Magnetic material filled printed circuit boards and printed circuit board stators
A dielectric substrate may support conductive traces that form windings for a least one pole of a planar armature of an axial flux machine. At least a portion of the dielectric substrate, which is adapted to be positioned within an annular active area of the axial flux machine, may include a soft magnetic material. Such a planar armature may be produced, for example, by forming the conductive traces on the dielectric substrate, and filling interstitial gaps between the conductive traces with at least one epoxy material in which the soft magnetic material is embedded.
1 . A planar armature for an axial flux machine, the planar armature comprising:
first and second conductive traces on a dielectric substrate, at least the first conductive traces forming windings for at least one pole of the planar armature, wherein:
the first conductive traces are within an active area of the axial flux machine and first interstitial gaps between the first conductive traces are filled with a first non-conductive material in which a soft magnetic material is embedded, and
the second conductive traces are outside of the active area and second interstitial gaps between the second conductive traces are filled with a second non-conductive material that is free of the soft magnetic material; and
a dielectric layer disposed over the first and second conductive traces so that the first and second conductive traces are positioned between the dielectric substrate and the dielectric layer.
2 . The planar armature of claim 1 , wherein the soft magnetic material comprises a powdered soft magnetic material.
3 . The planar armature of claim 2 , wherein the first non-conductive material comprises an epoxy.
4 . The planar armature of claim 3 , wherein the second non-conductive material comprises an epoxy.
5 . The planar armature of any of claims 1 , wherein a maximum diameter of particles of the soft magnetic material is 50 micrometers or less.
6 . The planar armature of claim 1 , wherein:
the dielectric substrate comprises a core layer of a copper clad laminate sheet; and
the first non-conductive material is disposed within etched regions of the copper clad laminate sheet.
7 . The planar armature of claim 1 , wherein:
the first conductive traces comprise radial conductive traces within the active area, and
the first non-conductive material is disposed in interstices between the radial conductive traces.
8 . A method for forming a planar armature for an axial flux machine, the method comprising:
forming first and second conductive traces on a dielectric substrate such that at least the first conductive traces form windings for at least one pole of the planar armature;
filling first interstitial gaps located between the first conductive traces within an active area of the axial flux machine with a first non-conductive material in which a soft magnetic material is embedded;
filling second interstitial gaps located between the second conductive traces outside the active area with a second non-conductive material that is free of the soft magnetic material; and
disposing a dielectric layer over the first and second conductive traces so that the first and second conductive traces are positioned between the dielectric substrate and the dielectric layer.
9 . The method of claim 8 , wherein the soft magnetic material comprises a powdered soft magnetic material.
10 . The method of claim 9 , wherein the first non-conductive material comprises an epoxy.
11 . The method of claim 10 , wherein the second non-conductive material comprises an epoxy.
12 . The method of claim 8 , wherein a maximum diameter of particles of the soft magnetic material is 50 micrometers or less.
13 . The method of claim 8 , wherein:
the dielectric substrate comprises a core layer of a copper clad laminate sheet; and
filling the first interstitial gaps comprises disposing the first non-conductive material within etched regions of the copper clad laminate sheet.
14 . The method of claim 8 , wherein:
forming the first conductive traces comprises forming radial conductive traces within the active area; and
filling the first interstitial gaps comprises disposing the first non-conductive material in interstices between the radial conductive traces.