Si 3 N 4 , AlO x N y , SiO x N y , Al 2 O 3 , Si x C y , Si x O y C z , ZrO 2 , TiO x N y , diamond, diamond-like carbon, silicon nitride, silicon oxynitride, and Si u Al v O x N y .

26 . The cover article of claim 24 , wherein the optical interference layer comprises a first low refractive index (RI) sub-layer and a second high refractive index (RI) sub-layer, wherein:

the first low RI sub-layer comprises at least one of SiO 2 , Al 2 O 3 , GeO 2 , SiO, AlO x N y , SiO x N y , Si u Al v O x N y , MgO, MgF 2 , BaF 2 , CaF 2 , DyF 3 , YbF 3 , YF 3 , and CeF 3 ; and

the second high RI sub-layer comprises at least one of Si u Al v O x N y , Ta 2 O 5 , Nb 2 O 5 , AlN, Si 3 N 4 , AlO x N y , SiO x N y , HfO 2 , TiO 2 , ZrO 2 , Y 2 O 3 , Al 2 O 3 , and MoO 3 .

27 . The cover article of claim 23 , wherein the substrate comprises a crystalline substrate, or a glass ceramic substrate.

28 . The cover article of claim 23 , wherein the cover article is part of a smart phone, a mobile phone, a tablet, a computer, or a navigation system.

29 . A cover article comprising:

a substrate having a surface;

an optical film disposed on the substrate surface forming a coated surface, the optical film comprising a scratch-resistant layer and an optical interference layer disposed between the scratch-resistant layer and the substrate;

wherein the optical interference layer comprises a first low refractive index (RI) sub-layer and a second high refractive index (RI) sub-layer;

wherein the first low RI sub-layer comprises silicon-containing oxide disposed on the substrate surface;

wherein the second high RI sub-layer comprises a silicon-containing nitride or a silicon-containing oxynitride;

wherein the scratch resistant layer comprises a silicon-containing nitride, a silicon-containing oxynitride or Si u Al v O x N y ;

wherein the cover article further comprises a color shift of 2 or less, when viewed at least one incident illumination angle in the range from about 5 degrees to about 60 degrees from normal incidence under an illuminant comprising CIE A illuminants, CIE B illuminants, CIE C illuminants, CIE D illuminants or CIE F illuminants; and

further wherein color shift is determined by the equation √((a* 2 −a* 1 ) 2 +(b* 2 −b* 1 ) 2 ), where a* 1 and b* 1 are coordinates of the article when viewed at normal incidence and a* 2 and b* 2 are coordinates of the article viewed at the at least one incident illumination angle, and wherein the coordinates of the article when viewed at normal incidence and at the at least one incident illumination angle are both in transmittance or reflectance.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 13, 2023
From: BELLMAN, ROBERT ALAN; HART, SHANDON DEE; KOCH, KARL WILLIAM, III; PAULSON, CHARLES ANDREW; PRICE, JAMES JOSEPH
To: CORNING INCORPORATED
Reel/Frame 063931/0703 →
Continuity (11)
Continuation 17529352 · Nov 18, 2021
Continuation 16386759 · Apr 17, 2019
Continuation 15142508 · Apr 29, 2016
Division 14480898 · Sep 9, 2014
Continuation In Part 14331656 · Jul 15, 2014
Continuation 14262066 · Apr 25, 2014
Provisional Application 62034412 · Aug 7, 2014
Provisional Application 61954697 · Mar 18, 2014
Provisional Application 61877568 · Sep 13, 2013
Provisional Application 61820407 · May 7, 2013
Related Publication 20230324583A1 · Oct 12, 2023
References Cited (400)
US 3067021A · Pelley et al. · 1962 [cited by applicant]
US 3150032A · Rubenstein · 1964 [cited by applicant]
US 3413058A · Fang et al. · 1968 [cited by applicant]
US 3922068A · Toshio · 1975 [cited by applicant]
US 3934961A · Toh et al. · 1976 [cited by applicant]
US 3989350A · Cohen et al. · 1976 [cited by applicant]
US 4033667A · Fleming, Jr. · 1977 [cited by applicant]
US 4137365A · Fletcher et al. · 1979 [cited by applicant]
US 4298366A · Dabby et al. · 1981 [cited by applicant]
US 4310595A · Beall et al. · 1982 [cited by applicant]
US 4423925A · Dabby et al. · 1984 [cited by applicant]
US 4495684A · Sander et al. · 1985 [cited by applicant]
US 4504519A · Zelez · 1985 [cited by applicant]
US 4519966A · Aldinger et al. · 1985 [cited by applicant]
US 4537814A · Toh et al. · 1985 [cited by applicant]
US 4568140A · Van et al. · 1986 [cited by applicant]
US 4571519A · Kawabata et al. · 1986 [cited by applicant]
US 4579765A · Schachtner · 1986 [cited by applicant]
US 4687707A · Matsuo et al. · 1987 [cited by applicant]
US 4705356A · Berning et al. · 1987 [cited by applicant]
US 4797316A · Hecq et al. · 1989 [cited by applicant]
US 4826734A · Jackson et al. · 1989 [cited by applicant]
US 4851095A · Scobey et al. · 1989 [cited by applicant]
US 4896928A · Perilloux et al. · 1990 [cited by applicant]
US 4946923A · Nagata et al. · 1990 [cited by applicant]
US 4995684A · Tustison et al. · 1991 [cited by applicant]
US 5071206A · Hood et al. · 1991 [cited by applicant]
US 5138219A · Krisl et al. · 1992 [cited by applicant]
US 5178911A · Gordon et al. · 1993 [cited by applicant]
US 5210253A · Kinami et al. · 1993 [cited by applicant]
US 5234769A · Shevlin · 1993 [cited by applicant]
US 5268217A · Kimock et al. · 1993 [cited by applicant]
US 5300951A · Yamazaki · 1994 [cited by applicant]
US 5332888A · Tausch et al. · 1994 [cited by applicant]
US 5390274A · Toyoda et al. · 1995 [cited by applicant]
US 5393574A · Sulzbach · 1995 [cited by applicant]
US 5399387A · Law et al. · 1995 [cited by applicant]
US 5470606A · De Boer · 1995 [cited by applicant]
US 5478634A · Setoyama et al. · 1995 [cited by applicant]
US 5503912A · Setoyama et al. · 1996 [cited by applicant]
US 5506038A · Knapp et al. · 1996 [cited by applicant]
US 5508092A · Kimock et al. · 1996 [cited by applicant]
US 5549953A · Li · 1996 [cited by applicant]
US 5567363A · Jung et al. · 1996 [cited by applicant]
US 5597622A · Zoeller et al. · 1997 [cited by applicant]
US 5618619A · Petrmichl et al. · 1997 [cited by applicant]
US 5635245A · Kimock et al. · 1997 [cited by applicant]
US 5637353A · Kimock et al. · 1997 [cited by applicant]
US 5643638A · Otto et al. · 1997 [cited by applicant]
US 5718773A · Shiozaki · 1998 [cited by applicant]
US 5719705A · Machol · 1998 [cited by applicant]
US 5737472A · Bernasson et al. · 1998 [cited by applicant]
US 5766783A · Utsumi et al. · 1998 [cited by applicant]
US 5772862A · Ando et al. · 1998 [cited by applicant]
US 5773148A · Charrue et al. · 1998 [cited by applicant]
US 5811191A · Neuman · 1998 [cited by applicant]
US 5846650A · Ko et al. · 1998 [cited by applicant]
US 5935716A · Mccurdy et al. · 1999 [cited by applicant]
US 5938898A · Ando et al. · 1999 [cited by applicant]
US 6045894A · Jonza et al. · 2000 [cited by applicant]
US 6046855A · Goto · 2000 [cited by applicant]
US 6074730A · Laird et al. · 2000 [cited by applicant]
US 6077569A · Knapp et al. · 2000 [cited by applicant]
US 6088166A · Lee · 2000 [cited by applicant]
US 6114043A · Joret · 2000 [cited by applicant]
US 6129980A · Tsukada et al. · 2000 [cited by applicant]
US 6132650A · Nakamura · 2000 [cited by applicant]
US 6165598A · Nelson · 2000 [cited by applicant]
US 6166125A · Sugiyama et al. · 2000 [cited by applicant]
US 6172812B1 · Haaland et al. · 2001 [cited by applicant]
US 6174599B1 · Boire et al. · 2001 [cited by applicant]
US 6208389B1 · Aben et al. · 2001 [cited by applicant]
US 6217272B1 · Felsenthal et al. · 2001 [cited by applicant]
US 6219121B1 · Sahouani et al. · 2001 [cited by applicant]
US RE37183E · Kawamura et al. · 2001 [cited by applicant]
US 6238781B1 · Anderson et al. · 2001 [cited by applicant]
US 6250758B1 · Yoshihara et al. · 2001 [cited by applicant]
US 6254913B1 · Wadsworth et al. · 2001 [cited by applicant]
US 6267915B1 · Park et al. · 2001 [cited by applicant]
US 6286965B1 · Caskey et al. · 2001 [cited by applicant]
US 6303225B1 · Veerasamy · 2001 [cited by applicant]
US 6337771B1 · Chu et al. · 2002 [cited by applicant]
US 6338901B1 · Veerasamy · 2002 [cited by applicant]
US 6340404B1 · Oka et al. · 2002 [cited by applicant]
US 6344288B1 · Oyama et al. · 2002 [cited by applicant]
US 6355334B1 · Rondeau et al. · 2002 [cited by applicant]
US 6355344B1 · Mamish et al. · 2002 [cited by applicant]
US 6391400B1 · Russell et al. · 2002 [cited by applicant]
US 6395333B2 · Veerasamy · 2002 [cited by applicant]
US 6416872B1 · Maschwitz · 2002 [cited by applicant]
US 6495251B1 · Arbab et al. · 2002 [cited by applicant]
US 6503557B1 · Joret · 2003 [cited by applicant]
US 6521677B2 · Yashiro et al. · 2003 [cited by applicant]
US 6524714B1 · Neuman et al. · 2003 [cited by applicant]
US 6535333B1 · Piepel et al. · 2003 [cited by applicant]
US 6570709B2 · Katayama et al. · 2003 [cited by applicant]
US 6572990B1 · Oyama et al. · 2003 [cited by applicant]
US 6580512B1 · Hussey et al. · 2003 [cited by applicant]
US 6583935B1 · Saif et al. · 2003 [cited by applicant]
US 6596368B1 · Liebig et al. · 2003 [cited by applicant]
US 6605358B1 · Stachowiak · 2003 [cited by applicant]
US 6652974B1 · Krisko · 2003 [cited by applicant]
US 6707610B1 · Woodard et al. · 2004 [cited by applicant]
US 6723423B1 · Kaneko et al. · 2004 [cited by applicant]
US 6730352B2 · Stachowiak · 2004 [cited by applicant]
US 6743516B2 · Murphy et al. · 2004 [cited by applicant]
US 6746775B1 · Boire et al. · 2004 [cited by applicant]
US 6783253B2 · Thomsen et al. · 2004 [cited by applicant]
US 6785468B2 · Takasaki et al. · 2004 [cited by applicant]
US 6813096B2 · Ohta · 2004 [cited by applicant]
US 6824709B2 · Shundo · 2004 [cited by applicant]
US 6838179B1 · Legrand · 2005 [cited by applicant]
US 6846599B2 · Ide · 2005 [cited by applicant]
US 6862139B2 · Chang et al. · 2005 [cited by applicant]
US 6875468B2 · Kunz et al. · 2005 [cited by applicant]
US 6908480B2 · Jayaraman · 2005 [cited by applicant]
US 6924037B1 · Joret et al. · 2005 [cited by applicant]
US 6950236B2 · Hokazono et al. · 2005 [cited by applicant]
US 6986857B2 · Klemm et al. · 2006 [cited by applicant]
US 6998177B2 · Krzyzak et al. · 2006 [cited by applicant]
US 7005188B2 · Anderson et al. · 2006 [cited by applicant]
US 7018727B2 · Dzick · 2006 [cited by applicant]
US 7037573B2 · Miyatake et al. · 2006 [cited by applicant]
US 7055954B2 · Marechal · 2006 [cited by applicant]
US 7122253B2 · Yamaguchi et al. · 2006 [cited by applicant]
US 7128428B2 · Takahashi et al. · 2006 [cited by applicant]
US 7149032B2 · Ohishi et al. · 2006 [cited by applicant]
US 7156533B2 · Hoeing · 2007 [cited by applicant]
US 7166360B2 · Coustet et al. · 2007 [cited by applicant]
US 7171676B2 · Takeda et al. · 2007 [cited by applicant]
US 7189456B2 · King · 2007 [cited by applicant]
US 7229684B2 · Enniss et al. · 2007 [cited by applicant]
US 7253861B2 · Niiyama et al. · 2007 [cited by applicant]
US 7264866B2 · Hashimoto et al. · 2007 [cited by applicant]
US 7332213B2 · Mimura et al. · 2008 [cited by applicant]
US 7351447B2 · Nishida et al. · 2008 [cited by applicant]
US 7371439B2 · Matsunaga et al. · 2008 [cited by applicant]
US 7371786B2 · Yoshihara et al. · 2008 [cited by applicant]
US 7378146B1 · Hedrick et al. · 2008 [cited by applicant]
US 7381469B2 · Moelle et al. · 2008 [cited by applicant]
US 7390099B2 · Takao et al. · 2008 [cited by applicant]
US 7405005B2 · Watanabe · 2008 [cited by applicant]
US 7410686B2 · Osada et al. · 2008 [cited by applicant]
US 7426328B2 · Zhou et al. · 2008 [cited by applicant]
US 7498058B2 · Harris et al. · 2009 [cited by applicant]
US 7521123B2 · Hattori et al. · 2009 [cited by applicant]
US 7541102B2 · Klippe et al. · 2009 [cited by applicant]
US 7542207B2 · Matsunaga · 2009 [cited by applicant]
US 7569269B2 · Takada et al. · 2009 [cited by applicant]
US 7604358B2 · Ninomiya et al. · 2009 [cited by applicant]
US 7629400B2 · Hyman · 2009 [cited by applicant]
US 7643719B1 · Zhou et al. · 2010 [cited by applicant]
US 7645502B2 · Mikami et al. · 2010 [cited by applicant]
US 7655298B2 · Thies et al. · 2010 [cited by applicant]
US 7724241B2 · Fukui et al. · 2010 [cited by applicant]
US 7736728B2 · Loboda et al. · 2010 [cited by applicant]
US 7736824B2 · Yoshikawa et al. · 2010 [cited by applicant]
US 7737633B2 · Zheng · 2010 [cited by applicant]
US 7796123B1 · Irvin et al. · 2010 [cited by applicant]
US 7799732B2 · Tanaka et al. · 2010 [cited by applicant]
US 7903340B2 · Nagahama et al. · 2011 [cited by applicant]
US 7910215B2 · Reymond et al. · 2011 [cited by applicant]
US 7926939B2 · Kato et al. · 2011 [cited by applicant]
US 7973892B2 · Lim · 2011 [cited by applicant]
US 7978402B2 · Sweeney et al. · 2011 [cited by applicant]
US 8026021B2 · Stumpe et al. · 2011 [cited by applicant]
US 8062731B2 · Takada et al. · 2011 [cited by applicant]
US 8062749B2 · Shelestak et al. · 2011 [cited by applicant]
US 8067094B2 · Benson et al. · 2011 [cited by applicant]
US 8088502B2 · Martin et al. · 2012 [cited by applicant]
US 8110278B2 · Hsu et al. · 2012 [cited by applicant]
US 8118896B2 · Can et al. · 2012 [cited by applicant]
US 8124215B2 · Takao et al. · 2012 [cited by applicant]
US 8187671B2 · Sol · 2012 [cited by applicant]
US 8236433B2 · Chiu et al. · 2012 [cited by applicant]
US 8273801B2 · Baikerikar et al. · 2012 [cited by applicant]
US 8304055B2 · Haga et al. · 2012 [cited by applicant]
US 8304078B2 · Varshneya · 2012 [cited by applicant]
US 8312739B2 · Lee et al. · 2012 [cited by applicant]
US 8325418B2 · Nagahama et al. · 2012 [cited by applicant]
US 8360574B2 · Ishak et al. · 2013 [cited by applicant]
US 8383214B2 · Schaepkens et al. · 2013 [cited by applicant]
US 8400592B2 · Hirakata et al. · 2013 [cited by applicant]
US 8409716B2 · Schultz et al. · 2013 [cited by applicant]
US 8425035B2 · Von Blanckenhagen · 2013 [cited by applicant]
US 8432611B1 · Wach · 2013 [cited by applicant]
US 8445112B2 · Di Stefano · 2013 [cited by applicant]
US 8446673B2 · Yoshihara · 2013 [cited by applicant]
US 8460804B2 · Henn et al. · 2013 [cited by applicant]
US 8508703B2 · Lee et al. · 2013 [cited by applicant]
US 8514351B2 · Sasaki et al. · 2013 [cited by applicant]
US 8561429B2 · Allan et al. · 2013 [cited by applicant]
US 8568890B2 · Murata et al. · 2013 [cited by applicant]
US 8628896B2 · Ikeda et al. · 2014 [cited by applicant]
US 8679631B2 · Murata · 2014 [cited by applicant]
US 8691351B2 · Asakura et al. · 2014 [cited by applicant]
US 8746880B2 · Fukagawa et al. · 2014 [cited by applicant]
US 8753744B2 · Borrelli et al. · 2014 [cited by applicant]
US 8784933B2 · Krzyak et al. · 2014 [cited by applicant]
US 8822018B2 · Thoumazet et al. · 2014 [cited by applicant]
US 8840257B2 · Kawagishi et al. · 2014 [cited by applicant]
US 8842365B2 · Koike et al. · 2014 [cited by applicant]
US 8845172B2 · Jang et al. · 2014 [cited by applicant]
US 8854623B2 · Fontaine et al. · 2014 [cited by applicant]
US 8888965B2 · Kuppuswamy et al. · 2014 [cited by applicant]
US 9023457B2 · Carrilero et al. · 2015 [cited by applicant]
US 9041885B2 · Weber et al. · 2015 [cited by applicant]
US 9042019B2 · Su et al. · 2015 [cited by applicant]
US 9051404B2 · Jiang et al. · 2015 [cited by applicant]
US 9051423B2 · Qiu · 2015 [cited by applicant]
US 9079802B2 · Bellman et al. · 2015 [cited by applicant]
US 9102131B2 · Derks et al. · 2015 [cited by applicant]
US 9110230B2 · Koch et al. · 2015 [cited by applicant]
US 9158044B2 · Akiyama et al. · 2015 [cited by applicant]
US 9249049B2 · Fujii · 2016 [cited by applicant]
US 9263202B2 · Lee et al. · 2016 [cited by applicant]
US 9296648B2 · Henn et al. · 2016 [cited by applicant]
US 9316885B2 · Lo et al. · 2016 [cited by applicant]
US 9335444B2 · Hart et al. · 2016 [cited by applicant]
US 9359261B2 · Bellman et al. · 2016 [cited by applicant]
US 9366784B2 · Bellman et al. · 2016 [cited by applicant]
US 9400420B2 · Pudleiner et al. · 2016 [cited by applicant]
US 9411180B2 · Gollier et al. · 2016 [cited by applicant]
US 9418193B2 · Dowski et al. · 2016 [cited by applicant]
US 9535280B2 · Borrelli et al. · 2017 [cited by applicant]
US 9550161B2 · Arfsten et al. · 2017 [cited by applicant]
US 9573842B2 · Gollier et al. · 2017 [cited by applicant]
US 9574262B2 · Henn et al. · 2017 [cited by applicant]
US 9581731B2 · Bookbinder et al. · 2017 [cited by applicant]
US 9588263B2 · Gollier et al. · 2017 [cited by applicant]
US 9651720B2 · Lander et al. · 2017 [cited by applicant]
US 9663400B2 · O'Malley et al. · 2017 [cited by applicant]
US 9684097B2 · Koch et al. · 2017 [cited by applicant]
US 9701248B2 · Neuman et al. · 2017 [cited by applicant]
US 9701579B2 · Gollier et al. · 2017 [cited by applicant]
US 9703011B2 · Adib et al. · 2017 [cited by applicant]
US 9718249B2 · Kwong · 2017 [cited by applicant]
US 9726786B2 · Hart et al. · 2017 [cited by applicant]
US 9766376B2 · Ho et al. · 2017 [cited by applicant]
US 9776913B2 · Gao et al. · 2017 [cited by applicant]
US 9786194B2 · Hyman · 2017 [cited by applicant]
US 9790593B2 · Adib et al. · 2017 [cited by applicant]
US 9823209B2 · Yu et al. · 2017 [cited by applicant]
US 9880328B2 · Gollier et al. · 2018 [cited by applicant]
US 9896596B2 · Jung et al. · 2018 [cited by applicant]
US 9939557B2 · David et al. · 2018 [cited by applicant]
US 9957609B2 · Lee et al. · 2018 [cited by applicant]
US 9964773B2 · Wang · 2018 [cited by applicant]
US 9987820B2 · Mehlmann et al. · 2018 [cited by applicant]
US 10162084B2 · Hart et al. · 2018 [cited by applicant]
US 10183889B2 · Gollier et al. · 2019 [cited by applicant]
US 10416352B2 · Hart et al. · 2019 [cited by applicant]
US 10444408B2 · Bellman et al. · 2019 [cited by applicant]
US 10451773B2 · Hart et al. · 2019 [cited by applicant]
US 10613340B2 · Borrelli et al. · 2020 [cited by applicant]
US 10698151B2 · Hamilton et al. · 2020 [cited by applicant]
US 10899661B2 · Gollier et al. · 2021 [cited by applicant]
US 10921492B2 · Gregorski et al. · 2021 [cited by applicant]
US 10948629B2 · Hart et al. · 2021 [cited by applicant]
US 11378719B2 · Amin et al. · 2022 [cited by applicant]
US 11567237B2 · Hart et al. · 2023 [cited by applicant]
US 11906699B2 · Hart et al. · 2024 [cited by applicant]
US 20010002295A1 · Anderson et al. · 2001 [cited by applicant]
US 20010016262A1 · Toyoshima et al. · 2001 [cited by applicant]
US 20010017452A1 · Bernard · 2001 [cited by applicant]
US 20010031365A1 · Anderson et al. · 2001 [cited by applicant]
US 20020009593A1 · Veerasamy · 2002 [cited by applicant]
US 20020017452A1 · Zimmermann et al. · 2002 [cited by applicant]
US 20020051274A1 · Kim et al. · 2002 [cited by applicant]
US 20020051294A1 · Katayama et al. · 2002 [cited by applicant]
US 20020085284A1 · Nakamura et al. · 2002 [cited by applicant]
US 20020090507A1 · Barth et al. · 2002 [cited by applicant]
US 20020136908A1 · Komatsu et al. · 2002 [cited by applicant]
US 20020167629A1 · Blanchard · 2002 [cited by applicant]
US 20030019363A1 · Grover et al. · 2003 [cited by applicant]
US 20030031879A1 · Neuman et al. · 2003 [cited by applicant]
US 20030035044A1 · Nakayama et al. · 2003 [cited by applicant]
US 20030044652A1 · Wang · 2003 [cited by applicant]
US 20030116270A1 · Hawa et al. · 2003 [cited by applicant]
US 20030116872A1 · Klemm et al. · 2003 [cited by applicant]
US 20030179454A1 · Thomsen et al. · 2003 [cited by applicant]
US 20030193636A1 · Allen et al. · 2003 [cited by applicant]
US 20030234460A1 · Hayashi et al. · 2003 [cited by applicant]
US 20040004778A1 · Liu et al. · 2004 [cited by applicant]
US 20040005482A1 · Kobayashi et al. · 2004 [cited by applicant]
US 20040065968A1 · Klemm et al. · 2004 [cited by applicant]
US 20040147185A1 · Decroupet · 2004 [cited by applicant]
US 20040184765A1 · Difrancesco et al. · 2004 [cited by applicant]
US 20040188874A1 · Hikita et al. · 2004 [cited by applicant]
US 20040195960A1 · Czeremuszkin et al. · 2004 [cited by applicant]
US 20040233174A1 · Robrecht et al. · 2004 [cited by applicant]
US 20040258947A1 · Moelle et al. · 2004 [cited by applicant]
US 20050007019A1 · Kim et al. · 2005 [cited by applicant]
US 20050008863A1 · Mimura et al. · 2005 [cited by applicant]
US 20050012569A1 · Sasaki · 2005 [cited by applicant]
US 20050074591A1 · Zagdoun · 2005 [cited by applicant]
US 20050084705A1 · Klippe et al. · 2005 [cited by applicant]
US 20050123772A1 · Coustet et al. · 2005 [cited by applicant]
US 20050196632A1 · Maschwitz et al. · 2005 [cited by applicant]
US 20050233091A1 · Kumar et al. · 2005 [cited by applicant]
US 20050263775A1 · Ikeda et al. · 2005 [cited by applicant]
US 20050287309A1 · Veerasamy · 2005 [cited by applicant]
US 20060008654A1 · Veerasamy · 2006 [cited by applicant]
US 20060008655A1 · Butz et al. · 2006 [cited by applicant]
US 20060008656A1 · Veerasamy · 2006 [cited by applicant]
US 20060017707A1 · Fukui et al. · 2006 [cited by applicant]
US 20060019119A1 · Spitsberg et al. · 2006 [cited by applicant]
US 20060093833A1 · Meyer et al. · 2006 [cited by applicant]
US 20060115651A1 · Merfeld et al. · 2006 [cited by applicant]
US 20060134436A1 · Maschwitz · 2006 [cited by applicant]
US 20060139783A1 · Decroupet · 2006 [cited by applicant]
US 20060152801A1 · Matsunaga · 2006 [cited by applicant]
US 20060153979A1 · Asakura et al. · 2006 [cited by applicant]
US 20060154044A1 · Yamada et al. · 2006 [cited by applicant]
US 20060165963A1 · Fleury et al. · 2006 [cited by applicant]
US 20060197096A1 · Kerdiles et al. · 2006 [cited by applicant]
US 20060222863A1 · Nadaud et al. · 2006 [cited by applicant]
US 20060240266A1 · Schicht et al. · 2006 [cited by applicant]
US 20060274047A1 · Spath et al. · 2006 [cited by applicant]
US 20060274048A1 · Spath et al. · 2006 [cited by applicant]
US 20060286465A1 · Kim · 2006 [cited by applicant]
US 20070014981A1 · Chiang et al. · 2007 [cited by applicant]
US 20070018671A1 · Steck · 2007 [cited by applicant]
US 20070018871A1 · Riley · 2007 [cited by applicant]
US 20070030569A1 · Lu et al. · 2007 [cited by applicant]
US 20070063147A1 · Yamazaki et al. · 2007 [cited by applicant]
US 20070097509A1 · Nevitt et al. · 2007 [cited by applicant]
US 20070128528A1 · Hess et al. · 2007 [cited by applicant]
US 20070141357A1 · Bekiarian et al. · 2007 [cited by applicant]
US 20070146887A1 · Ikeda et al. · 2007 [cited by applicant]
US 20070152985A1 · Ostergaard et al. · 2007 [cited by applicant]
US 20070166536A1 · Dollase et al. · 2007 [cited by applicant]
US 20070188871A1 · Fleury et al. · 2007 [cited by applicant]
US 20070237918A1 · Jonza et al. · 2007 [cited by applicant]
US 20070240804A1 · Arai et al. · 2007 [cited by applicant]
US 20070247567A1 · Sato et al. · 2007 [cited by applicant]
US 20070249789A1 · Buehler et al. · 2007 [cited by applicant]
US 20070266896A1 · Suwa et al. · 2007 [cited by applicant]
US 20070285776A1 · Nakamura et al. · 2007 [cited by applicant]
US 20080024867A1 · Kawashima et al. · 2008 [cited by applicant]
US 20080032157A1 · Koeckert et al. · 2008 [cited by applicant]
US 20080138606A1 · Yoshihara et al. · 2008 [cited by applicant]
US 20080191463A1 · Vermeulen et al. · 2008 [cited by applicant]
US 20080239488A1 · Asakura et al. · 2008 [cited by applicant]
US 20080241523A1 · Huignard et al. · 2008 [cited by applicant]
US 20090004462A1 · Zhang et al. · 2009 [cited by applicant]
US 20090017314A1 · Nadaud et al. · 2009 [cited by applicant]
US 20090023254A1 · Lim et al. · 2009 [cited by applicant]
US 20090040440A1 · Park · 2009 [cited by applicant]
US 20090051668A1 · Cheng · 2009 [cited by applicant]
US 20090052041A1 · Watanabe et al. · 2009 [cited by applicant]
US 20090086778A1 · Kameyama et al. · 2009 [cited by applicant]
US 20090086783A1 · Kameyama et al. · 2009 [cited by applicant]
US 20090104385A1 · Reymond et al. · 2009 [cited by applicant]
US 20090109537A1 · Bright et al. · 2009 [cited by applicant]
US 20090135492A1 · Kusuda et al. · 2009 [cited by applicant]
US 20090141357A1 · Kamura et al. · 2009 [cited by applicant]
US 20090155490A1 · Bicker et al. · 2009 [cited by applicant]
US 20090178704A1 · Kalejs et al. · 2009 [cited by applicant]
US 20090195865A1 · Kleideiter et al. · 2009 [cited by applicant]
US 20090197048A1 · Amin et al. · 2009 [cited by applicant]
US 20090217968A1 · Joshi et al. · 2009 [cited by applicant]
US 20090223437A1 · Ballard · 2009 [cited by applicant]
US 20090268299A1 · Furui et al. · 2009 [cited by applicant]
US 20090297877A1 · Chang et al. · 2009 [cited by applicant]
US 20090298669A1 · Akiba et al. · 2009 [cited by applicant]
US 20090324844A1 · Haoto et al. · 2009 [cited by applicant]
US 20100009154A1 · Allan et al. · 2010 [cited by applicant]
US 20100027383A1 · Suzuki et al. · 2010 [cited by applicant]
US 20100028607A1 · Lee et al. · 2010 [cited by applicant]
US 20100047521A1 · Amin et al. · 2010 [cited by applicant]
US 20100060979A1 · Harris et al. · 2010 [cited by applicant]
US 20100062217A1 · Kurematsu · 2010 [cited by applicant]
US 20100062245A1 · Martin et al. · 2010 [cited by applicant]
US 20100119486A1 · Sakamoto et al. · 2010 [cited by applicant]
US 20100127154A1 · Kameyama · 2010 [cited by applicant]
US 20100130348A1 · Kang et al. · 2010 [cited by applicant]
US 20100149483A1 · Chiavetta, III · 2010 [cited by applicant]
US 20100167019A1 · Ohyanagi et al. · 2010 [cited by applicant]
US 20100177380A1 · Nagahama et al. · 2010 [cited by applicant]
US 20100177398A1 · Watanabe et al. · 2010 [cited by applicant]
US 20100182551A1 · Tochigi et al. · 2010 [cited by applicant]
US 20100183857A1 · Nouvelot et al. · 2010 [cited by applicant]
US 20100195311A1 · Furui et al. · 2010 [cited by applicant]
US 20100196650A1 · Okawa et al. · 2010 [cited by applicant]
US 20100196685A1 · Murata et al. · 2010 [cited by applicant]
US 20100215950A1 · Schultz et al. · 2010 [cited by applicant]
US 20100238384A1 · Tochigi et al. · 2010 [cited by applicant]
US 20100247745A1 · Rudmann et al. · 2010 [cited by applicant]
US 20100258752A1 · Mochizuki et al. · 2010 [cited by applicant]
US 20100272990A1 · Bondesan et al. · 2010 [cited by applicant]
US 20100291353A1 · Dejneka et al. · 2010 [cited by applicant]
US 20100304090A1 · Henn et al. · 2010 [cited by applicant]
US 20100311868A1 · Bekiarian et al. · 2010 [cited by applicant]
US 20100313875A1 · Kennedy · 2010 [cited by applicant]
US 20100316861A1 · Kubler et al. · 2010 [cited by applicant]
US 20100330350A1 · Osada et al. · 2010 [cited by applicant]
US 20110033635A1 · Nishimoto et al. · 2011 [cited by applicant]
US 20110033681A1 · Adachi et al. · 2011 [cited by applicant]
US 20110043719A1 · Thunhorst et al. · 2011 [cited by applicant]