Semiconductor device and method of forming insulating layer on conductive traces for electrical isolation in fine pitch bonding
A semiconductor device has a semiconductor die with a plurality of bumps formed over an active surface of the semiconductor die. A plurality of first conductive traces with interconnect sites is formed over a substrate. The bumps are wider than the interconnect sites. A surface treatment is formed over the first conductive traces. A plurality of second conductive traces is formed adjacent to the first conductive traces. An oxide layer is formed over the second conductive traces. A masking layer is formed over an area of the substrate away from the interconnect sites. The bumps are bonded to the interconnect sites so that the bumps cover a top surface and side surface of the interconnect sites. The oxide layer maintains electrical isolation between the bump and second conductive trace. An encapsulant is deposited around bumps between the semiconductor die and substrate.
1. A semiconductor device, comprising:
a substrate;
an interconnect site contacting a surface of the substrate;
a surface treatment formed over a top surface and a side surface of the interconnect site;
a conductive trace formed over the surface of the substrate less than 150 micrometers from the interconnect site and electrically isolated from the interconnect site; and
a copper oxide layer formed over the conductive trace with the interconnect site and surface treatment devoid of the copper oxide layer.
2. The semiconductor device of claim 1 , further including a semiconductor die disposed over the substrate with an interconnect structure electrically connecting the semiconductor die to the interconnect site and contacting the copper oxide layer over the conductive trace.
3. The semiconductor device of claim 2 , wherein the interconnect structure is selected from a group consisting of a bump including fusible material, bump including non-fusible portion and fusible portion, bump including surface asperities, bump having a length along the interconnect site greater than a width across the interconnect site, and bump including a tip.
4. The semiconductor device of claim 2 , further including an underfill material disposed between the semiconductor die and substrate.
5. The semiconductor device of claim 1 , further including an opening formed through the interconnect site.
6. The semiconductor device of claim 1 , further including a mask patch formed over the conductive trace.
7. A method of making a semiconductor device, comprising:
providing a substrate;
forming an interconnect site contacting a surface of the substrate;
forming a surface treatment over a top surface and a side surface of the interconnect site;
forming a conductive trace over the surface of the substrate and electrically isolated from the interconnect site; and
forming a copper oxide layer over the conductive trace with the interconnect site and surface treatment devoid of the copper oxide layer.
8. The method of claim 7 , further including:
forming an interconnect structure over the interconnect site with a portion of the interconnect structure over first and second surfaces of the copper oxide layer; and
disposing a semiconductor die over the substrate with the interconnect structure electrically connecting the semiconductor die to the interconnect site and contacting the copper oxide layer over the conductive trace.
9. The method of claim 8 , wherein the interconnect structure is selected from a group consisting of a bump including fusible material, bump including non-fusible portion and fusible portion, bump including surface asperities, bump having a length along the interconnect site greater than a width across the interconnect site, and bump including a tip.
10. The method of claim 8 , further including disposing an underfill material between the semiconductor die and substrate.
11. The method of claim 7 , further including forming a mask patch over the conductive trace.
12. The method of claim 7 , wherein forming the copper oxide layer includes:
forming a mask over the interconnect site including an opening over the conductive trace; and
forming the copper oxide layer over the conductive trace.
13. A semiconductor device, comprising:
a substrate;
an interconnect site contacting a surface of the substrate, the interconnect site including a top surface and a side surface;
a surface treatment formed over the top surface and the side surface of the interconnect site;
a conductive trace formed over the surface of the substrate and electrically isolated from the interconnect site;
a copper oxide layer formed over the conductive trace, wherein the interconnect site and the surface treatment are devoid of the copper oxide layer;
a semiconductor die; and
a bump formed between the semiconductor die and interconnect site and over the top surface and side surface of the surface treatment, the bump contacting the surface of the substrate between the interconnect site and the conductive trace, the bump contacting the copper oxide layer, and the copper oxide layer separating the bump from the conductive trace.
14. The semiconductor device of claim 13 , wherein the bump electrically connects the semiconductor die to the interconnect site.
15. The semiconductor device of claim 14 , wherein the bump includes a non-fusible portion and fusible portion.
16. The semiconductor device of claim 14 , further including an underfill material disposed between the semiconductor die and substrate.
17. A semiconductor device, comprising:
a substrate;
an interconnect site formed over the substrate;
a surface treatment formed over a top surface and a side surface of the interconnect site and contacting the substrate;
a conductive trace formed over the substrate;
a copper oxide layer covering a width of the conductive trace; and
a bump formed between a semiconductor die and the interconnect site, the bump contacting the surface treatment and copper oxide layer.
18. The semiconductor device of claim 17 , wherein the conductive trace is formed over the substrate within a footprint of the bump.
19. The semiconductor device of claim 17 , wherein the conductive trace is formed over the substrate less than 150 micrometers from the interconnect site.
20. The semiconductor device of claim 17 , wherein the conductive trace is formed over the substrate adjacent to the interconnect site.
21. A semiconductor device, comprising:
a substrate;
an interconnect site contacting a surface of the substrate;
a surface treatment formed over a top surface and a side surface of the interconnect site;
a conductive layer formed over the surface of the substrate and electrically isolated from the interconnect site; and
a copper oxide layer formed over the conductive layer with the interconnect site and surface treatment devoid of the copper oxide layer.
22. The semiconductor device of claim 21 , wherein the copper oxide layer includes an oxide layer.
23. The semiconductor device of claim 21 , wherein the interconnect site includes a contact pad.
24. The semiconductor device of claim 21 , further including a bump disposed over the interconnect site.
25. The semiconductor device of claim 21 , wherein the conductive layer is electrically isolated from the interconnect site by the copper oxide layer.
26. The semiconductor device of claim 21 , further including a mask formed over the interconnect site with an opening in the mask over the conductive layer.
27. The semiconductor device of claim 13 , wherein the conductive trace is disposed within a footprint of the bump.