IP Library Granted Patent US 10,680,049
Granted Patent B2
US 10,680,049 · App. 16/358,904 · Granted Jun 9, 2020

Light emitting device

Inventors: Makoto Udagawa (Kanagawa, JP); Masahiko Hayakawa (Kanagawa, JP); Jun Koyama (Kanagawa, JP); Mitsuaki Osame (Kanagawa, JP); Aya Anzai (Kanagawa, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H01L27/3262H01L27/1222H01L27/3276H01L29/78675H01L29/78696H01L51/52H01L27/12H01L27/124
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Quick Facts
Patent No.
US 10,680,049
App. No.
16/358,904
Granted
Jun 9, 2020
Kind
B2
Abstract

The present invention provides a TFT that has a channel length particularly longer than that of an existing one, specifically, several tens to several hundreds times longer than that of the existing one, and thereby allowing turning to an on-state at a gate voltage particularly higher than the existing one and driving, and allowing having a low channel conductance gd. According to the present invention, not only the simple dispersion of on-current but also the normalized dispersion thereof can be reduced, and other than the reduction of the dispersion between the individual TFTs, the dispersion of the OLEDs themselves and the dispersion due to the deterioration of the OLED can be reduced.

Claims (25)

1. A light emitting device comprising:

a semiconductor film including a channel formation region, a source region, and a drain region;

a first insulating film over the semiconductor film;

a gate electrode over the first insulating film;

a second insulating film over the gate electrode;

a power supply line over the second insulating film, the power supply line being electrically connected to one of the source region and the drain region;

a source wiring over the second insulating film, the source wiring including a region overlapping with the semiconductor film; and

a light-emitting element electrically connected to the other of the source region and the drain region,

wherein a capacitance is formed in a region overlapping with the channel formation region by arranging the gate electrode, the second insulating film, and the power supply line in this order,

wherein an end portion of the channel formation region includes a first point and a second point which overlap with the gate electrode, and

wherein a length connecting the first point and the second point along a channel path is longer than a length connecting the first point and the second point by a straight line.

2. The light emitting device comprising according to claim 1 , wherein the channel formation region comprises a rectangular shape.

3. The light emitting device comprising according to claim 1 , wherein the channel formation region comprises a serpentine shape.

4. A light emitting device comprising:

a semiconductor film including a channel formation region, a source region, and a drain region;

a first insulating film over the semiconductor film;

a gate electrode over the first insulating film;

a second insulating film over the gate electrode;

a power supply line over the second insulating film, the power supply line being electrically connected to one of the source region and the drain region;

a source wiring over the second insulating film, the source wiring including a region overlapping with the semiconductor film; and

a light-emitting element electrically connected to the other of the source region and the drain region,

wherein a capacitance is formed in a region overlapping with the channel formation region by arranging the gate electrode, the second insulating film, and the power supply line in this order, and

wherein the channel formation region comprises at least one of corner portions in a region overlapping with the gate electrode.

5. The light emitting device comprising according to claim 4 , wherein the channel formation region comprises a rectangular shape.

6. The light emitting device comprising according to claim 4 , wherein the channel formation region comprises a serpentine shape.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 20, 2019
From: UDAGAWA, MAKOTO; HAYAKAWA, MASAHIKO; KOYAMA, JUN; OSAME, MITSUAKI; ANZAI, AYA
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 048650/0466 →
Priority Claims (2)
JP 2001-344671 · Nov 9, 2001 · national
JP 2002-010766 · Jan 18, 2002 · national
Continuity (9)
Continuation 15894981 · Feb 13, 2018
Continuation 15433007 · Feb 15, 2017
Division 14730334 · Jun 4, 2015
Continuation 14172943 · Feb 5, 2014
Continuation 13689888 · Nov 30, 2012
Continuation 13432009 · Mar 28, 2012
Division 12758862 · Apr 13, 2010
Division 10286868 · Nov 4, 2002
Related Publication 20190221628A1 · Jul 18, 2019
Cited By (2)
US 12,213,358 US 12,426,306