Microwave plasma treatment device
View Patent ↗A microwave plasma treatment device includes a resonator including a container; a single microwave oscillation source that outputs a reference microwave; a waveguide that connects the microwave oscillation source and the resonator to each other; and a phase control mechanism that generates a modified microwave having a phase different from a phase of the reference microwave by controlling the phase of the reference microwave. The resonator includes one or more first-type introducing portions for introducing the reference microwave into the resonator and one or more second-type introducing portions for introducing the modified microwave into the resonator, and the microwave plasma treatment device is configured such that at least one of a position, a size, and a shape of a plasma ball generated in the container is changed by superimposing the modified microwave on the reference microwave in the resonator.
1. A microwave plasma treatment device comprising:
a resonator including a container;
a single microwave oscillation source configured to output a reference microwave to the resonator;
a waveguide that connects the microwave oscillation source and the resonator to each other; and
a phase control mechanism configured to generate a modified microwave having a phase different from a phase of the reference microwave by controlling a phase of a divided part of the reference microwave,
wherein the resonator includes one or more first-type introducing portions for introducing the reference microwave into the resonator, and one or more second-type introducing portions for introducing the modified microwave into the resonator, and
the microwave plasma treatment device is configured such that at least one of a position, a size, and a shape of a plasma ball generated in the container is changed by superimposing the modified microwave on the reference microwave in the resonator.
2. A microwave plasma treatment device comprising:
a resonator including a container;
a single microwave oscillation source configured to output a reference microwave to the resonator; and
a phase control mechanism configured to generate a modified microwave having a phase different from a phase of the reference microwave by controlling a phase of a part of the reference microwave introduced into the resonator,
wherein the microwave plasma treatment device is configured such that at least one of a position, a size, and a shape of a plasma ball generated in the container is changed by superimposing the modified microwave on the reference microwave in the resonator.
3. The microwave plasma treatment device according to claim 2 ,
wherein the resonator has a port connected to the container, and
the phase control mechanism includes a reflector disposed in the port, and a driving mechanism configured to change a position of the reflector in the port.
4. The microwave plasma treatment device according to claim 1 ,
wherein the phase control mechanism includes a phase shifter and a control device configured to control the phase shifter.
5. The microwave plasma treatment device according to claim 1 ,
wherein the phase control mechanism dynamically moves the plasma ball in the resonator.
6. The microwave plasma treatment device according to claim 2 ,
wherein the phase control mechanism includes a phase shifter and a control device configured to control the phase shifter.
7. The microwave plasma treatment device according to claim 3 ,
wherein the phase control mechanism includes a phase shifter and a control device configured to control the phase shifter.
8. The microwave plasma treatment device according to claim 2 ,
wherein the phase control mechanism dynamically moves the plasma ball in the resonator.
9. The microwave plasma treatment device according to claim 3 ,
wherein the phase control mechanism dynamically moves the plasma ball in the resonator.
10. The microwave plasma treatment device according to claim 4 ,
wherein the phase control mechanism dynamically moves the plasma ball in the resonator.