Large-area/wafer-scale CMOS-compatible 2D-material intercalation doping tools, processes, and methods, including intercalation doping of synthesized and patterned graphene
An intercalation doping apparatus including: a reactor chamber where single or multiple wafers or substrates (SoMWoSubs) are disposed within the reactor chamber, where SOMWoSubs have a diameter or a side distance from 25 mm to 450 mm; a heater, where the heater is configured to provide heat to the SOMWoSubs disposed within the reactor chamber, where the SoMWoSubs include a temperature from 25° C. to 500° C.; where pressure is applied to at least one surface of the SOMWoSubs disposed within the reactor chamber within a range of 2 bar to 500 bar; and a dopant application apparatus, where the dopant application apparatus includes at least valves and tubing which bring dopants from outside to within the reactor chamber and includes at least a dopant crucible disposed within the reactor chamber, where the dopants include material in solid, liquid, or gaseous phase, and where the dopants include intercalation doping agents.
1 . A method of accelerated intercalation doping, by insertion of dopant atoms, ions, or molecules into layered 2D materials, said method comprising:
loading single or multiple wafers or substrates into a reactor chamber, wherein the single or multiple wafers or substrates comprise a diameter or side distance in the range of 25 mm to 450 mm, wherein the single or multiple wafers or substrates comprise multi-layer graphene strips define exposed layer edges, wherein the multi-layer graphene strips comprise two or more graphene layers;
heating the single or multiple wafers or substrates to a temperature of 25° C. to 500° C.;
creating pressure on the single or multiple wafers or substrates in the range of 2 bar to 500 bar; and
introducing intercalation doping agents into the reactor chamber to insert the intercalation dopants between the two or more graphene layers via the exposed layer edges, wherein:
said introducing comprises generating an atmosphere comprising dopants within the reactor chamber from a dopant crucible containing the dopants,
the dopant crucible is located outside of the reactor chamber and the dopant crucible is connected to the reactor chamber, and
the single or multiple wafers or substrates are each oriented horizontally and face-up.
2 . The method according to claim 1 , wherein said introducing comprises accelerating atoms or molecules of the intercalation dopants via pressure, temperature or electrical bias.
3 . The method according to claim 1 , wherein said heating, creating and introducing are maintained for a specified time, and
wherein said specified time is at least one half of a maximum width of the graphene strips divided by a speed of intercalation doping.
4 . The method according to claim 1 , wherein said creating creates the pressure via gaseous pressure.
5 . The method according to claim 1 , wherein said creating comprises injecting pressurized gas into the reactor chamber.
6 . The method according to claim 1 , wherein a space between parallel ones of the exposed layer edges is equal to or greater than 10 times the diameter of a molecule, ion, or atom of said intercalant dopant.
7 . The method according to claim 1 , said introducing comprises heating the crucible to a different temperature than the single or multiple wafers or substrates.
8 . A method of accelerated intercalation doping by insertion of dopant atoms, ions, or molecules into layered 2D materials, said method comprising:
loading single or multiple wafers or substrates into a reactor chamber, wherein the single or multiple wafers or substrates comprise a diameter or side distance in the range of 25 mm to 450 mm, wherein the single or multiple wafers or substrates comprise multi-layer graphene strips define exposed layer edges, wherein the multi-layer graphene strips comprise two or more graphene layers;
heating the single or multiple wafers or substrates to a temperature of 25° C. to 500° C.;
creating pressure on the single or multiple wafers or substrates in the range of 2 bar to 500 bar; and
introducing intercalation doping agents into the reactor chamber to insert the intercalation dopants between the two or more graphene layers via the exposed layer edges, wherein:
said introducing comprises generating an atmosphere comprising dopants within the reactor chamber from a dopant crucible containing the dopants,
the dopant crucible is located outside of the reactor chamber and the dopant crucible is connected to the reactor chamber, and
the single or multiple wafers or substrates are each oriented vertically.
9 . The method according to claim 8 , wherein said introducing comprises accelerating atoms or molecules of the intercalation dopants via pressure, temperature or electrical bias.
10 . The method according to claim 8 , wherein said heating, creating and introducing are maintained for a specified time, and
wherein said specified time is at least one half of a maximum width of the graphene strips divided by a speed of intercalation doping.
11 . The method according to claim 8 , wherein said creating creates the pressure via gaseous pressure.
12 . The method according to claim 8 , wherein a space between parallel ones of the exposed layer edges is equal to or greater than 10 times the diameter of a molecule, ion, or atom of said intercalant dopant.
13 . A method of accelerated intercalation doping by insertion of dopant atoms, ions, or molecules into layered 2D materials, said method comprising:
loading single or multiple wafers or substrates into a reactor chamber, wherein the single or multiple wafers or substrates comprise a diameter or side distance in the range of 25 mm to 450 mm, wherein the single or multiple wafers or substrates comprise multi-layer graphene strips define exposed layer edges, wherein the multi-layer graphene strips comprise two or more graphene layers;
heating the single or multiple wafers or substrates to a temperature of 25° C. to 500° C.;
creating pressure on the single or multiple wafers or substrates in the range of 2 bar to 500 bar; and
introducing intercalation doping agents into the reactor chamber to insert the intercalation dopants between the two or more graphene layers via the exposed layer edges, wherein:
said introducing comprises generating an atmosphere comprising dopants within the reactor chamber from a dopant crucible containing the dopants,
the dopant crucible is located inside the reactor chamber, and
the single or multiple wafers or substrates are each oriented horizontally and face-up.
14 . The method according to claim 13 , wherein a space between parallel ones of the exposed layer edges is equal to or greater than 10 times the diameter of a molecule, ion, or atom of said intercalant dopant.
15 . The method according to claim 13 , wherein the single or multiple wafers or substrates number at least 5.
16 . The method according to claim 13 , wherein said introducing comprises accelerating atoms or molecules of the intercalation dopants via pressure, temperature or electrical bias.
17 . The method according to claim 13 , wherein said heating, creating and introducing are maintained for a specified time, and
wherein said specified time is at least one half of a maximum width of the graphene strips divided by a speed of intercalation doping.
18 . The method according to claim 13 , wherein said creating creates the pressure via gaseous pressure.