Granted Patent B2

US 12,195,384 · App. 18/135,932 · Granted Jan 14, 2025

Inventors: Karl William Koch, III (Elmira, NY); Charles Andrew Paulson (Painted Post, NY); James Joseph Price (Corning, NY)

Assignee: Corning Incorporated

C03C17/3435C03C3/091C03C17/245C03C17/3411C03C21/002C23C14/34C23C14/3442G02B1/10G02B1/14C03C2217/78C03C2217/91Y10T428/2495Y10T428/31612

Abstract

Claims (41)

1. A transparent article comprising:

a substrate having opposing major surfaces; and

an optical film structure disposed on a first major surface of the substrate forming a front face,

wherein the transparent article comprises a maximum hardness of about 12 GPa or greater, as measured on the front face by a Berkovich Indenter Hardness Test along an indentation depth from about 200 nm to about 600 nm;

wherein the optical film structure comprises a compositional gradient comprising any one or more of an oxygen content gradient, a nitrogen content gradient, a silicon content gradient and an aluminum content gradient; and

wherein the article comprises either one or both of:

article transmittance color coordinates in the (L*, a*t b*) colorimetry system at normal incidence exhibiting a color shift of less than about 2 from a reference point as measured at the front face, the reference point comprising at least one of the color coordinates (a*=0, b*=0) and the transmittance color coordinates of the substrate, and

article reflectance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence exhibiting a color shift of less than about 2 from a reference point as measured at the front face, the reference point comprising at least one of the color coordinates (a*=0, b*=0) and the reflectance color coordinates of the substrate,

wherein, when the reference point is the color coordinates of the substrate, the color shift is defined by √((a*article-a*substrate)2+(b*article-b*substrate)2), and

wherein, when the reference point is the color coordinates (a*=0, b*=0), the color shift is defined by √((a*article)2+(b*article)2).

2. The transparent article of claim 1 , wherein the article comprises an average transmittance of 85% or more, over the visible spectrum as measured at the front face.

3. The transparent article of claim 1 , further comprising a scratch resistance such that, when the front face is scratched with a Berkovich indenter using a load of 160 mN at a speed of 10 μm/seconds for at least a length of 100 μm along the front face of the article, a scratch having a scratch depth of less than 250 nm is formed.

4. The transparent article of claim 1 , further comprising a scratch resistance such that, when the front face is scratched with a Berkovich indenter using a load of 160 mN at a speed of 10 μm/seconds for at least a length of 100 μm along the front face of the article, a scratch having a scratch width of less than 10 μm is formed.

5. The transparent article of claim 1 , wherein the article comprises a maximum hardness of about 16 GPa or greater, as measured on the front face by a Berkovich Indenter Hardness Test along the indentation depth.

6. The transparent article of claim 1 , wherein the optical film structure comprises one of a silicon-containing oxide, a silicon-containing oxy-nitride, silicon nitride, aluminum nitride, an aluminum-containing oxy-nitride, an aluminum-containing oxide, silicon aluminum oxy-nitride or a combination thereof.

7. The transparent article of claim 1 , wherein the optical film structure comprises a first layer and a second layer.

8. The transparent article of claim 7 , wherein:

the first layer comprises the compositional gradient

the second layer comprises a transparent dielectric material.

9. The transparent article of claim 1 , wherein the optical film structure has a thickness of 1 μm or greater.

10. The transparent article of claim 1 , wherein the substrate comprises a glass ceramic substrate.

11. An article comprising:

a substrate having opposing major surfaces; and

an optical film structure disposed on a first major surface of the substrate forming a front face;

the optical film structure comprising a first layer, the first layer comprising a first sub-layer and a second sub-layer wherein the first sub-layer is disposed between substrate and the second sub-layer,

the first sub-layer having a thickness and comprising a silicon-containing oxy-nitride, with the amount of oxygen in the silicon-containing oxy-nitride decreasing along the thickness moving away from the substrate,

the first sub-layer being disposed directly on the substrate and having a refractive index gradient that increases along the thickness of the first sub-layer in a direction moving away from the substrate and changes with the change in the amount of oxygen in the first sub-layer.

12. The article of claim 11 , wherein the article comprises either one or both of:

article transmittance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence exhibiting a color shift of less than about 2 from a reference point as measured at the front face, the reference point comprising at least one of the color coordinates (a*=0, b*=0) and the transmittance color coordinates of the substrate, and

article reflectance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence exhibiting a color shift of less than about 2 from a reference point as measured at the front face, the reference point comprising at least one of the color coordinates (a*=0, b*=0) and the reflectance color coordinates of the substrate,

wherein, when the reference point is the color coordinates of the substrate, the color shift is defined by √((a* article -a* substrate ) 2 +(b* article -b* substrate ) 2 ), and

wherein, when the reference point is the color coordinates (a*=0, b*=0), the color shift is defined by √((a* article ) 2 +(b* article ) 2 ).

13. The article of claim 11 , wherein the article comprises an average transmittance of 85% or more, over the visible spectrum as measured at the front face.

14. The article of claim 11 , wherein the article comprises a maximum hardness of about 12 GPa or greater, as measured on the front face by a Berkovich Indenter Hardness Test along an indentation depth from about 200 nm to about 600 nm.

15. The article of claim 11 , wherein the article comprises a maximum hardness of about 16 GPa or greater, as measured on the front face by a Berkovich Indenter Hardness Test along an indentation depth from about 200 nm to about 600 nm.

16. The article of claim 11 , wherein the optical film structure has a thickness of 1 μm or greater.

17. The article of claim 11 , wherein the substrate comprises a glass ceramic substrate.

18. The article of claim 11 , wherein the substrate comprises an amorphous substrate.

19. The article of claim 11 , wherein the second sub-layer comprises a transparent dielectric material.

20. The article of claim 1 , wherein the optical film structure comprises a first sub-layer of a silicon-containing oxy-nitride or a silicon-containing aluminum oxy-nitride, the first sub-layer comprising the compositional gradient.

21. The article of claim 11 , wherein the second sub-layer comprises AlN, AlO x N y , SiAlN, Si u1 Al v O x N y , or combinations thereof.

Assignments (1)

Continuity (5)

References Cited (400)