IP Library › Granted Patent US 12,650,647
Granted Patent B2
US 12,650,647 · App. 16/924,555 · Granted Jun 9, 2026

Liquid chemical and method for producing liquid chemical

Inventor: Tetsuya Kamimura (Shizuoka, JP)
Assignee: FUJIFILM Corporation
G03F7/32B01D39/1692G03F7/0048G03F7/70025H10P14/6509B82Y30/00B82Y40/00
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Quick Facts
Patent No.
US 12,650,647
App. No.
16/924,555
Granted
Jun 9, 2026
Kind
B2
Abstract

An object of the present invention is to provide a liquid chemical exhibiting excellent defect inhibitive performance even in a case of being applied to a resist process by EUV exposure. Another object thereof is to provide a method for producing a liquid chemical. The liquid chemical of the present invention includes an organic solvent, and metal-containing particles containing a metal atom, in which the number of metal nanoparticles contained in the metal-containing particles and having a particle size of 0.5 to 17 nm is 1.0×10 1 to 1.0×10 9 particles/cm 3 , based on the number of the particles per unit volume of the liquid chemical.

Claims (34)

1 . A liquid chemical comprising:

an organic solvent; and

metal-containing particles containing a metal atom,

wherein the number of metal nanoparticles contained in the metal-containing particles and having a particle size of 0.5 to 17 nm is 1.0×10 1 to 1.0×10 9 particles/cm 3 , based on the number of the particles per unit volume of the liquid chemical,

the metal nanoparticles include metal nanoparticles containing a Pb atom and metal nanoparticles containing a Ti atom,

a ratio of the number of the metal nanoparticles containing a Pb atom to the number of the metal nanoparticles containing a Ti atom is 1.0×10 −3 to 9.0×10 −1 , based on the number of the particles per unit volume of the liquid chemical,

the metal nanoparticles consist of at least one selected from the group consisting of particles A consisting of a simple substance of the metal atom, particles B consisting of an oxide of the metal atom, and particles C consisting of a simple substance of the metal atom and an oxide of the metal atom,

a ratio of the number of the particles A contained to a total of the number of the particles B contained and the number of the particles C contained 1.0×10 −1 or less, based on the number of the particles per unit volume of the liquid chemical, and

the liquid chemical includes no resin.

2 . The liquid chemical according to claim 1 ,

wherein a value of particle size distribution of the metal-containing particles on a number basis is a maximum value in at least one range selected from the group consisting of a range in which a particle size is smaller than 5 nm and a range in which a particle size is larger than 17 nm.

3 . The liquid chemical according to claim 2 ,

wherein a value of the particle size distribution is a maximum value in a range in which a particle size is 0.5 nm or larger and smaller than 5 nm.

4 . The liquid chemical according to claim 1 , which is used for manufacturing a semiconductor device.

5 . The liquid chemical according to claim 1 , further comprising:

an organic compound having a boiling point of 300° C. or higher.

6 . The liquid chemical according to claim 5 ,

wherein at least some of the metal nanoparticles are particles U containing the organic compound.

7 . The liquid chemical according to claim 5 ,

wherein at least some of the metal nanoparticles are the particles U containing the organic compound and particles V not containing the organic compound, and

a ratio of the number of the particles U contained to the number of the particles V contained is 1.0×10 1 or more, based on the number of the particles per unit volume of the liquid chemical.

8 . The liquid chemical according to claim 1 ,

wherein the metal nanoparticles include at least one selected from the group consisting of metal nanoparticles containing a Pb atom and metal nanoparticles containing a Ti atom.

9 . A method for producing a liquid chemical, which is for producing the liquid chemical according to claim 1 , the method comprising:

a filtration step of filtering a purification target substance containing an organic solvent using a filter to obtain the liquid chemical.

10 . The method for producing a liquid chemical according to claim 9 ,

wherein the filtration step is a multi-stage filtration step in which the purification target substance is passed through two or more kinds of filters different in at least one selected from the group consisting of a filter material, a pore diameter, and a pore structure.

11 . The method for producing a liquid chemical according to claim 9 ,

wherein, for the filter, in a case of using one filter, a pore diameter of the filter is 5 nm or smaller, and in a case of using two or more filters, a pore diameter of a filter having a smallest pore diameter among the filters is 5 nm or smaller.

12 . The liquid chemical according to claim 2 , which is used for manufacturing a semiconductor device.

13 . A method for producing a liquid chemical, which is for producing the liquid chemical according to claim 2 , the method comprising:

a filtration step of filtering a purification target substance containing an organic solvent using a filter to obtain the liquid chemical.

14 . The liquid chemical according to claim 1 ,

wherein a ratio of the number of the particles A contained to a total of the number of the particles B contained and the number of the particles C contained is 1.0×10 −3 or more, based on the number of the particles per unit volume of the liquid chemical.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2020
From: KAMIMURA, TETSUYA
To: FUJIFILM CORPORATION
Reel/Frame 053166/0968 →
Priority Claims (1)
JP 2018-003505 · Jan 12, 2018 · national
Continuity (2)
Continuation PCTJP2019000041 · Jan 7, 2019
Related Publication 20200341381A1 · Oct 29, 2020
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