IP Library › Granted Patent US 1,110,975
Granted Patent S1
US 1,110,975 · App. 29/951,119 · Granted Feb 3, 2026

Collimator for a physical vapor deposition (PVD) chamber

Inventors: Fuhong Zhang (San Jose, CA); Martin Lee Riker (Round Rock, TX); Suhas Bangalore Umesh (Sunnyvale, CA); Madan Kumar Shimoga Mylarappa (Bengaluru, IN)
Assignee: Applied Materials Inc.
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Quick Facts
Patent No.
US 1,110,975
App. No.
29/951,119
Granted
Feb 3, 2026
Kind
S1
Claims (1)

The ornamental design for a collimator for a physical vapor deposition (PVD) chamber, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2024
From: ZHANG, FUHONG; RIKER, MARTIN LEE; BANGALORE UMESH, SUHAS; SHIMOGA MYLARAPPA, MADAN KUMAR
To: APPLIED MATERIALS, INC.
Reel/Frame 067937/0478 →
Continuity (1)
Division 29822866 · Jan 12, 2022
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