Semiconductor device and method of forming a vertical interconnect structure for 3-D FO-WLCSP
A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.
1. A method of making a semiconductor device, comprising:
providing a semiconductor die;
depositing an encapsulant around the semiconductor die;
forming an insulating layer over the encapsulant and semiconductor die;
forming a plurality of first openings through the insulating layer;
forming a conductive layer over the encapsulant including a plurality of conductive vias; and
forming a second opening through the encapsulant with the plurality of conductive vias within a footprint of the second opening.
2. The method of claim 1 , further including forming the conductive layer continuously over each of the first openings to form a micro conductive via array.
3. The method of claim 2 , further including forming a trench in the insulating layer surrounding the micro conductive via array, wherein the conductive layer extends into the trench.
4. The method of claim 3 , further including forming the conductive layer completely filling the trench.
5. The method of claim 1 , further including forming a conductive bump in the second opening on the conductive layer.
6. The method of claim 1 , wherein the semiconductor die includes a sensor.
7. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a conductive layer over the semiconductor die and including a micro conductive via array, wherein the micro conductive via array includes a plurality of peaks and valleys of the conductive layer; and
forming a conductive bump contacting each of the plurality of peaks and valleys.
8. The method of claim 7 , further including:
forming an insulating layer over the semiconductor die;
forming a plurality of first openings through the insulating layer; and
forming the micro conductive via array by depositing the conductive layer continuously over each of the first openings.
9. The method of claim 8 , further including:
forming a trench around the plurality of first openings; and
depositing the conductive layer continuously over each of the first openings and the trench.
10. The method of claim 8 , further including:
depositing an encapsulant over the semiconductor die; and
forming the plurality of first openings through the insulating layer over the encapsulant.
11. The method of claim 10 , further including forming a second opening in the encapsulant over the first openings of the insulating layer.
12. The method of claim 11 , further including forming a bump in the second opening.
13. A semiconductor device, comprising:
a semiconductor die;
an encapsulant deposited around the semiconductor die including an opening formed through the encapsulant; and
a conductive layer formed over the encapsulant including a plurality of conductive vias formed within a footprint of the opening.
14. The semiconductor device of claim 13 , further including a conductive bump formed in the opening and contacting each of the plurality of conductive vias.
15. The semiconductor device of claim 13 , further including an insulating layer formed between the encapsulant and conductive layer, wherein the opening extends to the conductive layer through the insulating layer.
16. The semiconductor device of claim 13 , wherein the conductive layer further includes a conductive ring around the plurality of conductive vias.
17. The semiconductor device of claim 13 , wherein the conductive layer extends from the plurality of conductive vias to a contact pad of the semiconductor die.
18. The semiconductor device of claim 13 , further including an insulating layer formed over the encapsulant opposite the conductive layer, wherein the opening extends through the insulating layer.
19. The semiconductor device of claim 13 , wherein the semiconductor die includes a sensor.
20. A semiconductor device, comprising:
a semiconductor die;
a conductive layer formed over the semiconductor die and including a micro conductive via array, wherein the micro conductive via array includes a plurality of peaks and valleys of the conductive layer; and
a conductive bump contacting each of the plurality of peaks and valleys.
21. The semiconductor device of claim 20 , further including an encapsulant deposited over the semiconductor die.
22. The semiconductor device of claim 21 , further including an insulating layer formed between the encapsulant and conductive layer, wherein the conductive micro via array is formed in openings of the insulating layer and contacting the encapsulant.
23. The semiconductor device of claim 21 , further including an opening in the encapsulant with the micro conductive via array and conductive bump disposed in the opening.
24. The semiconductor device of claim 20 , further including a second semiconductor device comprising a second micro conductive via array, wherein the conductive bump contacts the second micro conductive via array.
25. The semiconductor device of claim 13 , further including a conductive ring extending around the plurality of conductive vias.