Semiconductor structure having photonic die and electronic die

1. A semiconductor structure, comprising:

a photonic die comprising a first portion and a second portion connected to the first portion, an optical device of the photonic die being within the first portion, and the second portion extending beyond lateral extents of the first portion;

an electronic die disposed on and electrically coupled to the photonic die; and

an insulating layer disposed on the photonic die and extending along sidewalls of the electronic die, wherein a sidewall of the first portion of the photonic die is coterminous with a sidewall of the insulating layer and smoother than a sidewall of the second portion of the photonic die.

2. The semiconductor structure of claim 1 , further comprising:

a supporting substrate disposed on the electronic die and the insulating layer and being opposite the photonic die.

3. The semiconductor structure of claim 1 , further comprising:

a conductive terminal disposed on the photonic die and being opposite the electronic die, wherein a through via of the photonic die is vertically and electrically coupled to the electronic die and the conductive terminal.

4. The semiconductor structure of claim 1 , wherein a fiber is substantially aligned with a facet on a sidewall of the first portion of the photonic die to be optically coupled to the photonic die, and a surface roughness of a sidewall of the second portion is greater than a surface roughness of the facet.

5. The semiconductor structure of claim 1 , wherein the photonic die comprises a semiconductor substrate, the optical device is disposed over a front surface of the semiconductor substrate, and a width of the front surface of the semiconductor substrate is different from a width of the rear surface of the semiconductor substrate.

6. The semiconductor structure of claim 5 , wherein the width of the front surface of the semiconductor substrate is less than the width of the rear surface of the semiconductor substrate.

7. The semiconductor structure of claim 1 , wherein a bonding interface of the electronic die and the photonic die is substantially leveled with an interface of the insulating layer and the photonic die.

8. The semiconductor structure of claim 1 , wherein the second portion of the photonic die is separated from the optical device of the photonic die by a shortest vertical distance that is non-zero.

9. A semiconductor structure, comprising:

an electronic die;

an insulating layer extending along sidewalls of the electronic die, the insulating layer comprising a first portion and a second portion connected to the first portion, and the first portion extending beyond lateral extents of the second portion; and

a photonic die electrically coupled to the electronic die and comprising an optical device, the electronic die and the insulating layer being disposed on the photonic die, and a sidewall of the second portion of the insulating layer being coterminous with a sidewall of the photonic die.

10. The semiconductor structure of claim 9 , further comprising:

a supporting substrate disposed on the electronic die and the insulating layer and being opposite the photonic die.

11. The semiconductor structure of claim 9 , further comprising:

a conductive terminal disposed on the photonic die and being opposite the electronic die, wherein a through via of the photonic die is vertically and electrically coupled to the electronic die and the conductive terminal.

12. The semiconductor structure of claim 9 , wherein a fiber is substantially aligned with a facet on the sidewall of the photonic die to be optically coupled to the photonic die, and a surface roughness of a sidewall of the first portion of the insulating layer is greater than a surface roughness of the facet.

13. The semiconductor structure of claim 9 , wherein a bonding interface of the electronic die and the photonic die is substantially leveled with an interface of the insulating layer and the photonic die.

14. The semiconductor structure of claim 9 , wherein the optical device of the photonic die is separated from the first portion of the insulating layer by a shortest vertical distance that is non-zero.

15. A semiconductor structure, comprising:

a photonic die comprising a first portion and a second portion connected to the first portion, an optical device of the photonic die being within the first portion, and the second portion extending beyond lateral extents of the first portion;

an electronic die disposed on and electrically coupled to the photonic die; and

an insulating layer disposed on the photonic die and extending along sidewalls of the electronic die, wherein a sidewall of the second portion of the photonic die is coterminous with a sidewall of the insulating layer, and a sidewall of the first portion of the photonic die is smoother than the sidewall of the second portion.

16. The semiconductor structure of claim 15 , further comprising:

a supporting substrate disposed on the electronic die and the insulating layer and being opposite the photonic die.

17. The semiconductor structure of claim 15 , wherein a fiber is substantially aligned with a facet on a sidewall of the first portion of the photonic die to be optically coupled to the photonic die, and a surface roughness of the sidewall of the insulating layer is greater than a surface roughness of the facet.

18. The semiconductor structure of claim 15 , wherein a bonding interface of the electronic die and the photonic die is substantially leveled with an interface of the insulating layer and the photonic die.

19. The semiconductor structure of claim 15 , further comprising:

a conductive terminal disposed on the photonic die and being opposite the electronic die, wherein a through via of the photonic die is vertically and electrically coupled to the electronic die and the conductive terminal.

20. The semiconductor structure of claim 15 , wherein the second portion of the photonic die is separated from the optical device of the photonic die by a shortest vertical distance that is non-zero.