Method, apparatus, and system for two-dimensional power rail to enable scaling of a standard cell

1. A method, comprising:

determining a first location for an extension of a first power rail in a functional cell;

forming a first extension of said first power rail in a first direction; and

forming a second extension of said first power rail in a second direction in said first location.

2. The method of claim 1 , further comprising forming at least one additional extension of said first power rail in said second direction.

3. The method of claim 1 , wherein:

forming said first extension of said first power rail comprises the forming a first extension in a vertical configuration; and

the forming a second extension of said first power rail comprises forming said second extension in a horizontal configuration.

4. The method of claim 1 , further comprising:

determining a second location for an extension of said first power rail; and

forming a third extension of said first power rail in said second direction in said second location.

5. The method of claim 1 , wherein the forming a first extension in said first power rail in a first direction and the forming a second extension in said first power rail in a second direction comprise:

printing a plurality of mandrel metal forms on a substrate;

adding a plurality of self-aligned double-pattering (SADP) spacers within said mandrel metal forms; and

performing a non-mandrel self-aligned cut processing for forming a plurality of non-mandrel shape in said first direction and said second direction.

6. The method of claim 1 , further comprising:

determining a first location for an extension of a second power rail in said functional cell; and

forming a first extension of said second power rail in a first direction; and

forming a second extension of said second power rail in a second direction in said first location.

7. The method of claim 6 , further comprising:

determining a second location for an extension of said second power rail; and

forming a third extension of said second power rail in said second direction in said second location;

determining a third location for an extension of said second power rail; and

forming a fourth extension of said first power rail in said third direction in said third location, wherein said third direction is opposite of said second direction.

8. The method of claim 7 , further comprising electrically coupling said first power rail to a power VDD signal and electrically coupling said second power rail to a ground VSS signal.

9. A device, comprising:

a functional cell for forming an integrated circuit, said functional cell comprising:

a first power rail comprising:

a first extension configured in a first dimension; and

a second extension configured in a second dimension, said second extension formed in a predetermined first location.

10. The device of claim 9 , wherein said device comprises a plurality of functional cells arranged in an integrated circuit design.

11. The device of claim 9 , wherein said second extension is an extension of said first extension.

12. The device of claim 9 , wherein:

said first extension of said first power rail is in a vertical configuration; and

said second extension of said first power rail is in a horizontal configuration.

13. The device of claim 9 , further comprising:

a second power rail comprising:

a first extension configured in said first dimension; and

a second extension configured in said second dimension, said second extension formed in a predetermined second location.

14. The device of claim 13 , wherein at least one of said second extension of said first power rail, or said second extension of said second power rail comprises a via conforming with at least one cell design rule.

15. The device of claim 13 , wherein said first power rail is operatively coupled to a ground VSS signal and said second power VDD rail is operatively coupled to a power signal.

16. The device of claim 13 , wherein said first dimension of said first power rail and said second power rail is in a horizontal direction and said second dimension is in a vertical direction perpendicular to said first dimension.

17. A system, comprising:

a design unit adapted to:

determine a first location for an extension of a first power rail in a functional cell;

form a first extension of said first power rail in a first direction; and

form a second extension of said first power rail in a second direction in said first location to generate a circuit layout;

a semiconductor device processing system for fabricating an integrated circuit device based upon said circuit layout;

and

a processing controller operatively coupled to said semiconductor device processing system, said processing controller configured to control an operation of said semiconductor device processing system.

18. The system of claim 17 , wherein:

said first extension of said first power rail is in a vertical configuration; and

said second extension of said first power rail is in a horizontal configuration.

19. The system of claim 17 , wherein said design unit is further configured to

determine a second location for an extension of said first power rail; and

form a third extension of said first power rail in said second direction in said second location.

20. The system of claim 17 , wherein said design unit is further configured to

determine a first location for an extension of a second power rail in said functional cell;

form a first extension of said second power rail in a first direction; and

form a second extension of said second power rail in a second direction in said first location.