Self-aligned contact employing a dielectric metal oxide spacer
View Patent ↗A dielectric liner is formed on sidewalls of a gate stack and a lower contact-level dielectric material layer is deposited on the dielectric liner and planarized. The dielectric liner is recessed relative to the top surface of the lower contact-level dielectric material layer and the top surface of the gate stack. A dielectric metal oxide layer is deposited and planarized to form a dielectric metal oxide spacer that surrounds an upper portion of the gate stack. The dielectric metal oxide layer has a top surface that is coplanar with a top surface of the planarized lower contact-level dielectric material layer. Optionally, the conductive material in the gate stack may be replaced. After deposition of at least one upper contact-level dielectric material layer, at least one via hole extending to a semiconductor substrate is formed employing the dielectric metal oxide spacer as a self-aligning structure.
1. A semiconductor structure comprising:
a gate dielectric located on a semiconductor substrate;
a gate electrode structure located on said gate dielectric;
a dielectric metal oxide spacer contacting an upper portion of said gate electrode structure and not contacting a lower portion of said gate electrode structure;
a dielectric liner having a top surface that contacts a bottom surface of said dielectric metal oxide spacer and contacting a top surface of said semiconductor substrate; and
a dielectric material layer overlying a horizontal portion of said dielectric liner and having a top surface that is coplanar with a top surface of said dielectric metal oxide spacer.
2. The semiconductor structure of claim 1 , wherein said dielectric liner comprises silicon nitride.
3. The semiconductor structure of claim 1 , wherein a periphery of said top surface of said dielectric liner coincides with a periphery of a bottom surface of said dielectric metal oxide spacer.
4. The semiconductor structure of claim 1 , further comprising a contact via structure extending through said dielectric material layer and contacting said dielectric metal oxide spacer and said semiconductor substrate.
5. The semiconductor structure of claim 4 , wherein said contact via structure contacts a single sidewall of said dielectric metal oxide spacer and an upper surface of said dielectric metal oxide spacer that is vertically recessed from a topmost surface of said dielectric metal oxide spacer.
6. The semiconductor structure of claim 4 , further comprising at least another dielectric material layer overlying said dielectric material layer, wherein said contact via structure extends through said at least another dielectric material layer.
7. The semiconductor structure of claim 4 , wherein said contact via structure contacts a metal-semiconductor-alloy portion located in said semiconductor substrate.
8. The semiconductor structure of claim 1 , wherein said dielectric metal oxide spacer comprises a material having a dielectric constant greater than 8.0.
9. The semiconductor structure of claim 8 , wherein said dielectric metal oxide spacer comprises a material selected from HfO 2 , ZrO 2 , La 2 O 3 , Al 2 O 3 , TiO 2 , SrTiO 3 , LaAlO 3 , Y 2 O 3 , HfO X N Y , ZrO x N y , La 2 O x N y , Al 2 O x N y , TiO x N y , SrTiO x N y , LaAlO x N y , Y 2 O x N y , a silicate thereof, and an alloy thereof, wherein each value of x is independently from 0.5 to 3 and each value of y is independently from 0 to 2.
10. The semiconductor structure of claim 1 , wherein all inner sidewalls of said dielectric metal oxide spacer contact sidewalls of said gate electrode structure.
11. The semiconductor structure of claim 1 , wherein said gate electrode structure includes a work-function-metal portion and a conductive metal portion.
12. The semiconductor structure of claim 1 , wherein said gate electrode structure includes a doped semiconductor material.