Granted Patent
B2
US 12,239,988 · App. 18/592,457 · Granted Mar 4, 2025
Air-matrix digital microfluidics apparatuses and methods for limiting evaporation and surface fouling
Inventors:
Mais J. Jebrail (Toronto, CA); Irena Barbulovic-Nad (Toronto, CA); Lorenzo Gutierrez (North York, CA); Foteini Christodoulou (San Francisco, CA)
Assignee:
mirOculus Inc.
B01L3/502792C12M23/16G01N27/44791B01L2200/027B01L2200/142B01L2300/042B01L2300/0874B01L2300/18B01L2300/1822B01L2400/0415B01L2400/0427
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Abstract
Air-matrix digital microfluidics (DMF) apparatuses and methods of using them to prevent or limit evaporation and surface fouling of the DMF apparatus. In particular, described herein are air-matrix DMF apparatuses and methods of using them in which a separate well that is accessible from the air gap of the DMF apparatus isolates a reaction droplet by including a cover to prevent evaporation. The cover may be a lid or cap, or it may be an oil or wax material within the well. The opening into the well and/or the well itself may include actuation electrodes to allow the droplet to be placed into, and in some cases removed from, the well. Also described herein are air-matrix DMF apparatuses and methods of using them including thermally controllable regions with a wax material that may be used to selectively encapsulate a reaction droplet in the air gap of the apparatus.
Claims (27)
1. A method of operating a microfluidic apparatus, the method comprising:
dispensing a reaction droplet within an air gap of the microfluidic apparatus having a bottom surface that is open to air above the bottom surface;
moving the reaction droplet to a region of the microfluidic apparatus having a wax material; and
surrounding the reaction droplet with the wax material; and
moving the surrounded reaction droplet within the air gap.
2. The method of claim 1 , wherein the moving the reaction droplet includes moving the reaction droplet to a heating zone including the wax material.
3. The method of claim 2 , further comprising modifying a temperature of the heating zone after surrounding the reaction droplet with the wax material.
4. The method of claim 1 , wherein the wax material prevents the reaction droplet from evaporation.
5. The method of claim 1 , wherein the wax material has a melting temperature higher than an ambient temperature and lower than a reaction temperature.
6. The method of claim 1 , wherein the wax material is thermally printed onto the bottom surface.
7. The method of claim 1 , wherein moving the reaction droplet includes applying energy to a subset of electrodes of the microfluidic apparatus.
8. The method of claim 7 , wherein the subset of electrodes are disposed adjacent to the bottom surface.
9. The method of claim 1 , wherein moving the reaction droplet includes moving the reaction droplet into a wall formed from the wax material.
10. The method of claim 1 , further comprising moving the reaction droplet out from the wax material.
11. A method of operating a microfluidic apparatus, the method comprising:
dispensing a reaction droplet within an air gap of the microfluidic apparatus having a bottom plate that is open to air above the bottom plate;
melting a wax material disposed at a thermally controlled region of the microfluidic apparatus; and
moving the reaction droplet into the melted wax material, wherein the melted wax material encapsulates the reaction droplet.
12. The method of claim 11 , wherein moving the reaction droplet includes applying energy to a subset of electrodes adjacent to the bottom plate.
13. The method of claim 11 , wherein the wax material has a melting temperature higher than an ambient temperature and lower than a reaction temperature.
14. The method of claim 11 , wherein the wax material is screened onto the bottom plate prior to melting.
15. The method of claim 11 , wherein the melted wax material prevents the reaction droplet from evaporation.
16. The method of claim 11 , further comprising moving the reaction droplet out of the melted wax material.
17. The method of claim 11 , further comprising, holding the thermally controlled region at a temperature sufficient to maintain the wax material in a liquid state.
18. The method of claim 11 , further comprising moving additional reaction components into the melted wax material after the reaction droplet has been moved into the melted wax material.
19. The method of claim 11 , further comprising modifying a temperature of the thermally controlled region after moving the reaction droplet into the melted wax material.
20. The method of claim 19 , further comprising decreasing the temperature of the thermally controlled region to solidify the wax material.
Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Mar 22, 2024
From: JEBRAIL, MAIS J.; BARBULOVIC-NAD, IRENA; GUTIERREZ, LORENZO; CHRISTODOULOU, FOTEINI
To: MIROCULUS INC.
Reel/Frame 066879/0219 →
Continuity (5)
Continuation
15579455
Provisional Application
62171756
· Jun 5, 2015
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