IP Library Granted Patent US 12,329,159
Granted Patent B2
US 12,329,159 · App. 17/373,544 · Granted Jun 17, 2025

Systems and methods for use of chlorine dioxide in cultivation and post-harvest applications

Inventors: Alex Joseph Cushman (Phoenix, AZ); Bret Bernard Lorenz (Phoenix, AZ); Noah Lustig (Phoenix, AZ)
Assignee: Prokure Solutions, LLC
A01N59/00A01G7/00A01G7/02A01N59/04
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Quick Facts
Patent No.
US 12,329,159
App. No.
17/373,544
Granted
Jun 17, 2025
Kind
B2
Abstract

Systems and methods of use of chlorine dioxide in controlled environmental agriculture settings and postharvest applications are provided. A method can comprise application of gaseous chlorine dioxide at a level effective to prevent microbial proliferation in a setting containing growing plants. A system can comprise a chemical microorganism control agent dispersal system, an airborne microorganism detection system, and a cultivation environment monitor system.

Claims (31)

1. A system comprising:

a sensor to measure a state parameter, wherein the state parameter comprises a gaseous chlorine dioxide concentration dispersed in an environment of a facility;

a control system in electronic communication with the sensor to read the state parameter, wherein the control system is configured to control a consumption device to remove, during a single treatment period, a controlled amount of a chemical microorganism control agent present in the environment of the facility in response to the control system assessing the state parameter, wherein the control system is further configured to maintain a first chemical microorganism control agent concentration for the single treatment period; and

a generation device in electronic communication with the control system and configured to increase a level of the chemical microorganism control agent in response to the control system assessing the state parameter, wherein the chemical microorganism control agent comprises chlorine dioxide gas.

2. The system of claim 1 , further comprising the consumption device in electronic communication with the control system.

3. The system of claim 2 , wherein the control system maintains a state-action space comprising:

a plurality of state parameters including the state parameter; and

a plurality of action parameters corresponding to operating at least one of the generation device or the consumption device.

4. The system of claim 3 , wherein the control system assesses the state parameter by looking up a state-action vector from the state-action space having a dimension matching the state parameter.

5. The system of claim 3 , wherein the control system is configured to receive a feedback parameter from the generation device or the consumption device.

6. The system of claim 5 , wherein the control system is configured to assess the feedback parameter by looking up a state-action vector in the state-action space having a dimension matching the feedback parameter.

7. The system of claim 1 , wherein the control system is configured to control the level of the chemical microorganism control agent to between about 0.03 parts per million (ppm) to about 5 ppm concentration of the chlorine dioxide gas in the environment.

8. The system of claim 1 , wherein the control system is configured to control the level of the chemical microorganism control agent to between about 0.03 parts per million (ppm) to about 0.3 ppm concentration of the chlorine dioxide gas in the environment.

9. The system of claim 1 , wherein the consumption device comprises at least one selected from the group of a light control device, a carbon filter, and an air handling device, wherein the consumption device is located in the environment.

10. The system of claim 1 , wherein the control system is configured to control a rate of removal of the chemical microorganism control agent by the consumption device.

11. A system comprising:

a sensor installed in a cultivation facility to measure a state parameter in an environment of the cultivation facility, wherein the state parameter comprises a gaseous chlorine dioxide concentration dispersed in the environment;

a control system in electronic communication with the sensor to read the state parameter;

a generation device disposed in the cultivation facility and in electronic communication with the control system, the generation device configured to increase a level of a chemical microorganism control agent in response to the control system assessing the state parameter, wherein the chemical microorganism control agent comprises chlorine dioxide gas; and

a consumption device disposed in the environment of the cultivation facility and in electronic communication with the control system to remove, during a single treatment period, a controlled amount of the chemical microorganism control agent in the environment in response to the control system assessing the state parameter, wherein the control system is further configured to maintain a first chemical microorganism control agent concentration for the single treatment period.

12. The system of claim 11 , wherein the control system maintains a state-action space comprising:

a plurality of state parameters including the state parameter; and

a plurality of action parameters corresponding to operating at least one of the generation device or the consumption device.

13. The system of claim 12 , wherein the control system assesses the state parameter by looking up a state-action vector from the state-action space having a dimension matching the state parameter.

14. The system of claim 12 , wherein the control system is configured to receive a feedback parameter from at least one of the generation device or the consumption device.

15. The system of claim 14 , wherein the control system is configured to assess the feedback parameter by looking up a state-action vector in the state-action space having a dimension matching the feedback parameter.

16. The system of claim 11 , wherein the sensor measures a parts per million (ppm) concentration of the chlorine dioxide gas.

17. The system of claim 11 , wherein the control system is configured to control the level of the chemical microorganism control agent to between about 0.03 parts per million (ppm) to about 5 ppm concentration of the chlorine dioxide gas in the environment.

18. The system of claim 11 , wherein the control system is configured to control the level of the chemical microorganism control agent to between about 0.03 parts per million (ppm) to about 0.3 ppm concentration of the chlorine dioxide gas in the environment.

19. The system of claim 11 , wherein the consumption device comprises at least one selected from the group of a light control device, a carbon filter, and an air handling device.

20. The system of claim 11 , wherein the control system is configured to control a rate of removal of the chemical microorganism control agent by the consumption device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 12, 2025
From: CUSHMAN, ALEX JOSEPH; LORENZ, BRET BERNARD; LUSTIG, NOAH
To: PROKURE SOLUTIONS, LLC
Reel/Frame 071087/0378 →
Continuity (5)
Continuation In Part 16714577 · Dec 13, 2019
Provisional Application 63051238 · Jul 13, 2020
Provisional Application 62799736 · Jan 31, 2019
Provisional Application 62779366 · Dec 13, 2018
Related Publication 20210329921A1 · Oct 28, 2021
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