Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device
An object of the present invention is to provide a solution which contains an organic solvent as a main component (content: equal to or greater than 98% by mass) and has an excellent defect inhibition ability. Another object of the present invention is to provide a solution storage body storing the solution, an actinic ray-sensitive or radiation-sensitive resin composition containing the solution, and a pattern forming method and a manufacturing method of a semiconductor device using the solution. The solution of the present invention is a solution containing at least one kind of organic solvent having a boiling point lower than 200° C. and an organic impurity having a boiling point equal to or higher than 250° C., in which a content of the organic solvent with respect to a total mass of the solution is equal to or greater than 98% by mass, and a content of the organic impurity with respect to the total mass of the solution is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a solution comprising:
at least one kind of organic solvent having a boiling point lower than 200° C.; and
an organic impurity having a boiling point equal to or higher than 250° C.,
wherein a content of the organic solvent with respect to a total mass of the solution is equal to or greater than 98% by mass,
a content of the organic impurity with respect to the total mass of the solution is equal to or greater than 0.1 mass ppm and less than 100 mass ppm, and
the organic impurity is at least one kind of compound selected from the group consisting of dioctyl phthalate, diisononyl phthalate, dioctyl adipate, dibutyl phthalate, ethylene propylene rubber, dimethyl phthalate, p-Toluic acid, bis (2-ethylhexyl) phthalate, addition polymer of 5-ethylidene-2-norbornene represented by the following structural formula,
addition polymer of cyclopentadiene represented by the following structural formula,
addition polymer of 1,4-hexadiene represented by the following structural formula,
diisodecyl phthalate, bis (2-propylheptyl) phthalate, benzyl butyl phthalate, diisooctyl phthalate, diethyl phthalate, diisobutyl phthalate, tris (2-ethylhexyl) trimellitate, tris (n-octyl-n-decyl) trimellitate, bis (2-ethylhexyl) adipate, monomethyl adipate, dibutyl sebacate, dibutyl maleate, diisobutyl maleate, dioctyl terephthalate, diisononyl 1,2-cyclohexanedicarboxylic acid ester, epoxidized vegetable oil, N-(2-hydroxypropyl) benzene sulfonamide, N-(n-butyl) benzene sulfonamide, tricresyl phosphate, tributyl phosphate, triethyl citrate, acetyl triethyl citrate, tributyl citrate, acetyl tributyl citrate, trioctyl citrate, acetyl trioctyl citrate, trihexyl citrate, acetyl trihexyl citrate, and epoxidized soybean oil; and
a resin P having a repeating unit represented by Formula (AI):
in Formula (AI),
Xa 1 represents a hydrogen atom or an alkyl group which may have a substituent,
T represents a single bond or a divalent linking group,
Ra 1 to Ra 3 each independently represent an alkyl group or a cycloalkyl group, and two out of Ra 1 to Ra 3 may form a cycloalkyl group by being bonded to each other.
2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,
wherein the resin P further has a repeating unit Q having a lactone structure on a side chain.
3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,
wherein the resin P is a resin represented by Formula (I):
in Formula (I),
Rx 1 to Rx 5 each independently represent a hydrogen atom or an alkyl group which may have a substituent,
R 1 to R 4 each represent a monovalent substituent, p 1 to p 4 each independently represent 0 or a positive integer,
R a represents a linear or branched alkyl group,
T 1 to T 5 each represent a single bond or a divalent linking group,
R 5 represents a monovalent organic group,
a to e each represent mol % and each independently represent a number included in a range of 0≤a≤100, 0≤b≤100, 0≤c<100, 0≤d<100, or 0≤e<100, here, a+b+c+d+e =100, and a +b≠0, and
in Formula (I), the repeating unit (e) has a structure different from all of the repeating units (a) to (d).
4. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a solution comprising:
at least one kind of organic solvent having a boiling point lower than 200° C.; and
an organic impurity having a boiling point equal to or higher than 250° C.,
wherein a content of the organic solvent with respect to a total mass of the solution is equal to or greater than 98% by mass,
a content of the organic impurity with respect to the total mass of the solution is equal to or greater than 0.1 mass ppm and less than 100 mass ppm, and
the organic impurity is at least one kind of compound selected from the group consisting of dioctyl phthalate, diisononyl phthalate, dioctyl adipate, dibutyl phthalate, ethylene propylene rubber, dimethyl phthalate, p-Toluic acid, bis (2-ethylhexyl) phthalate, addition polymer of 5-ethylidene-2-norbornene represented by the following structural formula,
addition polymer of cyclopentadiene represented by the following structural formula,
addition polymer of 1,4-hexadiene represented by the following structural formula,
diisodecyl phthalate, bis (2-propylheptyl) phthalate, benzyl butyl phthalate, diisooctyl phthalate, diethyl phthalate, diisobutyl phthalate, tris (2-ethylhexyl) trimellitate, tris (n-octyl-n-decyl) trimellitate, bis (2-ethylhexyl) adipate, monomethyl adipate, dibutyl sebacate, dibutyl maleate, diisobutyl maleate, dioctyl terephthalate, diisononyl 1,2-cyclohexanedicarboxylic acid ester, epoxidized vegetable oil, N-(2-hydroxypropyl) benzene sulfonamide, N-(n-butyl) benzene sulfonamide, tricresyl phosphate, tributyl phosphate, triethyl citrate, acetyl triethyl citrate, tributyl citrate, acetyl tributyl citrate, trioctyl citrate, acetyl trioctyl citrate, trihexyl citrate, acetyl trihexyl citrate, and epoxidized soybean oil; and
a resin P which has a repeating unit having a phenolic hydroxyl group and has a group generating a polar group by being decomposed by the action of an acid.