Capacitor structure including bonding pads as electrodes and methods of forming the same

1. A semiconductor structure, comprising:

a bonded assembly of a first semiconductor die including first metal bonding pads and a second semiconductor die including second metal bonding pads that are bonded to the first metal bonding pads; and

a capacitor structure comprising a first electrode, a second electrode, and a node dielectric disposed between the first electrode and the second electrode,

wherein:

the first electrode comprises first bonded pairs of a respective first metal bonding pad of a first subset of the first metal bonding pads and a respective second metal bonding pad of a first subset of the second metal bonding pads;

the second electrode comprises second bonded pairs of a respective first metal bonding pad of a second subset of the first metal bonding pads and a respective second metal bonding pad of a second subset of the second metal bonding pads;

the node dielectric comprises portions of a first bonding-level dielectric layer laterally surrounding the first metal bonding pads and disposed between laterally neighboring pairs of the first metal bonding pads and portions of a second bonding-level dielectric layer laterally surrounding the second metal bonding pads and disposed between laterally neighboring pairs of the second metal bonding pads;

the first subset of the first metal bonding pads, the first subset of the second metal bonding pads, the second subset of the first metal bonding pads, and the second subset of the second metal bonding pads comprise respective rows of metal bonding pads having a periodic pitch along a first horizontal direction and having a nearest-neighbor spacing within each row that is less than one half of the periodic pitch along the first horizontal direction; and

the periodic pitch is in a range from 1,000 nm to 10,000 nm.

2. The semiconductor structure of claim 1 , further comprising metal interconnect structures located in a first one of the first semiconductor die and the second semiconductor die and comprising:

a first electrically conductive path that electrically connects the first electrode to a first node of semiconductor devices located within the first one of the first semiconductor die and the second semiconductor die; and

a second electrically conductive path that electrically connects the second electrode to a second node of the semiconductor devices located within the first one of the first semiconductor die and the second semiconductor die.

3. The semiconductor structure of claim 2 , wherein the first electrode and the second electrode do not contact any metal interconnect structure located within a second one of the first semiconductor die and the second semiconductor die.

4. The semiconductor structure of claim 1 , wherein:

the first bonded pairs are arranged as first rows of bonded pairs of a respective first metal bonding pad within the first subset of the first metal bonding pads and a respective second metal bonding pad within the first subset of the second metal bonding pads; and

the second bonded pairs are arranged as second rows of bonded pairs of a respective first metal bonding pad within the second subset of the first metal bonding pads and a respective second metal bonding pad within the second subset of the second metal bonding pads.

5. The semiconductor structure of claim 4 , wherein:

each of the first rows of bonded pairs laterally extends along a first horizontal direction;

each of the second rows of bonded pairs laterally extends along the first horizontal direction; and

the first rows of bonded pairs and the second rows of bonded pairs are interlaced along a second horizontal direction that is perpendicular to the first horizontal direction such that the first rows and the second rows alternate along the second horizontal direction.

6. The semiconductor structure of claim 1 , wherein:

the first metal bonding pads and the second metal bonding pads comprise a metal element at an atomic percentage greater than 90%; and

bonding interfaces are located between a respective one of the first metal bonding pads and a respective one of the second metal bonding pads; and

grain boundaries protrude upward or downward through the bonding interfaces.

7. The semiconductor structure of claim 1 , wherein:

the first electrode comprises first metal lines located within a first one of the first semiconductor die and the second semiconductor die and electrically connected to the first bonded pairs; and

the second electrode comprises second metal lines located within the first one of the first semiconductor die and the second semiconductor die and electrically connected to the second bonded pairs.

8. The semiconductor structure of claim 7 , wherein:

the first semiconductor die comprises a memory die containing a three-dimensional array of memory elements; and

the second semiconductor die comprises a logic die containing a peripheral circuit configured to control operation of the three-dimensional array of memory elements.

9. The semiconductor structure of claim 8 , wherein:

the memory die further comprises bit lines located between the three-dimensional array of memory elements and a horizontal plane including bonding interfaces between the first semiconductor die and the second semiconductor die; and

the first metal lines and the second metal lines are more proximal to the horizontal plane including the bonding interfaces than the bit lines are to the horizontal plane.

10. The semiconductor structure of claim 8 , wherein:

the logic die comprises field effect transistors located on a surface of a logic-side semiconductor substrate; and

the first metal lines and the second metal lines are more proximal to a horizontal plane including bonding interfaces between the first semiconductor die and the second semiconductor die than the field effect transistors are to the horizontal plane.

11. The semiconductor structure of claim 7 , wherein:

the first metal lines laterally extend along a first horizontal direction;

the second metal lines laterally extend along the first horizontal direction; and

the first metal lines and the second metal lines are interlaced along a second horizontal direction that is perpendicular to the first horizontal direction such that the first metal lines and the second metal lines alternate along the second horizontal direction.

12. The semiconductor structure of claim 11 , wherein

the first electrode further comprises a first bus metal line laterally extending along the second horizontal direction;

each of the first metal lines comprises a respective end portion connected to the first bus metal line;

the second electrode further comprises a second bus metal line laterally extending along the second horizontal direction; and

each of the second metal lines comprises a respective end portion connected to the second bus metal line.

13. The semiconductor structure of claim 1 , wherein:

a third subset of the first metal bonding pads is electrically isolated from the capacitor structure and is electrically connected to a respective node of first semiconductor devices located in the first semiconductor die;

a third subset of the second metal bonding pads is electrically isolated from the capacitor structure and is electrically connected to a respective node of second semiconductor devices located in the second semiconductor die; and

the third subset of the second metal bonding pads is bonded to the third subset of the first metal bonding pads.

14. The semiconductor structure of claim 1 , wherein:

the first semiconductor die comprises a first semiconductor substrate on which first semiconductor devices are located;

the second semiconductor die comprises a second semiconductor substrate on which second semiconductor devices are located; and

the semiconductor structure further comprises:

a backside insulating layer located on a backside of one of the first semiconductor substrate and the second semiconductor substrate; and

external bonding pads located on the backside insulating layer and electrically connected to a respective one of the first semiconductor devices and the second semiconductor devices.