Imaging overlay with mutually coherent oblique illumination
An overlay metrology system may include illumination sources configured to generate one or more pairs of mutually coherent illumination beams and illumination optics to direct the pairs of illumination beams to an overlay target at common altitude incidence angles and symmetrically opposed azimuthal incidence angles, where the overlay target includes two or more grating structures distributed along one or more measurement directions. The system may further include imaging optics to image the overlay target onto detectors when implementing the metrology recipe, where an image of a particular one of the two or more grating structures includes a sinusoidal interference pattern generated exclusively with a single non-zero diffraction order of light from each of the illumination beams within the particular one of the pairs of illumination beams. The system may further include a controller to determine overlay measurements based on images of the overlay target.
1 . An overlay metrology system comprising:
one or more illumination sources configured to generate one or more pairs of illumination beams when implementing a metrology recipe;
one or more illumination optics configured to direct the one or more pairs of illumination beams to an overlay target on a sample when implementing the metrology recipe, wherein the illumination beams within a particular one of the one or more pairs of illumination beams are directed to the overlay target with common altitude incidence angles and symmetrically opposed azimuthal incidence angles along a selected illumination direction, wherein the overlay target in accordance with the metrology recipe includes two or more grating structures distributed along one or more measurement directions;
one or more detectors;
one or more imaging optics configured to image the overlay target onto the one or more detectors when implementing the metrology recipe, wherein an image of a particular one of the two or more grating structures includes a sinusoidal interference pattern generated exclusively by interference of a single non-zero diffraction order of light from each of the illumination beams within the particular one of the one or more pairs of illumination beams; and
a controller communicatively coupled to the one or more detectors, the controller including one or more processors configured to execute program instructions when implementing the metrology recipe causing the one or more processors to determine overlay measurements along the one or more measurement directions based on one or more images of the overlay target received from the one or more detectors.
2 . The overlay metrology system of claim 1 , wherein each of the illumination beams within each of the one or more pairs of illumination beams are temporally and spatially coherent.
3 . The overlay metrology system of claim 1 , wherein the illumination beams within each of the one or more pairs of illumination beams are mutually temporally coherent to provide the sinusoidal interference pattern.
4 . The overlay metrology system of claim 1 , wherein the two or more grating structures on the overlay target comprise:
a first grating on a first layer of the sample; and
a second grating on a second layer of the sample, wherein the first grating and the second grating are in non-overlapping regions of the sample, wherein the first grating and the second grating have a common pitch, wherein a corresponding overlay measurement is based on a relative imaged shift between the first grating and the second grating.
5 . The overlay metrology system of claim 4 , wherein the overlay target comprises:
an advanced imaging metrology (AIM) target.
6 . The overlay metrology system of claim 1 , wherein the two or more grating structures on the overlay target comprise:
a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample; and
a second Moiré structure comprising:
a third grating with the second pitch on the first layer of the sample; and
a fourth grating with the first pitch on the second layer of the sample, wherein the third grating and the fourth grating are formed in a second overlapping region of the sample.
7 . The overlay metrology system of claim 6 , wherein the overlay target comprises:
a robust advanced imaging metrology (r-AIM) target.
8 . The overlay metrology system of claim 1 , wherein the two or more grating structures comprise:
a first set of grating structures oriented along a first measurement direction; and
a second set of grating structures oriented along a second measurement direction, wherein the one or more pairs of illumination beams includes two pairs of illumination beams.
9 . The overlay metrology system of claim 8 , wherein the one or more illumination sources includes a first illumination source to generate a first pair of the two pairs of illumination beams and a second illumination source to generate a second pair of the two pairs of illumination beams.
10 . The overlay metrology system of claim 8 , wherein the one or more illumination sources include a single illumination source to generate the two pairs of illumination beams.
11 . The overlay metrology system of claim 10 , wherein the illumination beams in a first pair of the two pairs of illumination beams are temporally incoherent with respect to the illumination beams in a second pair of the two pairs of illumination beams.
12 . The overlay metrology system of claim 10 , wherein all of the illumination beams in the two pairs of illumination beams are mutually temporally coherent.
13 . The overlay metrology system of claim 1 , wherein the two or more grating structures are oriented along a single measurement direction, wherein the one or more pairs of illumination beams includes a single pair of illumination beams.
14 . The overlay metrology system of claim 1 , wherein the one or more pairs of illumination beams are incident on a common spot on the sample covering the overlay target.
15 . The overlay metrology system of claim 1 , wherein the one or more imaging optics includes an objective lens to collect light from the overlay target, wherein the one or more illumination optics directs the one or more pairs of illumination beams to the overlay target outside a numerical aperture (NA) of the objective lens.
16 . The overlay metrology system of claim 1 , wherein the one or more imaging optics includes an objective lens to collect light from the overlay target, wherein the one or more illumination optics directs the one or more pairs of illumination beams to the overlay target through the objective lens.
17 . An overlay metrology method comprising:
illuminating an overlay target on a sample with one or more pairs of illumination beams, wherein the illumination beams within a particular one of the one or more pairs of illumination beams are directed to the overlay target with common altitude incidence angles and symmetrically opposed azimuthal incidence angles along a selected illumination direction, wherein the overlay target in accordance with a metrology recipe includes two or more grating structures distributed along one or more measurement directions;
imaging the overlay target onto one or more detectors, wherein an image of a particular one of the two or more grating structures includes a sinusoidal interference pattern generated exclusively with a single non-zero diffraction order of light from each of the illumination beams within a particular one of the one or more pairs of illumination beams; and
determining overlay measurements along the one or more measurement directions based on one or more images of the overlay target received from the one or more detectors.
18 . An overlay metrology system comprising:
a controller communicatively coupled to one or more detectors, the controller including one or more processors configured to execute program instructions when implementing a metrology recipe causing the one or more processors to determine overlay measurements along one or more measurement directions based on one or more images of one or more overlay targets on a sample received from one or more detectors, wherein the one or more overlay targets in accordance with the metrology recipe include two or more grating structures distributed along the one or more measurement directions, wherein the one or more images of the one or more overlay targets are generated based on illumination with one or more pairs of illumination beams, wherein the illumination beams within a particular one of the one or more pairs of illumination beams are directed to the one or more overlay targets in accordance with the metrology recipe with common altitude incidence angles and symmetrically opposed azimuthal incidence angles along a selected illumination direction, wherein an image of a particular one of the two or more grating structures includes a sinusoidal interference pattern generated exclusively with a single non-zero diffraction order of light from each of the illumination beams within a particular one of the one or more pairs of illumination beams.
19 . The overlay metrology system of claim 18 , wherein each of the illumination beams within each of the one or more pairs of illumination beams are temporally and spatially coherent.
20 . The overlay metrology system of claim 18 , wherein the illumination beams within each of the one or more pairs of illumination beams are mutually temporally coherent to provide the sinusoidal interference pattern.
21 . The overlay metrology system of claim 18 , wherein the two or more grating structures on a particular one of the one or more overlay targets comprise:
a first grating on a first layer of a sample; and
a second grating a second layer of the sample, wherein the first grating and the second grating are in non-overlapping regions of the sample, wherein the first grating and the second grating have a common pitch, wherein a corresponding overlay measurement is based on a relative imaged shift between the first grating and the second grating.
22 . The overlay metrology system of claim 21 , wherein at least one of the one or more overlay targets comprise:
an advanced imaging metrology (AIM) target.
23 . The overlay metrology system of claim 18 , wherein the two or more grating structures on at least one of the one or more overlay targets comprise:
a first Moiré structure comprising:
a first grating with a first pitch on a first layer of a sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample; and
a second Moiré structure comprising:
a third grating with the second pitch on the first layer of the sample; and
a fourth grating with the first pitch on the second layer of the sample, wherein the third grating and the fourth grating are formed in a second overlapping region of the sample.
24 . The overlay metrology system of claim 23 , wherein at least one of the one or more overlay targets comprise:
a robust advanced imaging metrology (r-AIM) target.
25 . The overlay metrology system of claim 18 , wherein the two or more grating structures comprise:
a first set of grating structures oriented along a first measurement direction; and
a second set of grating structures oriented along a second measurement direction, wherein the one or more pairs of illumination beams include two pairs of illumination beams.
26 . The overlay metrology system of claim 25 , wherein a first pair of the two pairs of illumination beams is formed with a first illumination source, wherein a second pair of the two pairs of illumination beams is formed with a second illumination source.
27 . The overlay metrology system of claim 25 , wherein the two pairs of illumination beams are formed from a single illumination source.
28 . The overlay metrology system of claim 27 , wherein the illumination beams in a first pair of the two pairs of illumination beams are temporally incoherent with respect to the illumination beams in a second pair of the two pairs of illumination beams.
29 . The overlay metrology system of claim 27 , wherein all of the illumination beams in the two pairs of illumination beams are mutually temporally coherent.
30 . The overlay metrology system of claim 18 , wherein the two or more grating structures are oriented along a single measurement direction, wherein the one or more pairs of illumination beams includes a single pair of illumination beams.
31 . The overlay metrology system of claim 18 , wherein the one or more pairs of illumination beams are incident on a common spot on the sample.
32 . The overlay metrology system of claim 18 , wherein an objective lens collects light from the one or more overlay targets, wherein the one or more pairs of illumination beams are directed by one or more illumination optics to the one or more overlay targets outside a numerical aperture (NA) of the objective lens in accordance with the metrology recipe.
33 . The overlay metrology system of claim 18 , wherein an objective lens collects light from the one or more overlay targets, wherein the one or more pairs of illumination beams are directed by one or more illumination optics to the one or more overlay targets through the objective lens in accordance with the metrology recipe.