Heterogeneous annealing method
A method of integrating a first substrate having a first surface with a first insulating material and a first contact structure with a second substrate having a second surface with a second insulating material and a second contact structure. The first insulating material is directly bonded to the second insulating material. A portion of the first substrate is removed to leave a remaining portion. A third substrate having a coefficient of thermal expansion (CTE) substantially the same as a CTE of the first substrate is bonded to the remaining portion. The bonded substrates are heated to facilitate electrical contact between the first and second contact structures. The third substrate is removed after heating to provided a bonded structure with reliable electrical contacts.
1. A method comprising:
providing a first substrate comprising a first major portion having a first coefficient of thermal expansion, the first substrate comprising a first bonding layer disposed over the first major portion and having a first bonding surface;
providing a second substrate comprising a second major portion having a second coefficient of thermal expansion that is different than the first coefficient of thermal expansion, the second substrate comprising a second bonding layer disposed over the second major portion and having a second bonding surface;
directly bonding the first bonding surface of the first substrate to the second bonding surface of the second substrate;
thinning the second substrate;
bonding the second substrate to a third substrate;
heating the first, second, and third substrates after directly bonding the first bonding surface to the second bonding surface, and after bonding the second substrate to the third substrate; and
removing the third substrate from the second substrate.
2. The method of claim 1 , wherein the thinning of the second substrate occurs after the directly bonding the first and second bonding surfaces.
3. The method of claim 1 , wherein the directly bonding comprises directly bonding together the first and second substrates at room temperature.
4. The method of claim 3 , wherein the heating comprises bringing the first, second, and third substrates to a temperature of at least 150° C.
5. The method of claim 3 , wherein the heating comprises bringing the first, second, and third substrates to a temperature in a range of 75° C. to 150° C.
6. The method of claim 1 , wherein the first major portion is formed substantially of a first semiconductor material and the second major portion is formed substantially of a second semiconductor material different from the first semiconductor material.
7. The method of claim 1 , wherein:
the first bonding layer comprises a first dielectric layer that defines the first bonding surface, and first metal contact structures are disposed in the first dielectric layer;
the second bonding layer comprises a second dielectric layer that defines the second bonding surface, and second metal contact structures are disposed in the second dielectric layer; and
the heating causes at least one of the first metal contact structures to expand and metallically bond with one of the second metal contact structures.
8. The method of claim 1 , wherein the directly bonding comprises directly bonding first metal contact structures of the first bonding layer to second metal contact structures of the second bonding layer without an adhesive.
9. The method of claim 8 , wherein the directly bonding comprises directly bonding a first nonconductive region of the first bonding layer to a second nonconductive region of the second bonding layer without an adhesive.
10. The method of claim 1 , wherein the bonding the second substrate to the third substrate comprises directly bonding the second substrate to the third substrate without an adhesive.
11. The method of claim 1 , further comprising heating the first, second, and third substrates while the third substrate is bonded to the second substrate.
12. The method of claim 1 , wherein removing the third substrate from the second substrate is performed after the heating.
13. The method of claim 1 , wherein a third major portion of the third substrate has a third coefficient of thermal expansion that is substantially equal to the first coefficient of thermal expansion.
14. A method comprising:
directly bonding a first bonding surface of a first bonding layer of a first substrate to a second bonding surface of a second bonding layer of a second substrate, the first substrate comprising a first major portion having a first coefficient of thermal expansion that is different from a second coefficient of thermal expansion of a second major portion of the second substrate;
thinning the second substrate;
bonding the second substrate to a third substrate; and
removing the third substrate from the second substrate after heating the first, second and third substrates.
15. The method of claim 14 , wherein bonding the second substrate to the third substrate comprises directly bonding the second substrate to the third substrate without an adhesive.
16. The method of claim 14 , wherein the directly bonding comprises directly bonding first metal contact structures of the first bonding layer to second metal contact structures of the second bonding layer without an adhesive.
17. The method of claim 16 , wherein the directly bonding comprises directly bonding a first nonconductive region of the first bonding layer to a second nonconductive region of the second bonding layer without an adhesive.
18. The method of claim 17 , wherein the heating causes at least one of the first metal contact structures to expand and metallically bond with one of the second metal contact structures.
19. The method of claim 17 , wherein the heating comprises bringing the first, second, and third substrates to a temperature of at least 150° C.
20. The method of claim 17 , wherein the heating comprises bringing the first, second, and third substrates to a temperature in a range of 75° C. to 150° C.
21. The method of claim 14 , wherein the first major portion is formed substantially of silicon and the second major portion is formed substantially of a material different than silicon.
22. The method of claim 14 , wherein a third major portion of the third substrate has a third coefficient of thermal expansion that is substantially equal to the first coefficient of thermal expansion.