Liner for a bi-layer gate helmet and the fabrication thereof
A semiconductor device includes a semiconductor layer. A gate structure is disposed over the semiconductor layer. A spacer is disposed on a sidewall of the gate structure. A height of the spacer is greater than a height of the gate structure. A liner is disposed on the gate structure and on the spacer. The spacer and the liner have different material compositions.
1. A device, comprising:
an active region;
a gate electrode disposed over the active region;
a first dielectric layer disposed over the gate electrode, wherein the first dielectric layer has a first dielectric constant;
a second dielectric layer disposed over the first dielectric layer, wherein the second dielectric layer has a second dielectric constant that is different from the first dielectric constant; and
a third dielectric layer disposed between the first dielectric layer and the second dielectric layer, wherein the third dielectric layer has a third dielectric constant that is greater than the first dielectric constant but smaller than the second dielectric constant, and wherein the third dielectric layer and the second dielectric layer have similar widths in a cross-sectional side view.
2. The device of claim 1 , wherein the second dielectric constant is greater than the first dielectric constant.
3. The device of claim 1 , wherein the second dielectric layer is wider than the first dielectric layer in the cross-sectional side view.
4. The device of claim 1 , wherein:
the first dielectric layer includes silicon nitride; and
the second dielectric layer includes ZrOx, YSiOx, SiOC, Al 2 O 3 , HfO 2 , TiO 2 , ZrSiO 4 , HfSiO 4 , Si 3 N 4 , Ta 2 O 5 , SrO, Y 2 O 3 , La 2 O 3 , LaLuO 2 , CaO, MgO, Gd 2 O 3 , PrO 2 , CeO 2 , ZrHfO 2 , or AlON.
5. The device of claim 1 , further comprising gate spacers disposed laterally beside the gate electrode in cross-sectional side view, wherein the gate spacers are each taller than the gate electrode in the cross-sectional side view.
6. The device of claim 5 , wherein an upper surface of the first dielectric layer is more elevated vertically than an upper surface of each of the gate spacers.
7. The device of claim 1 , wherein:
the gate electrode includes a work function metal component and a metal layer disposed over the work function metal component; and
the work function metal component has a recessed upper surface in cross-sectional side view.
8. The device of claim 7 , wherein:
the work function metal component includes TiN, TaN, TiAl, TiAIN, or TaCN; and
the metal layer includes W.
9. A device, comprising:
an active region;
a gate electrode located over the active region in a cross-sectional side view, wherein the gate electrode includes a work function metal component, and wherein the work function metal component comprises a concave upper surface;
a first dielectric layer located over the gate electrode in the cross-sectional side view, wherein the first dielectric layer has a first dielectric constant;
a second dielectric layer located over the first dielectric layer in the cross-sectional side view, wherein the second dielectric layer has a second dielectric constant that is greater than the first dielectric constant; and
a gate spacer located laterally to the gate electrode in the cross-sectional side view, wherein an upper surface of the gate spacer is more elevated than an upper surface of the gate electrode but less elevated vertically than an upper surface of the second dielectric layer.
10. The device of claim 9 , further comprising a third dielectric layer located between the first dielectric layer and the second dielectric layer, wherein:
the third dielectric layer has a third dielectric constant that is greater than the first dielectric constant but less than the second dielectric constant;
the third dielectric layer and the second dielectric layer have substantially similar lateral dimensions in the cross-sectional side view; and
the first dielectric layer has a smaller lateral dimension than the second dielectric layer and the third dielectric layer in the cross-sectional side view.
11. The device of claim 10 , wherein the gate spacer is disposed below a portion of the third dielectric layer but not below any portion of the first dielectric layer.
12. The device of claim 9 , wherein the first dielectric layer has a T-shape in the cross-sectional side view.
13. A device, comprising:
an active region;
a gate electrode formed over the active region in a cross-sectional side view, wherein the gate electrode includes a work function metal component, wherein a middle portion of an upper surface of the work function metal component has a lower vertical elevation than an edge portion of the upper surface of the work function metal component in the cross-sectional side view; and
a dielectric helmet structure formed over the gate electrode, wherein the dielectric helmet structure includes:
a first component formed over the gate electrode in the cross-sectional side view; and
a second component formed over the first component in the cross-sectional side view, wherein the second component has a greater dielectric constant than the first component, and wherein an upper surface of the second component is wider than a lower surface of the first component in the cross-sectional side view.
14. The device of claim 13 , further comprising a gate spacer formed adjacent to the gate electrode and below a portion of the dielectric helmet structure, wherein the gate spacer has a greater height than the gate electrode in the cross-sectional side view.
15. The device of claim 13 , wherein the dielectric helmet structure further includes a third component disposed between the first component and the second component, wherein a dielectric constant of the third component is greater than the first component but smaller than the second component.
16. The device of claim 15 , wherein the third component and the second component have substantially similar lateral dimensions in the cross-sectional side view.
17. The device of claim 13 , wherein the first component has a T-shaped profile in the cross-sectional side view.