IP Library › Granted Patent US 12,282,259
Granted Patent B2
US 12,282,259 · App. 16/924,859 · Granted Apr 22, 2025

Liquid chemical, method for producing liquid chemical, and method for analyzing test target solution

Inventor: Tetsuya Kamimura (Haibara-gun, JP)
Assignee: FUJIFILM Corporation
G03F7/325G01N15/06G01N21/9505G03F7/0048G03F7/11G01N15/075G03F7/2006
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,282,259
App. No.
16/924,859
Granted
Apr 22, 2025
Kind
B2
Abstract

An object is to provide a liquid chemical exhibiting excellent defect inhibitive performance even in a case of being applied to a resist process by KrF excimer laser exposure and ArF excimer laser exposure. Another object is to provide a method for analyzing a test target solution and a method for producing a liquid chemical. A liquid chemical includes an organic solvent; and metal-containing particles containing a metal atom and having a particle size of 10 to 100 nm, in which the number of the metal-containing particles contained is 1.0×10 −2 to 1.0×10 12 particles/cm 3 .

Claims (44)

1. A liquid chemical comprising:

an organic solvent;

metal-containing particles containing a metal atom and having a particle size of 10 to 100 nm, and

an organic compound having a boiling point of 300° C. or higher,

wherein the number of the metal-containing particles contained is 1.0×10 8 to 1.0×10 11 particles/cm 3 , and

the organic solvent is at least one selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monoethyl ether (PGME), propylene glycol monopropyl ether, propylene glycol monomethyl ether acetate (PGMEA), ethyl lactate (EL), methyl methoxypropionate, cyclopentanone, cyclohexanone (CHN), γ-butyrolactone, diisoamyl ether, butyl acetate (nBA), isoamyl acetate, dimethyl sulfoxide, N-methyl-2-pyrrolidone, ethylene carbonate, propylene carbonate (PC), sulfolane, cycloheptanone, decane, and 2-heptanone.

2. The liquid chemical according to claim 1 , which is used for manufacturing a semiconductor device.

3. The liquid chemical according to claim 2 ,

wherein the metal-containing particles consist of at least one selected from the group consisting of particles A consisting of a simple substance of the metal atom, particles B consisting of an oxide of the metal atom, and particles C consisting of a simple substance of the metal atom and an oxide of the metal atom.

4. The liquid chemical according to claim 1 ,

wherein the metal-containing particles consist of at least one selected from the group consisting of particles A consisting of a simple substance of the metal atom, particles B consisting of an oxide of the metal atom, and particles C consisting of a simple substance of the metal atom and an oxide of the metal atom.

5. The liquid chemical according to claim 4 ,

wherein the particles C have a simple substance of the metal atom and have an oxide of the metal atom which is disposed to cover at least a part of a surface of the simple substance of the metal atom.

6. The liquid chemical according to claim 4 ,

wherein a ratio of the number of the particles C contained to the number of the particles B contained is 1.0 or more, based on the number of the particles per unit volume of the liquid chemical.

7. The liquid chemical according to claim 4 ,

wherein a ratio of the number of the particles A contained to a total of the number of the particles B contained and the number of the particles C contained is less than 1.0, based on the number of the particles per unit volume of the liquid chemical.

8. The liquid chemical according to claim 4 ,

wherein a ratio of the number of the particles A contained to a total of the number of the particles B contained and the number of the particles C contained is 1.0×10 −1 or less, based on the number of the particles per unit volume of the liquid chemical.

9. The liquid chemical according to claim 4 ,

wherein the particles A consist of particles E consisting of one kind of the metal atom, and particles F consisting of two or more kinds of metal atoms, and

a ratio of the number of the particles E contained to the number of the particles F contained is 1.0×10 −2 to 1.0×10 2 , based on the number of the particles per unit volume of the liquid chemical.

10. The liquid chemical according to claim 1 ,

wherein at least some of the metal-containing particles are particles U containing the organic compound.

11. The liquid chemical according to claim 10 ,

wherein the number of the particles U contained per unit volume of the liquid chemical is 5.0×10 −2 to 1.0×10 11 particles/cm 3 .

12. The liquid chemical according to claim 1 ,

wherein at least some of the metal-containing particles are the particles U containing the organic compound and particles V not containing the organic compound, and

a ratio of the number of the particles U contained to the number of the particles V contained is 1.0×10 1 or more, based on the number of the particles per unit volume of the liquid chemical.

13. The liquid chemical according to claim 1 ,

wherein at least some of the metal-containing particles are at least one selected from the group consisting of Pb-containing particles containing a Pb atom and Ti-containing particles containing a Ti atom.

14. The liquid chemical according to claim 1 ,

wherein at least some of the metal-containing particles are Pb-containing particles containing a Pb atom and Ti-containing particles containing a Ti atom, and

a ratio of the number of the Pb-containing particles contained to the number of the Ti-containing particles contained is 1.0×10 −5 to 1.0, based on the number of the particles per unit volume of the liquid chemical.

15. A method for producing a liquid chemical, which is for producing the liquid chemical according to claim 1 , the method comprising:

a filtration step of filtering a purification target substance containing the organic solvent using a filter to obtain the liquid chemical.

16. The method for producing a liquid chemical according to claim 15 , the method further comprising:

a distillation step of distilling the purification target substance to obtain a distilled purification target substance prior to the filtration step,

wherein the purification target substance contains the organic compound having a boiling point of 300° C. or higher, and

a content of the organic compound in the distilled purification target substance is 1.0×10 −3 mass ppt to 1.0×10 3 mass ppm.

17. The method for producing a liquid chemical according to claim 15 ,

wherein the filter comprises two or more kinds of filters, and the filtration step is a multi-stage filtration step in which the purification target substance is passed through the two or more kinds of filters different in at least one selected from the group consisting of a filter material, a pore diameter, and a pore structure.

18. The method for producing a liquid chemical according to claim 15 ,

wherein, for the filter, when using one filter, a pore diameter of the filter is 5 nm or smaller, and when using two or more filters, a pore diameter of the filter having a smallest pore diameter among the filters is 5 nm or smaller.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2020
From: KAMIMURA, TETSUYA
To: FUJIFILM CORPORATION
Reel/Frame 053166/0889 →
Priority Claims (1)
JP 2018-003583 · Jan 12, 2018 · national
Continuity (2)
Continuation PCTJP2019000441 · Jan 10, 2019
Related Publication 20200341382A1 · Oct 29, 2020
References Cited (37)
US 5518628A · Carey · 1996 [cited by examiner]
US 20050016929A1 · Kashkoush · 2005 [cited by applicant]
US 20080213494A1 · Kimura · 2008 [cited by examiner]
US 20120064456A1 · Bae et al. · 2012 [cited by applicant]
US 20140377175A1 · Berlin · 2014 [cited by examiner]
US 20150064625A1 · Ogihara et al. · 2015 [cited by applicant]
US 20150227049A1 · Yamanaka · 2015 [cited by examiner]
US 20160336200A1 · Jhuan et al. · 2016 [cited by applicant]
US 20170176650A1 · Govorov · 2017 [cited by examiner]
US 20190011827A1 · Shimizu et al. · 2019 [cited by applicant]
US 20190060782A1 · Shimizu et al. · 2019 [cited by applicant]
US 20190339619A1 · Kamimura · 2019 [cited by applicant]
US 20200206691A1 · Jaber · 2020 [cited by examiner]
US 20200319559A1 · Kamimura · 2020 [cited by examiner]
US 20200341381A1 · Kamimura · 2020 [cited by examiner]
JP 2002099076A · 2002 [cited by applicant]
JP 2015049395A · 2015 [cited by applicant]
JP 2016073922A · 2016 [cited by applicant]
KR 100869333B1 · 2008 [cited by applicant]
TW 556059B · 2016 [cited by applicant]
WO 2017170428A1 · 2017 [cited by applicant]
WO 2017188209A1 · 2017 [cited by applicant]
WO 2018142888A1 · 2018 [cited by applicant]
International Search Report dated Mar. 12, 2019, issued by the International Searching Authority in application No. PCT/JP2019/000441. [cited by applicant]
Written Opinion dated Mar. 12, 2019, issued by the International Searching Authority in application No. PCT/JP2019/000441. [cited by applicant]
International Preliminary Report on Patentability dated Jul. 14, 2020, issued by the International Bureau in application No. PCT/JP2019/000441. [cited by applicant]
Notification of Reason for Refusal dated Mar. 21, 2022 from the Korean Intellectual Property Office in KR application No. 10-2020-7019414. [cited by applicant]
Office Action issued May 31, 2022 in Japanese Application No. 2019-564723. [cited by applicant]
Communication dated Sep. 7, 2021 from the Japanese Patent Office in Application No. 2019-564723. [cited by applicant]
Office Action dated Sep. 7, 2022 issued in Taiwanese Application No. 108101103. [cited by applicant]
Office Action issued Dec. 15, 2022 in Korean Application No. 10-2020-7019414. [cited by applicant]
Taiwanese Office Action dated Dec. 12, 2022 in Taiwanese Application No. 108101103. [cited by applicant]
Chinese Office Action dated Dec. 9, 2022 in Chinese Application No. 201980007846.9. [cited by applicant]
Office Action issued Jun. 26, 2023 in Korean Application No. 10-2020-7019414. [cited by applicant]
Communication dated Jun. 20, 2023 issued by the State Intellectual Property Office of the P.R. China in application No. 201980007846.9. [cited by applicant]
Office Action issued Aug. 7, 2023 in Taiwanese Application No. 108101103. [cited by applicant]
Office Action issued Feb. 19, 2025 in Taiwanese Patent Application No. 113138178. [cited by applicant]
Cited By (1)
US 12,650,647